GB1133397A - Method for the rapid deposition of metallic films using a plasma of the material to be deposited - Google Patents

Method for the rapid deposition of metallic films using a plasma of the material to be deposited

Info

Publication number
GB1133397A
GB1133397A GB3332367A GB3332367A GB1133397A GB 1133397 A GB1133397 A GB 1133397A GB 3332367 A GB3332367 A GB 3332367A GB 3332367 A GB3332367 A GB 3332367A GB 1133397 A GB1133397 A GB 1133397A
Authority
GB
United Kingdom
Prior art keywords
substrate
deposited
plasma
metallic films
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3332367A
Inventor
Jack David Brady
Robert Allen Steinhauer
Theodore Samuel Slaughter
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Co
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of GB1133397A publication Critical patent/GB1133397A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1,133,397. Coating by vapour deposition. HUGHES AIRCRAFT CO. July 20,1967 [Sept. 8, 1966j, No.33323/67. Heading C7F. A metal, e. g. Cr, Cu or a Cu-Au alloy, is deposited on a substrate of a ceramic, e. g. berrylia, glass, metal, e.g. stainless steel or Mo, or a semi-conductor, by evaporating from a tantalum or molybdenum boat heated by a low voltage A. C. current, whilst in the presence of an electric field generated by applying a D. C. potential of approximately 50 volts, between the substrate and the source, the substrate being positive with respect to the source. The substrate may be a block, plate, rod or wire.
GB3332367A 1966-09-08 1967-07-20 Method for the rapid deposition of metallic films using a plasma of the material to be deposited Expired GB1133397A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US57807966A 1966-09-08 1966-09-08

Publications (1)

Publication Number Publication Date
GB1133397A true GB1133397A (en) 1968-11-13

Family

ID=24311348

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3332367A Expired GB1133397A (en) 1966-09-08 1967-07-20 Method for the rapid deposition of metallic films using a plasma of the material to be deposited

Country Status (2)

Country Link
GB (1) GB1133397A (en)
NL (1) NL6712183A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2138027A (en) * 1983-04-12 1984-10-17 Citizen Watch Co Ltd A process for plating an article with a gold-based alloy and an alloy therefor
EP0218916A1 (en) * 1985-09-10 1987-04-22 Yifei Zhang A process to form a sulphide case at the surface of a metal part
WO1992004481A1 (en) * 1990-08-29 1992-03-19 Jones William Ion plating method and apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2138027A (en) * 1983-04-12 1984-10-17 Citizen Watch Co Ltd A process for plating an article with a gold-based alloy and an alloy therefor
FR2544334A1 (en) * 1983-04-12 1984-10-19 Citizen Watch Co Ltd PROCESS FOR PLATING A DECORATIVE ARTICLE WITH AN ALLOY BASED ON GOLD AND ALLOY FOR CARRYING OUT SAID METHOD
DE3413663A1 (en) * 1983-04-12 1984-12-13 Citizen Watch Co., Ltd., Tokio/Tokyo ALLOY AND GOLD PLATING METHOD
CH667963GA3 (en) * 1983-04-12 1988-11-30
EP0218916A1 (en) * 1985-09-10 1987-04-22 Yifei Zhang A process to form a sulphide case at the surface of a metal part
WO1992004481A1 (en) * 1990-08-29 1992-03-19 Jones William Ion plating method and apparatus

Also Published As

Publication number Publication date
NL6712183A (en) 1968-03-11

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