FR3033932B1 - Systeme de deplacement relatif entre deux plaques et dispositif de positionnement comprenant un tel systeme de deplacement. - Google Patents

Systeme de deplacement relatif entre deux plaques et dispositif de positionnement comprenant un tel systeme de deplacement. Download PDF

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Publication number
FR3033932B1
FR3033932B1 FR1552150A FR1552150A FR3033932B1 FR 3033932 B1 FR3033932 B1 FR 3033932B1 FR 1552150 A FR1552150 A FR 1552150A FR 1552150 A FR1552150 A FR 1552150A FR 3033932 B1 FR3033932 B1 FR 3033932B1
Authority
FR
France
Prior art keywords
plates
relative movement
positioning device
displacement
displacement system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1552150A
Other languages
English (en)
Other versions
FR3033932A1 (fr
Inventor
Bertrand de Saint Leve d'Aguerre
Alain Jeanne
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Micro Controle Spectra Physics SAS
Original Assignee
Micro Controle Spectra Physics SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micro Controle Spectra Physics SAS filed Critical Micro Controle Spectra Physics SAS
Priority to FR1552150A priority Critical patent/FR3033932B1/fr
Priority to IL244591A priority patent/IL244591B/en
Priority to DE102016104737.6A priority patent/DE102016104737A1/de
Priority to US15/071,582 priority patent/US20160271790A1/en
Publication of FR3033932A1 publication Critical patent/FR3033932A1/fr
Application granted granted Critical
Publication of FR3033932B1 publication Critical patent/FR3033932B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/58—Baseboards, masking frames, or other holders for the sensitive material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J7/00—Micromanipulators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR1552150A 2015-03-16 2015-03-16 Systeme de deplacement relatif entre deux plaques et dispositif de positionnement comprenant un tel systeme de deplacement. Active FR3033932B1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR1552150A FR3033932B1 (fr) 2015-03-16 2015-03-16 Systeme de deplacement relatif entre deux plaques et dispositif de positionnement comprenant un tel systeme de deplacement.
IL244591A IL244591B (en) 2015-03-16 2016-03-14 A system for relative movement between two plates and a positioning device including such a system
DE102016104737.6A DE102016104737A1 (de) 2015-03-16 2016-03-15 System zur Relativbewegung zwischen zwei Platten und Positionierungsvorrichtung mit einem solchen Bewegungssystem
US15/071,582 US20160271790A1 (en) 2015-03-16 2016-03-16 System for relative movement between two plates and positioning device comprising such a movement system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1552150 2015-03-16
FR1552150A FR3033932B1 (fr) 2015-03-16 2015-03-16 Systeme de deplacement relatif entre deux plaques et dispositif de positionnement comprenant un tel systeme de deplacement.

Publications (2)

Publication Number Publication Date
FR3033932A1 FR3033932A1 (fr) 2016-09-23
FR3033932B1 true FR3033932B1 (fr) 2018-03-16

Family

ID=52991851

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1552150A Active FR3033932B1 (fr) 2015-03-16 2015-03-16 Systeme de deplacement relatif entre deux plaques et dispositif de positionnement comprenant un tel systeme de deplacement.

Country Status (4)

Country Link
US (1) US20160271790A1 (fr)
DE (1) DE102016104737A1 (fr)
FR (1) FR3033932B1 (fr)
IL (1) IL244591B (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107696024B (zh) * 2017-11-17 2020-05-12 嘉兴学院 一种基于气动肌肉的交叉耦合仿生关节
CN110311224A (zh) * 2019-07-23 2019-10-08 深圳锐越微技术有限公司 小间距微带天线阵列
CN117008270B (zh) * 2023-09-26 2023-12-08 上海隐冠半导体技术有限公司 一种调平调焦机构

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9216461D0 (en) * 1992-08-03 1992-09-16 Smith James A Eucentric goniometer or motion system
US6121743A (en) * 1996-03-22 2000-09-19 Genmark Automation, Inc. Dual robotic arm end effectors having independent yaw motion
CA2492147A1 (fr) * 2002-07-09 2004-01-15 Amir Khajepour Manipulateurs paralleles legers utilisant des cables actifs/passifs
ATE441876T1 (de) * 2003-07-17 2009-09-15 Newport Corp Hochauflísender dynamischer positionierungsmechanismus
JP2005327993A (ja) * 2004-05-17 2005-11-24 Canon Inc 位置決め装置、露光装置及びデバイス製造方法
WO2010023935A1 (fr) * 2008-08-29 2010-03-04 株式会社ニコン Dispositif et procédé d'alignement de substrats, et procédé de fabrication de semi-conducteur multicouche
US8601897B2 (en) * 2009-11-30 2013-12-10 GM Global Technology Operations LLC Force limiting device and method
WO2011154429A1 (fr) * 2010-06-08 2011-12-15 Beckhoff Automation Gmbh Module de robot et robot
DE102011006679B4 (de) * 2011-03-16 2018-07-12 Ferrobotics Compliant Robot Technology Gmbh Aktive Handhabungsvorrichtung und Verfahren für Kontaktaufgaben
CN102632508B (zh) * 2012-04-17 2015-04-29 浙江大学 一种适用于机器人关节的平面扭簧
KR101419897B1 (ko) * 2012-04-26 2014-07-15 고려대학교 산학협력단 병렬형 5자유도 마이크로 로봇
US9811067B2 (en) * 2015-02-12 2017-11-07 Nhk Spring Co., Ltd. Coil spring modeling apparatus and method of the same

Also Published As

Publication number Publication date
IL244591A0 (en) 2016-07-31
IL244591B (en) 2021-02-28
FR3033932A1 (fr) 2016-09-23
DE102016104737A1 (de) 2017-03-09
US20160271790A1 (en) 2016-09-22

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