GB1300333A - Improvements in devices for etching semi-conductor discs - Google Patents

Improvements in devices for etching semi-conductor discs

Info

Publication number
GB1300333A
GB1300333A GB05114/70A GB1511470A GB1300333A GB 1300333 A GB1300333 A GB 1300333A GB 05114/70 A GB05114/70 A GB 05114/70A GB 1511470 A GB1511470 A GB 1511470A GB 1300333 A GB1300333 A GB 1300333A
Authority
GB
United Kingdom
Prior art keywords
etching
devices
discs
conductor discs
semi
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB05114/70A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Publication of GB1300333A publication Critical patent/GB1300333A/en
Expired legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L7/00—Heating or cooling apparatus; Heat insulating devices
    • B01L7/02—Water baths; Sand baths; Air baths
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Clinical Laboratory Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

1300333 Etching ROBERT BOSCH GmbH 31 March 1970 [27 March 1969] 15114/70 Heading B6J Semi-conductor discs 7 are etched while supported in the individual cells of an etching basket 5 arranged for rotation about an hori- zontal axis in etching liquid 8. The cells are bounded by dividing walls 6 and cross-bars 10 provided with grooves 11 which support the discs in an upright position as the basket is rotated.
GB05114/70A 1969-03-27 1970-03-31 Improvements in devices for etching semi-conductor discs Expired GB1300333A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1915714A DE1915714C3 (en) 1969-03-27 1969-03-27 Device for etching semiconductor wafers with a vessel filled with etching liquid and an etching basket immersed in the etching liquid and rotating with a horizontal axis

Publications (1)

Publication Number Publication Date
GB1300333A true GB1300333A (en) 1972-12-20

Family

ID=5729517

Family Applications (1)

Application Number Title Priority Date Filing Date
GB05114/70A Expired GB1300333A (en) 1969-03-27 1970-03-31 Improvements in devices for etching semi-conductor discs

Country Status (5)

Country Link
US (1) US3679517A (en)
JP (1) JPS50188B1 (en)
DE (1) DE1915714C3 (en)
FR (1) FR2035929B1 (en)
GB (1) GB1300333A (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3964957A (en) * 1973-12-19 1976-06-22 Monsanto Company Apparatus for processing semiconductor wafers
US3951728A (en) * 1974-07-30 1976-04-20 Hitachi, Ltd. Method of treating semiconductor wafers
JPS5128760A (en) * 1974-09-04 1976-03-11 Hitachi Ltd BANJOBUTSUNOETSUCHINGUSOCHI
US3977926A (en) * 1974-12-20 1976-08-31 Western Electric Company, Inc. Methods for treating articles
JPS5228983A (en) * 1975-08-19 1977-03-04 Matsushita Electric Ind Co Ltd Oven
US5197271A (en) * 1981-03-22 1993-03-30 Texas Instruments Incorporated Method and apparatus for back side damage of silicon wafers
DE4103084A1 (en) * 1991-02-01 1992-08-13 Wacker Chemitronic MAGAZINE FOR THE HOLDING OF DISK-SHAPED WORKPIECES, IN PARTICULAR SEMICONDUCTOR DISC, FOR WET-CHEMICAL SURFACE TREATMENT IN LIQUID BATHROOMS
JP3050524B2 (en) * 1996-05-09 2000-06-12 スピードファムクリーンシステム株式会社 Work carrier device
US5839460A (en) * 1997-11-13 1998-11-24 Memc Electronic Materials, Inc. Apparatus for cleaning semiconductor wafers
US6748961B2 (en) * 2001-03-30 2004-06-15 Lam Research Corporation Angular spin, rinse, and dry module and methods for making and implementing the same
US7040209B2 (en) * 2001-09-27 2006-05-09 Mikronite Technologies, Inc. Tool fixtures for use in rotational processing
KR100604051B1 (en) * 2004-06-30 2006-07-24 동부일렉트로닉스 주식회사 Gate oxide pre-cleaning method
KR100644054B1 (en) * 2004-12-29 2006-11-10 동부일렉트로닉스 주식회사 Cleaning apparatus and gate oxide pre-cleaning method
JP6455319B2 (en) * 2015-05-29 2019-01-23 株式会社Sumco Semiconductor wafer etching apparatus and semiconductor wafer etching method

Also Published As

Publication number Publication date
DE1915714A1 (en) 1970-10-22
FR2035929B1 (en) 1974-03-15
US3679517A (en) 1972-07-25
JPS50188B1 (en) 1975-01-07
DE1915714C3 (en) 1975-07-10
FR2035929A1 (en) 1970-12-24
DE1915714B2 (en) 1974-11-28

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee