GB1085450A - Chlorine plasmas - Google Patents

Chlorine plasmas

Info

Publication number
GB1085450A
GB1085450A GB39567/65A GB3956765A GB1085450A GB 1085450 A GB1085450 A GB 1085450A GB 39567/65 A GB39567/65 A GB 39567/65A GB 3956765 A GB3956765 A GB 3956765A GB 1085450 A GB1085450 A GB 1085450A
Authority
GB
United Kingdom
Prior art keywords
chlorine
oxidizing gas
metal chloride
produced
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB39567/65A
Inventor
Denis Cleaver
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BRITISH TITAN PRODUCTS Ltd
Original Assignee
BRITISH TITAN PRODUCTS Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BRITISH TITAN PRODUCTS Ltd filed Critical BRITISH TITAN PRODUCTS Ltd
Priority to GB39567/65A priority Critical patent/GB1085450A/en
Priority to FR76507A priority patent/FR1499438A/en
Priority to DE19661542026 priority patent/DE1542026A1/en
Publication of GB1085450A publication Critical patent/GB1085450A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14—Methods for preparing oxides or hydroxides in general
    • C01B13/20—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state
    • C01B13/22—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides
    • C01B13/28—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides using a plasma or an electric discharge
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • C01G23/047—Titanium dioxide
    • C01G23/07—Producing by vapour phase processes, e.g. halide oxidation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches

Abstract

Solid, finely divided metal oxide is produced by the vapour phase oxidation of the corresponding metal chloride, by passing chlorine into a reaction zone wherein the metal chloride is reacted with a free-oxygen containing oxidizing gas, the chlorine being heated in the reaction zone or prior to entering by passage through an electrically produced hot plasma. The oxidizing gas or oxidizing gas and metal chloride may also be passed through the plasma, which may be produced by an arc between electrodes, by induction means or by capacitative means. The chlorine used to form the plasma remains unchanged and may be recycled.
GB39567/65A 1965-09-16 1965-09-16 Chlorine plasmas Expired GB1085450A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
GB39567/65A GB1085450A (en) 1965-09-16 1965-09-16 Chlorine plasmas
FR76507A FR1499438A (en) 1965-09-16 1966-09-15 Process for manufacturing finely divided solid metal oxides
DE19661542026 DE1542026A1 (en) 1965-09-16 1966-09-15 Process for the production of solid, finely divided metal oxides

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB39567/65A GB1085450A (en) 1965-09-16 1965-09-16 Chlorine plasmas

Publications (1)

Publication Number Publication Date
GB1085450A true GB1085450A (en) 1967-10-04

Family

ID=10410244

Family Applications (1)

Application Number Title Priority Date Filing Date
GB39567/65A Expired GB1085450A (en) 1965-09-16 1965-09-16 Chlorine plasmas

Country Status (3)

Country Link
DE (1) DE1542026A1 (en)
FR (1) FR1499438A (en)
GB (1) GB1085450A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6994837B2 (en) 2001-04-24 2006-02-07 Tekna Plasma Systems, Inc. Plasma synthesis of metal oxide nanopowder and apparatus therefor

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2533205A1 (en) * 1982-09-17 1984-03-23 Westinghouse Electric Corp Foamed silica prodn. from silicon tetra:chloride and oxygen

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6994837B2 (en) 2001-04-24 2006-02-07 Tekna Plasma Systems, Inc. Plasma synthesis of metal oxide nanopowder and apparatus therefor
US7501599B2 (en) 2001-04-24 2009-03-10 Tekna Plasma Systems, Inc. Apparatus for plasma synthesis of metal oxide nanopowder

Also Published As

Publication number Publication date
DE1542026A1 (en) 1970-03-19
FR1499438A (en) 1967-10-27

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