GB1300333A - Improvements in devices for etching semi-conductor discs - Google Patents
Improvements in devices for etching semi-conductor discsInfo
- Publication number
- GB1300333A GB1300333A GB05114/70A GB1511470A GB1300333A GB 1300333 A GB1300333 A GB 1300333A GB 05114/70 A GB05114/70 A GB 05114/70A GB 1511470 A GB1511470 A GB 1511470A GB 1300333 A GB1300333 A GB 1300333A
- Authority
- GB
- United Kingdom
- Prior art keywords
- etching
- devices
- discs
- conductor discs
- semi
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L7/00—Heating or cooling apparatus; Heat insulating devices
- B01L7/02—Water baths; Sand baths; Air baths
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D23/00—Control of temperature
- G05D23/19—Control of temperature characterised by the use of electric means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Clinical Laboratory Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Health & Medical Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Weting (AREA)
- ing And Chemical Polishing (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
1300333 Etching ROBERT BOSCH GmbH 31 March 1970 [27 March 1969] 15114/70 Heading B6J Semi-conductor discs 7 are etched while supported in the individual cells of an etching basket 5 arranged for rotation about an hori- zontal axis in etching liquid 8. The cells are bounded by dividing walls 6 and cross-bars 10 provided with grooves 11 which support the discs in an upright position as the basket is rotated.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE1915714A DE1915714C3 (en) | 1969-03-27 | 1969-03-27 | Device for etching semiconductor wafers with a vessel filled with etching liquid and an etching basket immersed in the etching liquid and rotating with a horizontal axis |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1300333A true GB1300333A (en) | 1972-12-20 |
Family
ID=5729517
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB05114/70A Expired GB1300333A (en) | 1969-03-27 | 1970-03-31 | Improvements in devices for etching semi-conductor discs |
Country Status (5)
Country | Link |
---|---|
US (1) | US3679517A (en) |
JP (1) | JPS50188B1 (en) |
DE (1) | DE1915714C3 (en) |
FR (1) | FR2035929B1 (en) |
GB (1) | GB1300333A (en) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3964957A (en) * | 1973-12-19 | 1976-06-22 | Monsanto Company | Apparatus for processing semiconductor wafers |
US3951728A (en) * | 1974-07-30 | 1976-04-20 | Hitachi, Ltd. | Method of treating semiconductor wafers |
JPS5128760A (en) * | 1974-09-04 | 1976-03-11 | Hitachi Ltd | BANJOBUTSUNOETSUCHINGUSOCHI |
US3977926A (en) * | 1974-12-20 | 1976-08-31 | Western Electric Company, Inc. | Methods for treating articles |
JPS5228983A (en) * | 1975-08-19 | 1977-03-04 | Matsushita Electric Ind Co Ltd | Oven |
US5197271A (en) * | 1981-03-22 | 1993-03-30 | Texas Instruments Incorporated | Method and apparatus for back side damage of silicon wafers |
DE4103084A1 (en) * | 1991-02-01 | 1992-08-13 | Wacker Chemitronic | MAGAZINE FOR THE HOLDING OF DISK-SHAPED WORKPIECES, IN PARTICULAR SEMICONDUCTOR DISC, FOR WET-CHEMICAL SURFACE TREATMENT IN LIQUID BATHROOMS |
JP3050524B2 (en) * | 1996-05-09 | 2000-06-12 | スピードファムクリーンシステム株式会社 | Work carrier device |
US5839460A (en) * | 1997-11-13 | 1998-11-24 | Memc Electronic Materials, Inc. | Apparatus for cleaning semiconductor wafers |
US6748961B2 (en) * | 2001-03-30 | 2004-06-15 | Lam Research Corporation | Angular spin, rinse, and dry module and methods for making and implementing the same |
US7040209B2 (en) * | 2001-09-27 | 2006-05-09 | Mikronite Technologies, Inc. | Tool fixtures for use in rotational processing |
KR100604051B1 (en) * | 2004-06-30 | 2006-07-24 | 동부일렉트로닉스 주식회사 | Gate oxide pre-cleaning method |
KR100644054B1 (en) * | 2004-12-29 | 2006-11-10 | 동부일렉트로닉스 주식회사 | Cleaning apparatus and gate oxide pre-cleaning method |
JP6455319B2 (en) * | 2015-05-29 | 2019-01-23 | 株式会社Sumco | Semiconductor wafer etching apparatus and semiconductor wafer etching method |
-
1969
- 1969-03-27 DE DE1915714A patent/DE1915714C3/en not_active Expired
- 1969-12-30 FR FR6945499A patent/FR2035929B1/fr not_active Expired
-
1970
- 1970-03-25 US US22627A patent/US3679517A/en not_active Expired - Lifetime
- 1970-03-26 JP JP45024903A patent/JPS50188B1/ja active Pending
- 1970-03-31 GB GB05114/70A patent/GB1300333A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE1915714A1 (en) | 1970-10-22 |
FR2035929B1 (en) | 1974-03-15 |
US3679517A (en) | 1972-07-25 |
JPS50188B1 (en) | 1975-01-07 |
DE1915714C3 (en) | 1975-07-10 |
FR2035929A1 (en) | 1970-12-24 |
DE1915714B2 (en) | 1974-11-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PCNP | Patent ceased through non-payment of renewal fee |