GB0311470D0 - Optical projection system for photolithography - Google Patents

Optical projection system for photolithography

Info

Publication number: GB0311470D0
Authority: GB; United Kingdom
Prior art keywords: photolithography; projection system; optical projection; optical; projection
Prior art date: 2003-05-19
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Ceased

Application number

GB0311470A

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Nikon Corp

Original Assignee

Nikon Corp

Nippon Kogaku KK

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2003-05-19

Filing date

2003-05-19

Publication date

2003-06-25

2003-05-19 Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp

2003-05-19 Priority to GB0311470A priority Critical patent/GB0311470D0/en

2003-06-25 Publication of GB0311470D0 publication Critical patent/GB0311470D0/en

2003-08-22 Priority to TW092123099A priority patent/TWI242691B/en

2003-08-22 Priority to TW093118060A priority patent/TWI249082B/en

2003-08-22 Priority to PCT/JP2003/010665 priority patent/WO2004019128A2/en

2003-08-22 Priority to KR1020057003082A priority patent/KR20050035890A/en

2003-08-22 Priority to CNB038172534A priority patent/CN100462844C/en

2003-08-22 Priority to US10/525,372 priority patent/US7362508B2/en

2003-08-22 Priority to EP03792812A priority patent/EP1532489A2/en

2003-08-22 Priority to AU2003256081A priority patent/AU2003256081A1/en

2003-08-22 Priority to JP2004530609A priority patent/JP2005536775A/en

2007-10-16 Priority to US11/907,679 priority patent/US7551362B2/en

2007-10-17 Priority to US11/907,801 priority patent/US7688517B2/en

2007-10-17 Priority to US11/907,797 priority patent/US7701640B2/en

2007-10-18 Priority to US11/907,908 priority patent/US7580197B2/en

2007-10-18 Priority to US11/907,907 priority patent/US7609455B2/en

2007-10-19 Priority to US11/976,028 priority patent/US7619827B2/en

2009-12-04 Priority to JP2009276077A priority patent/JP2010061159A/en

2009-12-04 Priority to JP2009276076A priority patent/JP4803301B2/en

Status Ceased legal-status Critical Current

Links

GB0311470A 2002-08-23 2003-05-19 Optical projection system for photolithography Ceased GB0311470D0 (en)

Priority Applications (18)

Application Number	Priority Date	Filing Date	Title
GB0311470A GB0311470D0 (en)	2003-05-19	2003-05-19	Optical projection system for photolithography
TW093118060A TWI249082B (en)	2002-08-23	2003-08-22	Projection optical system and method for photolithography and exposure apparatus and method using same
AU2003256081A AU2003256081A1 (en)	2002-08-23	2003-08-22	Projection optical system and method for photolithography and exposure apparatus and method using same
JP2004530609A JP2005536775A (en)	2002-08-23	2003-08-22	Projection optical system, photolithography method and exposure apparatus, and method using exposure apparatus
PCT/JP2003/010665 WO2004019128A2 (en)	2002-08-23	2003-08-22	Projection optical system and method for photolithography and exposure apparatus and method using same
KR1020057003082A KR20050035890A (en)	2002-08-23	2003-08-22	Projection optical system and method for photolithography and exposure apparatus and method using same
CNB038172534A CN100462844C (en)	2002-08-23	2003-08-22	Projection optical system and method for photolithography and exposure apparatus and method using same
US10/525,372 US7362508B2 (en)	2002-08-23	2003-08-22	Projection optical system and method for photolithography and exposure apparatus and method using same
EP03792812A EP1532489A2 (en)	2002-08-23	2003-08-22	Projection optical system and method for photolithography and exposure apparatus and method using same
TW092123099A TWI242691B (en)	2002-08-23	2003-08-22	Projection optical system and method for photolithography and exposure apparatus and method using same
US11/907,679 US7551362B2 (en)	2002-08-23	2007-10-16	Projection optical system and method for photolithography and exposure apparatus and method using same
US11/907,801 US7688517B2 (en)	2002-08-23	2007-10-17	Projection optical system and method for photolithography and exposure apparatus and method using same
US11/907,797 US7701640B2 (en)	2002-08-23	2007-10-17	Projection optical system and method for photolithography and exposure apparatus and method using same
US11/907,908 US7580197B2 (en)	2002-08-23	2007-10-18	Projection optical system and method for photolithography and exposure apparatus and method using same
US11/907,907 US7609455B2 (en)	2002-08-23	2007-10-18	Projection optical system and method for photolithography and exposure apparatus and method using same
US11/976,028 US7619827B2 (en)	2002-08-23	2007-10-19	Projection optical system and method for photolithography and exposure apparatus and method using same
JP2009276077A JP2010061159A (en)	2002-08-23	2009-12-04	Projection optical system, exposure equipment, and exposure method
JP2009276076A JP4803301B2 (en)	2002-08-23	2009-12-04	Projection optical system, exposure apparatus, and exposure method

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
GB0311470A GB0311470D0 (en)	2003-05-19	2003-05-19	Optical projection system for photolithography

Publications (1)

Publication Number	Publication Date
GB0311470D0 true GB0311470D0 (en)	2003-06-25

Family

ID=9958350

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
GB0311470A Ceased GB0311470D0 (en)	2002-08-23	2003-05-19	Optical projection system for photolithography

Country Status (1)

Country	Link
GB (1)	GB0311470D0 (en)

2003
- 2003-05-19 GB GB0311470A patent/GB0311470D0/en not_active Ceased

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Legal Events

Date	Code	Title	Description
2004-08-11	AT	Applications terminated before publication under section 16(1)