FR3109672B1 - Procede de fabrication d’une electrode poreuse, et microbatterie contenant une telle electrode - Google Patents

Procede de fabrication d’une electrode poreuse, et microbatterie contenant une telle electrode Download PDF

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FR3109672B1
FR3109672B1 FR2004187A FR2004187A FR3109672B1 FR 3109672 B1 FR3109672 B1 FR 3109672B1 FR 2004187 A FR2004187 A FR 2004187A FR 2004187 A FR2004187 A FR 2004187A FR 3109672 B1 FR3109672 B1 FR 3109672B1
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electrode
layer
manufacturing
porous
microbattery
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FR2004187A
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FR3109672A1 (fr
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Fabien Gaben
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I Ten SA
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I Ten SA
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Priority to FR2004187A priority Critical patent/FR3109672B1/fr
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Priority to KR1020227041806A priority patent/KR20230005326A/ko
Priority to TW110115415A priority patent/TW202147669A/zh
Priority to CA3174836A priority patent/CA3174836A1/fr
Priority to CN202180045489.2A priority patent/CN115997296A/zh
Priority to IL296894A priority patent/IL296894A/en
Priority to JP2022565753A priority patent/JP2023523339A/ja
Priority to EP21722300.7A priority patent/EP4143899A1/fr
Priority to US17/996,345 priority patent/US20230238502A1/en
Priority to PCT/IB2021/053497 priority patent/WO2021220174A1/fr
Publication of FR3109672A1 publication Critical patent/FR3109672A1/fr
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/04—Processes of manufacture in general
    • H01M4/0402—Methods of deposition of the material
    • H01M4/0404—Methods of deposition of the material by coating on electrode collectors
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45553—Atomic layer deposition [ALD] characterized by the use of precursors specially adapted for ALD
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00—Electrophoretic coating characterised by the process
    • C25D13/12—Electrophoretic coating characterised by the process characterised by the article coated
    • H—ELECTRICITY
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    • H01M10/052—Li-accumulators
    • H01M10/0525—Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
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    • H01M2004/021—Physical characteristics, e.g. porosity, surface area
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
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    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
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Abstract

Procédé de fabrication d’une électrode présentant une porosité comprise entre 20 % et 60% en volume et des pores de diamètre moyen inférieur à 50 nm, dans lequel procédé : (a) on approvisionne un substrat et une suspension colloïdale comprenant des agrégats ou des agglomérats de nanoparticules primaires monodisperses d’un matériau actif d’électrode, de diamètre primaire moyen D50 compris entre 2 et 100 nm, lesdits agrégats ou agglomérats présentant un diamètre moyen D50 compris entre 50 nm et 300 nm, (b) on dépose sur ledit substrat une couche à partir de ladite suspension colloïdale par une technique sélectionnée dans le groupe formé par : l’électrophorèse, une technique d’impression et une technique d’enduction ; (c) on sèche ladite couche obtenue à l’étape (b) et on la consolide, par pressage et/ou chauffage, pour obtenir une couche mésoporeuse, (d) on dépose, sur et à l’intérieur des pores de ladite couche poreuse, un revêtement d’un matériau conducteur électronique. Cette électrode poreuse peut être utilisée dans des microbatteries à ions de lithium.
FR2004187A 2020-04-28 2020-04-28 Procede de fabrication d’une electrode poreuse, et microbatterie contenant une telle electrode Active FR3109672B1 (fr)

Priority Applications (10)

Application Number Priority Date Filing Date Title
FR2004187A FR3109672B1 (fr) 2020-04-28 2020-04-28 Procede de fabrication d’une electrode poreuse, et microbatterie contenant une telle electrode
US17/996,345 US20230238502A1 (en) 2020-04-28 2021-04-28 Method for manufacturing a porous electrode, and microbattery containing such an electrode
CA3174836A CA3174836A1 (fr) 2020-04-28 2021-04-28 Procede de fabrication d'une electrode poreuse, et microbatterie contenant une telle electrode
CN202180045489.2A CN115997296A (zh) 2020-04-28 2021-04-28 用于制造多孔电极的方法和包含这种电极的微电池
IL296894A IL296894A (en) 2020-04-28 2021-04-28 A method for producing a porous electrode and a micro-battery containing such an electrode
JP2022565753A JP2023523339A (ja) 2020-04-28 2021-04-28 多孔性電極を製造する方法、及びそうした電極を含むマイクロ電池
KR1020227041806A KR20230005326A (ko) 2020-04-28 2021-04-28 다공성 전극을 제조하기 위한 방법 및 그러한 전극을 포함하는 마이크로배터리
TW110115415A TW202147669A (zh) 2020-04-28 2021-04-28 製造的多孔電極的方法、多孔電極、製造電池的方法及鋰離子電池
PCT/IB2021/053497 WO2021220174A1 (fr) 2020-04-28 2021-04-28 Procédé de fabrication d'une électrode poreuse, et microbatterie contenant une telle électrode
EP21722300.7A EP4143899A1 (fr) 2020-04-28 2021-04-28 Procédé de fabrication d'une électrode poreuse, et microbatterie contenant une telle électrode

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR2004187A FR3109672B1 (fr) 2020-04-28 2020-04-28 Procede de fabrication d’une electrode poreuse, et microbatterie contenant une telle electrode
FR2004187 2020-04-28

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FR3109672A1 FR3109672A1 (fr) 2021-10-29
FR3109672B1 true FR3109672B1 (fr) 2022-10-14

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US (1) US20230238502A1 (fr)
EP (1) EP4143899A1 (fr)
JP (1) JP2023523339A (fr)
KR (1) KR20230005326A (fr)
CN (1) CN115997296A (fr)
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JP2023523339A (ja) 2023-06-02
KR20230005326A (ko) 2023-01-09
CN115997296A (zh) 2023-04-21
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WO2021220174A1 (fr) 2021-11-04

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