GB1080536A - Improvements in or relating to chemical etching - Google Patents
Improvements in or relating to chemical etchingInfo
- Publication number
- GB1080536A GB1080536A GB38157/64A GB3815764A GB1080536A GB 1080536 A GB1080536 A GB 1080536A GB 38157/64 A GB38157/64 A GB 38157/64A GB 3815764 A GB3815764 A GB 3815764A GB 1080536 A GB1080536 A GB 1080536A
- Authority
- GB
- United Kingdom
- Prior art keywords
- etchant
- foam
- tank
- wall
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Abstract
In a method of etching wherein those portions of a metallic surface not protected with a resist are dissolved with an etchant, the etchant is supplied continuously in the form of a foam to those parts of the surface not protected with the resist. The foam may be produced by aeration of the etchant (e.g. using small jets of air or another effectively inert gas) of a bath of etchant to cause a foam to form upon the top of the etchant, the surface to be etched being so positioned that it will not be in the liquid etchant but will be covered by the foam being continuously supplied by aeration. The etchant may be aqueous ferric chloride and may contain a foaming agent (e.g. that sold under the Registered Trade Mark "TEEPOL"). When copper is being etched and the etchant has become fouled with copper it may be regenerated by electrolysis using two graphite anodes and a brass plate disposed between the rods as cathode. The apparatus used in the etching may comprise a narrow tank 1/3 filled with etchant wherein compressed air is forced through holes in the wall of a pipe extending along the bottom of the tank so as to fill the space above the etchant with foam. The top of the tank may be double walled the inner wall being provided with a series of holes, and the outer wall connecting with a fume escape tube.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB38157/64A GB1080536A (en) | 1964-09-18 | 1964-09-18 | Improvements in or relating to chemical etching |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB38157/64A GB1080536A (en) | 1964-09-18 | 1964-09-18 | Improvements in or relating to chemical etching |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1080536A true GB1080536A (en) | 1967-08-23 |
Family
ID=10401607
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB38157/64A Expired GB1080536A (en) | 1964-09-18 | 1964-09-18 | Improvements in or relating to chemical etching |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB1080536A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2030304A1 (en) * | 1970-06-19 | 1971-12-23 | Lemmen W | Printed circuit etching - with foamed etchant |
| WO2010151471A1 (en) * | 2009-06-25 | 2010-12-29 | 3M Innovative Properties Company | Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles |
-
1964
- 1964-09-18 GB GB38157/64A patent/GB1080536A/en not_active Expired
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2030304A1 (en) * | 1970-06-19 | 1971-12-23 | Lemmen W | Printed circuit etching - with foamed etchant |
| WO2010151471A1 (en) * | 2009-06-25 | 2010-12-29 | 3M Innovative Properties Company | Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles |
| CN102803562A (en) * | 2009-06-25 | 2012-11-28 | 3M创新有限公司 | Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles |
| US8647522B2 (en) | 2009-06-25 | 2014-02-11 | 3M Innovative Properties Company | Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles |
| CN102803562B (en) * | 2009-06-25 | 2015-09-30 | 3M创新有限公司 | The method of Wet-type etching self-assembled monolayer patterned substrate and metal pattern goods |
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