FR84400E - Nouveaux composés macromoléculaires photosensibles et leurs applications, notamment en photographie - Google Patents
Nouveaux composés macromoléculaires photosensibles et leurs applications, notamment en photographieInfo
- Publication number
- FR84400E FR84400E FR949068A FR949068A FR84400E FR 84400 E FR84400 E FR 84400E FR 949068 A FR949068 A FR 949068A FR 949068 A FR949068 A FR 949068A FR 84400 E FR84400 E FR 84400E
- Authority
- FR
- France
- Prior art keywords
- photography
- applications
- macromolecular compounds
- new photosensitive
- photosensitive macromolecular
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR949068A FR84400E (fr) | 1963-09-30 | 1963-09-30 | Nouveaux composés macromoléculaires photosensibles et leurs applications, notamment en photographie |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR949068A FR84400E (fr) | 1963-09-30 | 1963-09-30 | Nouveaux composés macromoléculaires photosensibles et leurs applications, notamment en photographie |
Publications (1)
Publication Number | Publication Date |
---|---|
FR84400E true FR84400E (fr) | 1965-01-29 |
Family
ID=8813359
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR949068A Expired FR84400E (fr) | 1963-09-30 | 1963-09-30 | Nouveaux composés macromoléculaires photosensibles et leurs applications, notamment en photographie |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR84400E (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0013006B1 (fr) * | 1978-12-25 | 1983-06-22 | Mitsubishi Kasei Corporation | Composition de développement pour plaques lithographiques |
CN117797414A (zh) * | 2024-01-02 | 2024-04-02 | 南通大学 | 一种便于移动的背部激光理疗装置 |
-
1963
- 1963-09-30 FR FR949068A patent/FR84400E/fr not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0013006B1 (fr) * | 1978-12-25 | 1983-06-22 | Mitsubishi Kasei Corporation | Composition de développement pour plaques lithographiques |
CN117797414A (zh) * | 2024-01-02 | 2024-04-02 | 南通大学 | 一种便于移动的背部激光理疗装置 |
CN117797414B (zh) * | 2024-01-02 | 2024-05-31 | 南通大学 | 一种便于移动的背部激光理疗装置 |
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