GB0226575D0 - Fabrication of magnesium diboride superconductor thin films and electronics devices by ion implantation - Google Patents

Fabrication of magnesium diboride superconductor thin films and electronics devices by ion implantation

Info

Publication number
GB0226575D0
GB0226575D0 GBGB0226575.9A GB0226575A GB0226575D0 GB 0226575 D0 GB0226575 D0 GB 0226575D0 GB 0226575 A GB0226575 A GB 0226575A GB 0226575 D0 GB0226575 D0 GB 0226575D0
Authority
GB
United Kingdom
Prior art keywords
fabrication
ion implantation
thin films
electronics devices
superconductor thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
GBGB0226575.9A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Surrey
Original Assignee
University of Surrey
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Surrey filed Critical University of Surrey
Priority to GBGB0226575.9A priority Critical patent/GB0226575D0/en
Publication of GB0226575D0 publication Critical patent/GB0226575D0/en
Priority to AU2003282243A priority patent/AU2003282243A1/en
Priority to PCT/GB2003/004948 priority patent/WO2004044262A1/en
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/067—Borides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0856—Manufacture or treatment of devices comprising metal borides, e.g. MgB2
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/10—Junction-based devices
    • H10N60/12—Josephson-effect devices
    • H10N60/126—Josephson-effect devices comprising metal borides, e.g. MgB2

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
GBGB0226575.9A 2002-11-14 2002-11-14 Fabrication of magnesium diboride superconductor thin films and electronics devices by ion implantation Ceased GB0226575D0 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
GBGB0226575.9A GB0226575D0 (en) 2002-11-14 2002-11-14 Fabrication of magnesium diboride superconductor thin films and electronics devices by ion implantation
AU2003282243A AU2003282243A1 (en) 2002-11-14 2003-11-14 Fabrication of magnesium diboride superconductor thin films and electronic devices by ion implantation
PCT/GB2003/004948 WO2004044262A1 (en) 2002-11-14 2003-11-14 Fabrication of magnesium diboride superconductor thin films and electronic devices by ion implantation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB0226575.9A GB0226575D0 (en) 2002-11-14 2002-11-14 Fabrication of magnesium diboride superconductor thin films and electronics devices by ion implantation

Publications (1)

Publication Number Publication Date
GB0226575D0 true GB0226575D0 (en) 2002-12-18

Family

ID=9947818

Family Applications (1)

Application Number Title Priority Date Filing Date
GBGB0226575.9A Ceased GB0226575D0 (en) 2002-11-14 2002-11-14 Fabrication of magnesium diboride superconductor thin films and electronics devices by ion implantation

Country Status (3)

Country Link
AU (1) AU2003282243A1 (en)
GB (1) GB0226575D0 (en)
WO (1) WO2004044262A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102214786B (en) * 2011-05-03 2013-11-06 中国科学院电工研究所 Method for preparing magnesium diboride superconducting thin film by electron beam annealing
CN104112818A (en) * 2013-04-19 2014-10-22 中国科学院物理研究所 Superconducting quantum interference device structure and manufacturing method
CN104882533B (en) * 2015-04-29 2017-10-27 中国科学院电工研究所 The method that electron beam annealing prepares MgB 2 superconductor wire material or band

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4976987A (en) * 1989-08-10 1990-12-11 The United States Of America As Represented By The Department Of Energy Process for forming one or more substantially pure layers in substrate material using ion implantation
EP0623950B1 (en) * 1993-05-03 1997-06-18 Forschungszentrum Rossendorf e.V. Process for manufacturing tubular microstructures in solid state bodies
KR100413533B1 (en) * 2001-03-19 2003-12-31 학교법인 포항공과대학교 Fabrication method of superconducting magnesium diboride thin film and its apparatus

Also Published As

Publication number Publication date
AU2003282243A1 (en) 2004-06-03
WO2004044262A1 (en) 2004-05-27

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Legal Events

Date Code Title Description
AT Applications terminated before publication under section 16(1)