FR84400E - Nouveaux composés macromoléculaires photosensibles et leurs applications, notamment en photographie - Google Patents

Nouveaux composés macromoléculaires photosensibles et leurs applications, notamment en photographie

Info

Publication number
FR84400E
FR84400E FR949068A FR949068A FR84400E FR 84400 E FR84400 E FR 84400E FR 949068 A FR949068 A FR 949068A FR 949068 A FR949068 A FR 949068A FR 84400 E FR84400 E FR 84400E
Authority
FR
France
Prior art keywords
photography
applications
macromolecular compounds
new photosensitive
photosensitive macromolecular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR949068A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Pathe SA
Original Assignee
Kodak Pathe SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Pathe SA filed Critical Kodak Pathe SA
Priority to FR949068A priority Critical patent/FR84400E/fr
Application granted granted Critical
Publication of FR84400E publication Critical patent/FR84400E/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
FR949068A 1963-09-30 1963-09-30 Nouveaux composés macromoléculaires photosensibles et leurs applications, notamment en photographie Expired FR84400E (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR949068A FR84400E (fr) 1963-09-30 1963-09-30 Nouveaux composés macromoléculaires photosensibles et leurs applications, notamment en photographie

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR949068A FR84400E (fr) 1963-09-30 1963-09-30 Nouveaux composés macromoléculaires photosensibles et leurs applications, notamment en photographie

Publications (1)

Publication Number Publication Date
FR84400E true FR84400E (fr) 1965-01-29

Family

ID=8813359

Family Applications (1)

Application Number Title Priority Date Filing Date
FR949068A Expired FR84400E (fr) 1963-09-30 1963-09-30 Nouveaux composés macromoléculaires photosensibles et leurs applications, notamment en photographie

Country Status (1)

Country Link
FR (1) FR84400E (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0013006B1 (fr) * 1978-12-25 1983-06-22 Mitsubishi Kasei Corporation Composition de développement pour plaques lithographiques
CN117797414A (zh) * 2024-01-02 2024-04-02 南通大学 一种便于移动的背部激光理疗装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0013006B1 (fr) * 1978-12-25 1983-06-22 Mitsubishi Kasei Corporation Composition de développement pour plaques lithographiques
CN117797414A (zh) * 2024-01-02 2024-04-02 南通大学 一种便于移动的背部激光理疗装置
CN117797414B (zh) * 2024-01-02 2024-05-31 南通大学 一种便于移动的背部激光理疗装置

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