GB0505829D0 - Implanting a substrate using an ion beam - Google Patents
Implanting a substrate using an ion beamInfo
- Publication number
- GB0505829D0 GB0505829D0 GBGB0505829.2A GB0505829A GB0505829D0 GB 0505829 D0 GB0505829 D0 GB 0505829D0 GB 0505829 A GB0505829 A GB 0505829A GB 0505829 D0 GB0505829 D0 GB 0505829D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- implanting
- substrate
- ion beam
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000010884 ion-beam technique Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
- H01J37/3172—Maskless patterned ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- General Physics & Mathematics (AREA)
- Toxicology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Prostheses (AREA)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB0505829.2A GB0505829D0 (en) | 2005-03-22 | 2005-03-22 | Implanting a substrate using an ion beam |
GB0519852A GB2424513A (en) | 2005-03-22 | 2005-09-29 | Implanting a substrate using an ion beam |
TW095108207A TW200707555A (en) | 2005-03-22 | 2006-03-10 | Implanting a substrate using an ion beam |
CNA2006100660384A CN1841665A (en) | 2005-03-22 | 2006-03-21 | Implanting a substrate using an ion beam |
US11/386,090 US20060289800A1 (en) | 2005-03-22 | 2006-03-22 | Implanting a substrate using an ion beam |
JP2006079395A JP2006279041A (en) | 2005-03-22 | 2006-03-22 | Implantation into substrate using ion beam |
KR1020060026090A KR20060102525A (en) | 2005-03-22 | 2006-03-22 | Implanting a substrate using an ion beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB0505829.2A GB0505829D0 (en) | 2005-03-22 | 2005-03-22 | Implanting a substrate using an ion beam |
Publications (1)
Publication Number | Publication Date |
---|---|
GB0505829D0 true GB0505829D0 (en) | 2005-04-27 |
Family
ID=34531646
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GBGB0505829.2A Ceased GB0505829D0 (en) | 2005-03-22 | 2005-03-22 | Implanting a substrate using an ion beam |
GB0519852A Withdrawn GB2424513A (en) | 2005-03-22 | 2005-09-29 | Implanting a substrate using an ion beam |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0519852A Withdrawn GB2424513A (en) | 2005-03-22 | 2005-09-29 | Implanting a substrate using an ion beam |
Country Status (3)
Country | Link |
---|---|
CN (1) | CN1841665A (en) |
GB (2) | GB0505829D0 (en) |
TW (1) | TW200707555A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5767983B2 (en) * | 2012-01-27 | 2015-08-26 | 住友重機械イオンテクノロジー株式会社 | Ion implantation method and ion implantation apparatus |
DE102017117999A1 (en) * | 2017-08-08 | 2019-02-14 | Infineon Technologies Ag | ION IMPLANTING DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3692999B2 (en) * | 2001-10-26 | 2005-09-07 | 日新イオン機器株式会社 | Ion implantation method and apparatus |
-
2005
- 2005-03-22 GB GBGB0505829.2A patent/GB0505829D0/en not_active Ceased
- 2005-09-29 GB GB0519852A patent/GB2424513A/en not_active Withdrawn
-
2006
- 2006-03-10 TW TW095108207A patent/TW200707555A/en unknown
- 2006-03-21 CN CNA2006100660384A patent/CN1841665A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
CN1841665A (en) | 2006-10-04 |
GB2424513A (en) | 2006-09-27 |
GB0519852D0 (en) | 2005-11-09 |
TW200707555A (en) | 2007-02-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AT | Applications terminated before publication under section 16(1) |