GB1259537A - - Google Patents
Info
- Publication number
- GB1259537A GB1259537A GB1259537DA GB1259537A GB 1259537 A GB1259537 A GB 1259537A GB 1259537D A GB1259537D A GB 1259537DA GB 1259537 A GB1259537 A GB 1259537A
- Authority
- GB
- United Kingdom
- Prior art keywords
- pattern
- patterns
- photo
- plate
- array
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB4508569 | 1969-09-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1259537A true GB1259537A (fr) | 1972-01-05 |
Family
ID=10435825
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1259537D Expired GB1259537A (fr) | 1969-09-12 | 1969-09-12 |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1259537A (fr) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4408875A (en) * | 1980-12-29 | 1983-10-11 | Fujitsu Limited | Method of projecting circuit patterns |
US4603974A (en) * | 1984-03-05 | 1986-08-05 | Fujitsu Limited | Reticle used in semiconductor device fabrication and a method for inspecting a reticle pattern thereon |
US4869998A (en) * | 1986-05-01 | 1989-09-26 | Smiths Industries Public Limited Company | Intergrated circuit substrates |
-
1969
- 1969-09-12 GB GB1259537D patent/GB1259537A/en not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4408875A (en) * | 1980-12-29 | 1983-10-11 | Fujitsu Limited | Method of projecting circuit patterns |
US4603974A (en) * | 1984-03-05 | 1986-08-05 | Fujitsu Limited | Reticle used in semiconductor device fabrication and a method for inspecting a reticle pattern thereon |
US4869998A (en) * | 1986-05-01 | 1989-09-26 | Smiths Industries Public Limited Company | Intergrated circuit substrates |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |