GB1160895A - Coating Surfaces by Vapour Deposition - Google Patents

Coating Surfaces by Vapour Deposition

Info

Publication number
GB1160895A
GB1160895A GB36095/66A GB3609566A GB1160895A GB 1160895 A GB1160895 A GB 1160895A GB 36095/66 A GB36095/66 A GB 36095/66A GB 3609566 A GB3609566 A GB 3609566A GB 1160895 A GB1160895 A GB 1160895A
Authority
GB
United Kingdom
Prior art keywords
plasma
substrate
coating material
vapour
aug
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB36095/66A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xerox Ltd
Original Assignee
Rank Xerox Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rank Xerox Ltd filed Critical Rank Xerox Ltd
Publication of GB1160895A publication Critical patent/GB1160895A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32422—Arrangement for selecting ions or species in the plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
    • G03G5/08207—Selenium-based
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

1,160,895. Coating by vapour deposition. RANK XEROX Ltd. Aug. 12, 1966 [Aug. 25, 1965], No. 36095/66. Heading C7F. A substrate such as Al, brass, glass or plastics is coated with a film comprising one or more of Se, As and Te by transporting the vapour of the coating material in a carrier gas such as hydrogen, ammonia, chlorine or iodine which is excited to the plasma state e. g. g by a H. F. electric field. As shown in Fig. 1 the carrier gas is introduced into reaction chamber 5 from source 11, a plasma is generated by coil 15 supplied with a 30 megacycle alternating current and the Se, As or Te is supplied from source 18. A grounded electrode 17 terminates the plasma at a predetermined point and the coating material is deposited in substrate 19. The process takes place under a pressure of 10 microns to several moms of Hg v m a separate embodiment Fig. 2 (not shown) the coating material is injected into the plasma in vapour form. The alternating current applied is preferably in the R. F. range. The plastics substrate may first be coated with Al prior to depositing Se, As or Te.
GB36095/66A 1965-08-25 1966-08-12 Coating Surfaces by Vapour Deposition Expired GB1160895A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US48235465A 1965-08-25 1965-08-25
US77933968A 1968-11-27 1968-11-27

Publications (1)

Publication Number Publication Date
GB1160895A true GB1160895A (en) 1969-08-06

Family

ID=27047253

Family Applications (1)

Application Number Title Priority Date Filing Date
GB36095/66A Expired GB1160895A (en) 1965-08-25 1966-08-12 Coating Surfaces by Vapour Deposition

Country Status (4)

Country Link
US (1) US3472679A (en)
DE (1) DE1621325B2 (en)
GB (1) GB1160895A (en)
NL (1) NL6611792A (en)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR95985E (en) * 1966-05-16 1972-05-19 Rank Xerox Ltd Glassy semiconductors and their manufacturing process in the form of thin films.
US3776181A (en) * 1970-02-02 1973-12-04 Ransburg Electro Coating Corp Deposition apparatus for an organometallic material
US3906892A (en) * 1971-04-27 1975-09-23 Cit Alcatel Plasma deposition of thin layers of substrated or the like
FR2236963B1 (en) * 1973-07-13 1977-02-18 Cit Alcatel
US4099969A (en) * 1974-10-10 1978-07-11 Xerox Corporation Coating method to improve adhesion of photoconductors
DE2549405A1 (en) * 1974-11-05 1976-05-06 Eastman Kodak Co METHOD OF DEPOSITING A LAYER OF PHOTOSENSITIVE MATERIAL ON A SURFACE
US4091257A (en) * 1975-02-24 1978-05-23 General Electric Company Deep diode devices and method and apparatus
US4013463A (en) * 1975-08-15 1977-03-22 Leder Lewis B Photoreceptor fabrication utilizing AC ion plating
US4132816A (en) * 1976-02-25 1979-01-02 United Technologies Corporation Gas phase deposition of aluminum using a complex aluminum halide of an alkali metal or an alkaline earth metal as an activator
US4223048A (en) * 1978-08-07 1980-09-16 Pacific Western Systems Plasma enhanced chemical vapor processing of semiconductive wafers
JPS6029295B2 (en) * 1979-08-16 1985-07-10 舜平 山崎 Non-single crystal film formation method
US4509451A (en) * 1983-03-29 1985-04-09 Colromm, Inc. Electron beam induced chemical vapor deposition
AU563891B2 (en) * 1983-08-25 1987-07-23 Vsesojuzny Nauchno-Issledovatelsky Instrumentalny Institut Cutting tool and method of manufacture thereof
US4500565A (en) * 1983-09-28 1985-02-19 Ushio Denki Kabushiki Kaisha Deposition process
US4505949A (en) * 1984-04-25 1985-03-19 Texas Instruments Incorporated Thin film deposition using plasma-generated source gas
CN85106828B (en) * 1985-09-10 1987-09-09 张戈飞 Process for forming sulphide layer on the surface metal parts and apparatus therefor
US5707692A (en) * 1990-10-23 1998-01-13 Canon Kabushiki Kaisha Apparatus and method for processing a base substance using plasma and a magnetic field
US6015595A (en) * 1998-05-28 2000-01-18 Felts; John T. Multiple source deposition plasma apparatus
JP3697505B2 (en) * 2000-03-17 2005-09-21 国立大学法人東京工業大学 Thin film formation method
JP5164107B2 (en) * 2008-07-01 2013-03-13 株式会社ユーテック Plasma CVD apparatus, thin film manufacturing method, and magnetic recording medium manufacturing method
CN103874316B (en) * 2014-03-24 2016-05-11 青岛科技大学 A kind of design of use for laboratory induction plasma treatment facility

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2501563A (en) * 1946-02-20 1950-03-21 Libbey Owens Ford Glass Co Method of forming strongly adherent metallic compound films by glow discharge
US3024761A (en) * 1958-07-01 1962-03-13 Ibm Vacuum evaporation apparatus
US3108900A (en) * 1959-04-13 1963-10-29 Cornelius A Papp Apparatus and process for producing coatings on metals
US3290567A (en) * 1960-09-23 1966-12-06 Technical Ind Inc Controlled deposition and growth of polycrystalline films in a vacuum
US3310424A (en) * 1963-05-14 1967-03-21 Litton Systems Inc Method for providing an insulating film on a substrate
US3297465A (en) * 1963-12-31 1967-01-10 Ibm Method for producing organic plasma and for depositing polymer films
US3296115A (en) * 1964-03-02 1967-01-03 Schjeldahl Co G T Sputtering of metals wherein gas flow is confined to increase the purity of deposition
US3355371A (en) * 1964-06-29 1967-11-28 Gen Motors Corp Method of anodizing a metal in a plasma including connecting said metal in a separate electrical circuit
US3329601A (en) * 1964-09-15 1967-07-04 Donald M Mattox Apparatus for coating a cathodically biased substrate from plasma of ionized coatingmaterial
US3275412A (en) * 1965-02-04 1966-09-27 American Cyanamid Co Production of oxides by plasma process

Also Published As

Publication number Publication date
DE1621325B2 (en) 1975-08-07
DE1621325A1 (en) 1971-05-13
US3472679A (en) 1969-10-14
NL6611792A (en) 1967-02-27

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee