FR3033643B1 - Dispositif et procede pour detecter des defauts dans des zones de liaison entre des echantillons tels que des wafers - Google Patents
Dispositif et procede pour detecter des defauts dans des zones de liaison entre des echantillons tels que des wafers Download PDFInfo
- Publication number
- FR3033643B1 FR3033643B1 FR1552076A FR1552076A FR3033643B1 FR 3033643 B1 FR3033643 B1 FR 3033643B1 FR 1552076 A FR1552076 A FR 1552076A FR 1552076 A FR1552076 A FR 1552076A FR 3033643 B1 FR3033643 B1 FR 3033643B1
- Authority
- FR
- France
- Prior art keywords
- optical
- samples
- arm
- area
- wafers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 235000012431 wafers Nutrition 0.000 title 1
- 230000003287 optical effect Effects 0.000 abstract 4
- 238000005259 measurement Methods 0.000 abstract 3
- 230000003750 conditioning effect Effects 0.000 abstract 1
- 230000007547 defect Effects 0.000 abstract 1
- 238000012544 monitoring process Methods 0.000 abstract 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/0201—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal phase variation
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
- G01B9/02078—Caused by ambiguity
- G01B9/02079—Quadrature detection, i.e. detecting relatively phase-shifted signals
- G01B9/02081—Quadrature detection, i.e. detecting relatively phase-shifted signals simultaneous quadrature detection, e.g. by spatial phase shifting
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/0209—Low-coherence interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/8422—Investigating thin films, e.g. matrix isolation method
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- General Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mathematical Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
La présente invention concerne un dispositif de mesure pour contrôler une zone de liaison (18) entre des échantillons (16, 17), comprenant (i) un interféromètre à faible cohérence illuminé par une source de lumière polychromatique avec un bras de mesure traversant ladite zone de liaison (18) et un bras de référence, (ii) au moins un détecteur optique (10) et des moyens de conditionnement optiques et/ou mécaniques (15) agencés pour permettre l'acquisition d'au moins deux mesures d'interférences avec des conditions de phase différentes entre un faisceau optique de mesure (21) issu du bras de mesure et un faisceau optique de référence (20) issu du bras de référence ; et (iii) des moyens de calcul (25) agencés pour calculer une information de contraste desdites interférences, et rechercher sur la base de ladite information de contraste des défauts (19) dans ladite zone de liaison (18).
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1552076A FR3033643B1 (fr) | 2015-03-13 | 2015-03-13 | Dispositif et procede pour detecter des defauts dans des zones de liaison entre des echantillons tels que des wafers |
US15/556,988 US20180059032A1 (en) | 2015-03-13 | 2016-03-10 | Device and method for detecting defects in bonding zones between samples such as wafers |
EP16713297.6A EP3268728A1 (fr) | 2015-03-13 | 2016-03-10 | Dispositif et procede pour detecter des defauts dans des zones de liaison entre des echantillons tels que des wafers |
PCT/EP2016/055071 WO2016146460A1 (fr) | 2015-03-13 | 2016-03-10 | Dispositif et procede pour detecter des defauts dans des zones de liaison entre des echantillons tels que des wafers |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1552076A FR3033643B1 (fr) | 2015-03-13 | 2015-03-13 | Dispositif et procede pour detecter des defauts dans des zones de liaison entre des echantillons tels que des wafers |
FR1552076 | 2015-03-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR3033643A1 FR3033643A1 (fr) | 2016-09-16 |
FR3033643B1 true FR3033643B1 (fr) | 2020-07-17 |
Family
ID=53776703
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1552076A Active FR3033643B1 (fr) | 2015-03-13 | 2015-03-13 | Dispositif et procede pour detecter des defauts dans des zones de liaison entre des echantillons tels que des wafers |
Country Status (4)
Country | Link |
---|---|
US (1) | US20180059032A1 (fr) |
EP (1) | EP3268728A1 (fr) |
FR (1) | FR3033643B1 (fr) |
WO (1) | WO2016146460A1 (fr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10872873B2 (en) * | 2017-11-14 | 2020-12-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for bonding wafers and bonding tool |
JP7312278B2 (ja) * | 2019-06-07 | 2023-07-20 | フォーガル ナノテック | 光学素子の界面を測定するための装置および方法 |
CN112595720A (zh) * | 2020-12-21 | 2021-04-02 | 藤仓烽火光电材料科技有限公司 | 一种基于激光干涉成像检测疏松体的*** |
CN113504249B (zh) * | 2021-06-26 | 2023-01-24 | 长江存储科技有限责任公司 | 键合晶圆的空洞检测方法及键合晶圆的空洞检测装置 |
US20240035810A1 (en) * | 2022-08-01 | 2024-02-01 | Kla Corporation | 3d profilometry with a linnik interferometer |
EP4382895A1 (fr) * | 2022-12-08 | 2024-06-12 | Unity Semiconductor | Procédé d'inspection pour détecter une interface de liaison défectueuse dans un substrat d'échantillon et système de mesure mettant en oeuvre le procédé |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002100660A (ja) * | 2000-07-18 | 2002-04-05 | Hitachi Ltd | 欠陥検出方法と欠陥観察方法及び欠陥検出装置 |
US7016048B2 (en) * | 2002-04-09 | 2006-03-21 | The Regents Of The University Of California | Phase-resolved functional optical coherence tomography: simultaneous imaging of the stokes vectors, structure, blood flow velocity, standard deviation and birefringence in biological samples |
US7209239B2 (en) * | 2002-10-02 | 2007-04-24 | Kla-Tencor Technologies Corporation | System and method for coherent optical inspection |
US7271918B2 (en) * | 2003-03-06 | 2007-09-18 | Zygo Corporation | Profiling complex surface structures using scanning interferometry |
JP4381847B2 (ja) * | 2004-02-26 | 2009-12-09 | 株式会社トプコン | 光画像計測装置 |
JP4566685B2 (ja) * | 2004-10-13 | 2010-10-20 | 株式会社トプコン | 光画像計測装置及び光画像計測方法 |
US7986412B2 (en) * | 2008-06-03 | 2011-07-26 | Jzw Llc | Interferometric defect detection and classification |
US9355919B2 (en) * | 2010-08-24 | 2016-05-31 | Nanda Technologies Gmbh | Methods and systems for inspecting bonded wafers |
DE102011051146B3 (de) * | 2011-06-17 | 2012-10-04 | Precitec Optronik Gmbh | Prüfverfahren zum Prüfen einer Verbindungsschicht zwischen waferförmigen Proben |
JP5787255B2 (ja) * | 2011-07-12 | 2015-09-30 | 国立大学法人 筑波大学 | Ps−octの計測データを補正するプログラム及び該プログラムを搭載したps−octシステム |
JP5984351B2 (ja) * | 2011-09-14 | 2016-09-06 | キヤノン株式会社 | 計測装置 |
FR2994734B1 (fr) * | 2012-08-21 | 2017-08-25 | Fogale Nanotech | Dispositif et procede pour faire des mesures dimensionnelles sur des objets multi-couches tels que des wafers. |
US20140333936A1 (en) * | 2013-05-10 | 2014-11-13 | Industrial Technology Research Institute | Thickness measuring system and method for a bonding layer |
US9389064B2 (en) * | 2014-03-28 | 2016-07-12 | Intel Corporation | Inline inspection of the contact between conductive traces and substrate for hidden defects using white light interferometer with tilted objective lens |
-
2015
- 2015-03-13 FR FR1552076A patent/FR3033643B1/fr active Active
-
2016
- 2016-03-10 WO PCT/EP2016/055071 patent/WO2016146460A1/fr active Application Filing
- 2016-03-10 EP EP16713297.6A patent/EP3268728A1/fr not_active Withdrawn
- 2016-03-10 US US15/556,988 patent/US20180059032A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
WO2016146460A1 (fr) | 2016-09-22 |
EP3268728A1 (fr) | 2018-01-17 |
FR3033643A1 (fr) | 2016-09-16 |
US20180059032A1 (en) | 2018-03-01 |
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Legal Events
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PLFP | Fee payment |
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TP | Transmission of property |
Owner name: UNITY SEMICONDUCTOR, FR Effective date: 20180316 |
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