GB0206036D0 - Polishing composition and method for producing memory hard disk by means thereof - Google Patents
Polishing composition and method for producing memory hard disk by means thereofInfo
- Publication number
- GB0206036D0 GB0206036D0 GB0206036A GB0206036A GB0206036D0 GB 0206036 D0 GB0206036 D0 GB 0206036D0 GB 0206036 A GB0206036 A GB 0206036A GB 0206036 A GB0206036 A GB 0206036A GB 0206036 D0 GB0206036 D0 GB 0206036D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- hard disk
- polishing composition
- memory hard
- producing memory
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001096699A JP4439755B2 (en) | 2001-03-29 | 2001-03-29 | Polishing composition and method for producing memory hard disk using the same |
Publications (3)
Publication Number | Publication Date |
---|---|
GB0206036D0 true GB0206036D0 (en) | 2002-04-24 |
GB2375116A GB2375116A (en) | 2002-11-06 |
GB2375116B GB2375116B (en) | 2004-10-20 |
Family
ID=18950586
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0206036A Expired - Fee Related GB2375116B (en) | 2001-03-29 | 2002-03-14 | Method of polishing a substrate and method for producing a memory hard disk |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4439755B2 (en) |
CN (1) | CN1234798C (en) |
GB (1) | GB2375116B (en) |
MY (1) | MY131997A (en) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003170349A (en) * | 2001-09-27 | 2003-06-17 | Fujimi Inc | Composition for polishing of substrate for magnetic disc and polishing method using it |
JP3997152B2 (en) | 2002-12-26 | 2007-10-24 | 花王株式会社 | Polishing liquid composition |
TWI254741B (en) | 2003-02-05 | 2006-05-11 | Kao Corp | Polishing composition |
US6896591B2 (en) * | 2003-02-11 | 2005-05-24 | Cabot Microelectronics Corporation | Mixed-abrasive polishing composition and method for using the same |
JP4202157B2 (en) * | 2003-02-28 | 2008-12-24 | 株式会社フジミインコーポレーテッド | Polishing composition |
JP2006021259A (en) * | 2004-07-06 | 2006-01-26 | Fuji Electric Device Technology Co Ltd | Polishing method of magnetic disk base board and magnetic disk medium |
JP4954462B2 (en) * | 2004-10-19 | 2012-06-13 | 株式会社フジミインコーポレーテッド | Composition for selective polishing of silicon nitride film and polishing method using the same |
US7476620B2 (en) | 2005-03-25 | 2009-01-13 | Dupont Air Products Nanomaterials Llc | Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers |
JP4635694B2 (en) * | 2005-04-15 | 2011-02-23 | 日立化成工業株式会社 | Polishing material and polishing method for polishing a composite film including a magnetic metal film and an insulating material film |
US7435162B2 (en) | 2005-10-24 | 2008-10-14 | 3M Innovative Properties Company | Polishing fluids and methods for CMP |
TWI411667B (en) | 2006-04-28 | 2013-10-11 | Kao Corp | Polishing composition for magnetic disk substrate |
JP4577296B2 (en) * | 2006-10-27 | 2010-11-10 | 富士電機デバイステクノロジー株式会社 | Reproduction method of non-metallic substrate for magnetic recording medium |
KR101538826B1 (en) | 2008-10-20 | 2015-07-22 | 니타 하스 인코포레이티드 | Composition for polishing silicon nitride and method for controlling selectivity using same |
JP4891304B2 (en) * | 2008-10-23 | 2012-03-07 | 花王株式会社 | Manufacturing method of memory hard disk substrate |
US9076480B2 (en) | 2010-03-29 | 2015-07-07 | Hoya Corporation | Method of producing glass substrate for information recording medium |
CN102585707B (en) * | 2012-02-28 | 2014-01-29 | 上海华明高纳稀土新材料有限公司 | Preparation method of cerium-based mixed rare earth polishing powder |
CN103372809A (en) * | 2012-04-12 | 2013-10-30 | 江西赛维Ldk太阳能高科技有限公司 | Method for improving silicon block ground surface quality |
CN106978087B (en) * | 2017-03-20 | 2018-10-23 | 上海大学 | A kind of metatitanic acid coated aluminum oxide nucleocapsid abrasive grain polishing solution composition and preparation method thereof |
US11186748B2 (en) * | 2017-09-28 | 2021-11-30 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Aqueous anionic functional silica slurry and amine carboxylic acid compositions for selective nitride removal in polishing and methods of using them |
US10584265B2 (en) * | 2017-09-28 | 2020-03-10 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them |
SG10201904669TA (en) | 2018-06-28 | 2020-01-30 | Kctech Co Ltd | Polishing Slurry Composition |
US20200303198A1 (en) * | 2019-03-22 | 2020-09-24 | Fujimi Incorporated | Polishing composition and polishing method |
CN111574927A (en) * | 2020-06-22 | 2020-08-25 | 宁波日晟新材料有限公司 | Silicon carbide polishing solution containing reducing agent and preparation method and application thereof |
CN114952437B (en) * | 2022-05-27 | 2023-08-18 | 中国人民解放军国防科技大学 | Processing method of NiP modified layer |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5858813A (en) * | 1996-05-10 | 1999-01-12 | Cabot Corporation | Chemical mechanical polishing slurry for metal layers and films |
TW501197B (en) * | 1999-08-17 | 2002-09-01 | Hitachi Chemical Co Ltd | Polishing compound for chemical mechanical polishing and method for polishing substrate |
JP4238951B2 (en) * | 1999-09-28 | 2009-03-18 | 株式会社フジミインコーポレーテッド | Polishing composition and method for producing memory hard disk using the same |
JP2001187878A (en) * | 1999-12-28 | 2001-07-10 | Nec Corp | Slurry for chemical mechanical polishing |
US6355075B1 (en) * | 2000-02-11 | 2002-03-12 | Fujimi Incorporated | Polishing composition |
-
2001
- 2001-03-29 JP JP2001096699A patent/JP4439755B2/en not_active Expired - Lifetime
-
2002
- 2002-03-14 GB GB0206036A patent/GB2375116B/en not_active Expired - Fee Related
- 2002-03-22 MY MYPI20021016 patent/MY131997A/en unknown
- 2002-03-29 CN CN 02107700 patent/CN1234798C/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN1379074A (en) | 2002-11-13 |
JP2002294225A (en) | 2002-10-09 |
GB2375116A (en) | 2002-11-06 |
MY131997A (en) | 2007-09-28 |
JP4439755B2 (en) | 2010-03-24 |
GB2375116B (en) | 2004-10-20 |
CN1234798C (en) | 2006-01-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20080314 |