FR3080933B1 - PROCESS OF INSENSITIZATION TO DEFOCALIZATION BY PHASE MASK OF A SPECTROMETER FOR ON-BOARD OBSERVATION INSTRUMENTS - Google Patents
PROCESS OF INSENSITIZATION TO DEFOCALIZATION BY PHASE MASK OF A SPECTROMETER FOR ON-BOARD OBSERVATION INSTRUMENTS Download PDFInfo
- Publication number
- FR3080933B1 FR3080933B1 FR1800425A FR1800425A FR3080933B1 FR 3080933 B1 FR3080933 B1 FR 3080933B1 FR 1800425 A FR1800425 A FR 1800425A FR 1800425 A FR1800425 A FR 1800425A FR 3080933 B1 FR3080933 B1 FR 3080933B1
- Authority
- FR
- France
- Prior art keywords
- spectrometer
- phase mask
- parameter
- defocalization
- insensitization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title abstract 3
- 230000003287 optical effect Effects 0.000 abstract 3
- 238000005457 optimization Methods 0.000 abstract 2
- 230000000593 degrading effect Effects 0.000 abstract 1
- 239000006185 dispersion Substances 0.000 abstract 1
- 230000000717 retained effect Effects 0.000 abstract 1
- 230000003595 spectral effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J3/18—Generating the spectrum; Monochromators using diffraction elements, e.g. grating
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0229—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using masks, aperture plates, spatial light modulators or spatial filters, e.g. reflective filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0075—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. increasing, the depth of field or depth of focus
Abstract
Le domaine de l'invention est celui des procédés de calcul d'une architecture optique d'un instrument d'observation comportant un spectromètre, ledit instrument étant soumis à une perturbation dégradant son architecture optique. Le spectromètre comporte une fente d'entrée (21), un masque de phase défini par un paramètre (α) et un réseau de dispersion spectrale (23). Le procédé selon l'invention opère de la manière suivante : Un écart maximal (ε FWHM) est défini en fonction de la résolution optique du spectromètre avec et sans masque de phase ; Une erreur de forme est également définie en fonction de la résolution minimale et de la résolution dégradée du spectromètre comportant le masque de phase ; Dans une étape d'optimisation, on calcule le minimum de cette erreur de forme en faisant varier le paramètre (α) sous la contrainte que l'écart maximal ε FWHM reste inférieur à un seuil donné. Le paramètre (αMIN) correspondant à l'optimum de ce problème d'optimisation est retenu pour l'élaboration du masque de phase.The field of the invention is that of methods for calculating an optical architecture of an observation instrument comprising a spectrometer, said instrument being subjected to a disturbance degrading its optical architecture. The spectrometer comprises an entrance slit (21), a phase mask defined by a parameter (α) and a spectral dispersion grating (23). The method according to the invention operates as follows: A maximum deviation (ε FWHM) is defined as a function of the optical resolution of the spectrometer with and without phase mask; A shape error is also defined as a function of the minimum resolution and the degraded resolution of the spectrometer comprising the phase mask; In an optimization step, the minimum of this shape error is calculated by varying the parameter (α) under the constraint that the maximum deviation ε FWHM remains below a given threshold. The parameter (αMIN) corresponding to the optimum of this optimization problem is retained for the development of the phase mask.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1800425A FR3080933B1 (en) | 2018-05-03 | 2018-05-03 | PROCESS OF INSENSITIZATION TO DEFOCALIZATION BY PHASE MASK OF A SPECTROMETER FOR ON-BOARD OBSERVATION INSTRUMENTS |
| EP19169729.1A EP3564634B1 (en) | 2018-05-03 | 2019-04-17 | Method for desensitisation of a spectrometer to defocusing by phase mask for built-in observation instruments |
| CA3041691A CA3041691A1 (en) | 2018-05-03 | 2019-04-30 | Desensitization process to lack of focus by phase masking of a spectrometer for onboard observation instruments |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1800425A FR3080933B1 (en) | 2018-05-03 | 2018-05-03 | PROCESS OF INSENSITIZATION TO DEFOCALIZATION BY PHASE MASK OF A SPECTROMETER FOR ON-BOARD OBSERVATION INSTRUMENTS |
| FR1800425 | 2018-05-03 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR3080933A1 FR3080933A1 (en) | 2019-11-08 |
| FR3080933B1 true FR3080933B1 (en) | 2021-04-23 |
Family
ID=63490508
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR1800425A Expired - Fee Related FR3080933B1 (en) | 2018-05-03 | 2018-05-03 | PROCESS OF INSENSITIZATION TO DEFOCALIZATION BY PHASE MASK OF A SPECTROMETER FOR ON-BOARD OBSERVATION INSTRUMENTS |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP3564634B1 (en) |
| CA (1) | CA3041691A1 (en) |
| FR (1) | FR3080933B1 (en) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2923028B1 (en) * | 2007-10-26 | 2010-04-16 | Thales Sa | WAVELENGTH SUB-LENGTH COMPUTING IMAGING DEVICE |
| US8610813B2 (en) * | 2011-05-31 | 2013-12-17 | Omnivision Technologies, Inc. | System and method for extending depth of field in a lens system by use of color-dependent wavefront coding |
| DE102016005386B4 (en) * | 2016-05-04 | 2018-04-05 | Spectro Analytical Instruments Gmbh | Optomechanically compensated spectrometer |
-
2018
- 2018-05-03 FR FR1800425A patent/FR3080933B1/en not_active Expired - Fee Related
-
2019
- 2019-04-17 EP EP19169729.1A patent/EP3564634B1/en active Active
- 2019-04-30 CA CA3041691A patent/CA3041691A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| EP3564634B1 (en) | 2021-02-17 |
| CA3041691A1 (en) | 2019-11-03 |
| FR3080933A1 (en) | 2019-11-08 |
| EP3564634A1 (en) | 2019-11-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PLFP | Fee payment |
Year of fee payment: 2 |
|
| PLSC | Publication of the preliminary search report |
Effective date: 20191108 |
|
| PLFP | Fee payment |
Year of fee payment: 3 |
|
| PLFP | Fee payment |
Year of fee payment: 4 |
|
| ST | Notification of lapse |
Effective date: 20230105 |