GB1223570A - Improvements in and relating to reprographic materials - Google Patents

Improvements in and relating to reprographic materials

Info

Publication number
GB1223570A
GB1223570A GB32270/68A GB3227068A GB1223570A GB 1223570 A GB1223570 A GB 1223570A GB 32270/68 A GB32270/68 A GB 32270/68A GB 3227068 A GB3227068 A GB 3227068A GB 1223570 A GB1223570 A GB 1223570A
Authority
GB
United Kingdom
Prior art keywords
halogen
july
substituent
azides
organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB32270/68A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of GB1223570A publication Critical patent/GB1223570A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C247/00Compounds containing azido groups
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/695Compositions containing azides as the photosensitive substances
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/008Azides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

1,223,570. Organic azides. KALLE A.G. 5 July, 1968 [7 July, 1967], No. 32270/68. Heading C2C. [Also in Division G2] Organic-solvent soluble, water-insoluble azides of formula (in which Q is H or a substituent, each R is a substituent other than N 3 , two R groups optionally being linked together, X is H or halogen, m is 1 or 2, n is 0 or 1, the azido group is in the 3- or 4-position of the benzene ring relative to the unsaturated chain) are prepared by condensing an aromatic azidoaldehyde with a methylaryl ketone under alkaline or acidic conditions. Preferably Q is halogen, OH or alkoxy, and R is halogen, which may be substituted (e.g. with OH, oxirane, oxetane and/or CH 2 Cl groups), acylamino, dialkylamino, NO 2 , sulphazido, hydroxyalkyl, sulphoamido or sulphoester.
GB32270/68A 1967-07-07 1968-07-05 Improvements in and relating to reprographic materials Expired GB1223570A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1967K0062758 DE1597614B2 (en) 1967-07-07 1967-07-07 LIGHT-SENSITIVE COPY DIMENSIONS

Publications (1)

Publication Number Publication Date
GB1223570A true GB1223570A (en) 1971-02-24

Family

ID=7230771

Family Applications (1)

Application Number Title Priority Date Filing Date
GB32270/68A Expired GB1223570A (en) 1967-07-07 1968-07-05 Improvements in and relating to reprographic materials

Country Status (8)

Country Link
US (1) US3595656A (en)
AT (1) AT283390B (en)
BE (1) BE717610A (en)
DE (1) DE1597614B2 (en)
ES (1) ES355837A1 (en)
FR (1) FR1573500A (en)
GB (1) GB1223570A (en)
NL (1) NL6809093A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2496111A1 (en) * 1980-12-17 1982-06-18 Hitachi Ltd POLYMERIC COMPOSITION SENSITIVE TO LIGHT OR RADIATION, USE THEREOF FOR FORMING RELIEFED DRAWINGS, AND COMPOUNDS IN THIS COMPOSITION

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4833905A (en) * 1971-09-02 1973-05-15
JPS5140452B2 (en) * 1973-07-23 1976-11-04
AU476446B2 (en) * 1974-04-18 1976-09-23 Japan Synthetic Rubber Co., Ltd Photosensitive composition
JPS5934293B2 (en) * 1977-04-20 1984-08-21 王子製紙株式会社 photosensitive composition
IT1138814B (en) * 1980-07-03 1986-09-17 Rca Corp METHOD FOR THE FORMATION OF SURFACE SURFACE DRAWINGS WITH FAR ULTRAVIOLET AND PHOTOSENSITIVE PROTECTIVE COMPOSITION FOR THIS METHOD
JPS5872139A (en) * 1981-10-26 1983-04-30 Tokyo Ohka Kogyo Co Ltd Photosensitive material
DE3415033C2 (en) * 1983-04-20 1986-04-03 Hitachi Chemical Co., Ltd. 4'-Azidobenzal-2-methoxyacetophenone, process for its preparation and photosensitive composition containing it
DE3417607A1 (en) * 1983-05-12 1984-11-15 Hitachi Chemical Co., Ltd. METHOD FOR PRODUCING FINE PATTERNS
JPS59222833A (en) * 1983-06-01 1984-12-14 Hitachi Chem Co Ltd Photosensitive composition
JPS6042425A (en) * 1983-08-17 1985-03-06 Toray Ind Inc Actinic ray-sensitive polymer composition
US4711836A (en) * 1984-09-10 1987-12-08 Olin Hunt Specialty Products, Inc. Development of positive-working photoresist compositions
JPS61166542A (en) * 1985-01-18 1986-07-28 Hitachi Chem Co Ltd Photosensitive composition
JPS62102241A (en) * 1985-10-30 1987-05-12 Tokyo Ohka Kogyo Co Ltd Photosensitive composition
JPH03155554A (en) * 1989-11-14 1991-07-03 Japan Synthetic Rubber Co Ltd Radiation sensitive resin composition
US7173129B2 (en) * 2003-06-06 2007-02-06 Athero Genics, Inc. Sulfonamide-substituted chalcone derivatives and their use to treat diseases

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2496111A1 (en) * 1980-12-17 1982-06-18 Hitachi Ltd POLYMERIC COMPOSITION SENSITIVE TO LIGHT OR RADIATION, USE THEREOF FOR FORMING RELIEFED DRAWINGS, AND COMPOUNDS IN THIS COMPOSITION

Also Published As

Publication number Publication date
DE1597614A1 (en) 1970-05-06
AT283390B (en) 1970-08-10
DE1597614B2 (en) 1977-06-23
FR1573500A (en) 1969-07-04
ES355837A1 (en) 1969-12-16
NL6809093A (en) 1969-01-09
US3595656A (en) 1971-07-27
BE717610A (en) 1969-01-06

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