FR3022249B1 - Procede de controle de la periode d'un film de copolymere a blocs nanostructue a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure - Google Patents

Procede de controle de la periode d'un film de copolymere a blocs nanostructue a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure Download PDF

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Publication number
FR3022249B1
FR3022249B1 FR1455294A FR1455294A FR3022249B1 FR 3022249 B1 FR3022249 B1 FR 3022249B1 FR 1455294 A FR1455294 A FR 1455294A FR 1455294 A FR1455294 A FR 1455294A FR 3022249 B1 FR3022249 B1 FR 3022249B1
Authority
FR
France
Prior art keywords
block copolymer
copolymer film
nanostructue
styrene
period
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1455294A
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English (en)
Other versions
FR3022249A1 (fr
Inventor
Christophe Navarro
Celia Nicolet
Xavier Chevalier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Arkema France SA
Original Assignee
Arkema France SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arkema France SA filed Critical Arkema France SA
Priority to FR1455294A priority Critical patent/FR3022249B1/fr
Priority to TW104116658A priority patent/TWI567127B/zh
Priority to KR1020177000762A priority patent/KR101922353B1/ko
Priority to EP15732825.3A priority patent/EP3155028A1/fr
Priority to US15/317,803 priority patent/US9976053B2/en
Priority to CN201580042917.0A priority patent/CN106661171A/zh
Priority to PCT/FR2015/051430 priority patent/WO2015189495A1/fr
Priority to JP2016572506A priority patent/JP6449342B2/ja
Priority to SG11201610321UA priority patent/SG11201610321UA/en
Publication of FR3022249A1 publication Critical patent/FR3022249A1/fr
Application granted granted Critical
Publication of FR3022249B1 publication Critical patent/FR3022249B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
    • B05D1/005—Spin coating
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2325/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Derivatives of such polymers
    • C08J2325/02—Homopolymers or copolymers of hydrocarbons
    • C08J2325/04—Homopolymers or copolymers of styrene
    • C08J2325/08—Copolymers of styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2333/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C08J2333/08—Homopolymers or copolymers of acrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2353/00—Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Graft Or Block Polymers (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
FR1455294A 2014-06-11 2014-06-11 Procede de controle de la periode d'un film de copolymere a blocs nanostructue a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure Expired - Fee Related FR3022249B1 (fr)

Priority Applications (9)

Application Number Priority Date Filing Date Title
FR1455294A FR3022249B1 (fr) 2014-06-11 2014-06-11 Procede de controle de la periode d'un film de copolymere a blocs nanostructue a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure
TW104116658A TWI567127B (zh) 2014-06-11 2015-05-25 控制建基於苯乙烯及甲基丙烯酸甲酯之奈米結構嵌段共聚物膜週期之方法、以及奈米結構嵌段共聚物膜
EP15732825.3A EP3155028A1 (fr) 2014-06-11 2015-06-01 Procédé de contrôle de la période d'un film de copolymère a blocs nanostructuré a base de styrene, et de methacrylate de methyle, et film de copolymère a blocs nanostructure
US15/317,803 US9976053B2 (en) 2014-06-11 2015-06-01 Process for controlling the period of a nanostructured block copolymer film based on styrene and on methyl methacrylate, and nanostructured block copolymer film
KR1020177000762A KR101922353B1 (ko) 2014-06-11 2015-06-01 스티렌 및 메틸 메타크릴레이트로 제조된 나노구조화 블록 공중합체 필름의 간격 조절 방법, 및 나노구조화 블록 공중합체 필름
CN201580042917.0A CN106661171A (zh) 2014-06-11 2015-06-01 控制由苯乙烯和甲基丙烯酸甲酯制备的纳米结构化的嵌段共聚物膜的周期的方法、和纳米结构化的嵌段共聚物膜
PCT/FR2015/051430 WO2015189495A1 (fr) 2014-06-11 2015-06-01 Procédé de contrôle de la période d'un film de copolymère a blocs nanostructuré a base de styrene, et de methacrylate de methyle, et film de copolymère a blocs nanostructure
JP2016572506A JP6449342B2 (ja) 2014-06-11 2015-06-01 スチレン及びメチルメタクリレートに基づくナノ構造化ブロック共重合体フィルムの周期をコントロールする方法、及びナノ構造化ブロック共重合体フィルム
SG11201610321UA SG11201610321UA (en) 2014-06-11 2015-06-01 Method for controlling the period of a nanostructured block copolymer film made of styrene and methyl methacrylate, and nanostructured block copolymer film

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1455294 2014-06-11
FR1455294A FR3022249B1 (fr) 2014-06-11 2014-06-11 Procede de controle de la periode d'un film de copolymere a blocs nanostructue a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure

Publications (2)

Publication Number Publication Date
FR3022249A1 FR3022249A1 (fr) 2015-12-18
FR3022249B1 true FR3022249B1 (fr) 2018-01-19

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FR1455294A Expired - Fee Related FR3022249B1 (fr) 2014-06-11 2014-06-11 Procede de controle de la periode d'un film de copolymere a blocs nanostructue a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure

Country Status (9)

Country Link
US (1) US9976053B2 (fr)
EP (1) EP3155028A1 (fr)
JP (1) JP6449342B2 (fr)
KR (1) KR101922353B1 (fr)
CN (1) CN106661171A (fr)
FR (1) FR3022249B1 (fr)
SG (1) SG11201610321UA (fr)
TW (1) TWI567127B (fr)
WO (1) WO2015189495A1 (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3029921B1 (fr) * 2014-12-16 2018-06-29 Arkema France Procede de controle de la synthese d'un copolymere a blocs contenant au moins un bloc apolaire et au moins un bloc polaire et utilisation d'un tel copolymere a blocs dans des applications de nano-lithographie par auto-assemblage direct.
FR3045644A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs
FR3045642A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede de reduction du temps de structuration de films ordonnes de copolymere a blocs
FR3045643A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'amelioration de l'uniformite de dimension critique de films ordonnes de copolymere a blocs
FR3045645B1 (fr) * 2015-12-18 2019-07-05 Arkema France Procede de reduction des defauts dans un film ordonne de copolymeres a blocs
US12024604B2 (en) 2018-07-29 2024-07-02 Yissum Research Development Company Of The Hebrew University Of Jerusalem Ltd. Multi-morphology block co-polymer films and processes for their preparation
CN109796567A (zh) * 2018-12-30 2019-05-24 复旦大学 一种含液晶单元的定向自组装嵌段共聚物及其合成与应用方法
KR20230119186A (ko) * 2020-12-17 2023-08-16 메르크 파텐트 게엠베하 지향성 자기 조립을 위한 교호 공중합체 세그먼트로이루어진 조정 가능한 하이 카이 디블록 공중합체 및 그의 적용
JP7506237B1 (ja) 2023-09-04 2024-06-25 住友化学株式会社 組成物、重合体、硬化物、成形体及びポリメタクリル酸メチルの製造方法

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JPH0757788B2 (ja) * 1989-08-22 1995-06-21 旭化成工業株式会社 ブロック共重合体
FR2679237B1 (fr) 1991-07-19 1994-07-22 Atochem Systeme d'amorcage pour la polymerisation anionique de monomeres (meth) acryliques.
FR2735480B1 (fr) 1995-06-15 1997-07-18 Atochem Elf Sa Procede de polymerisation anionique en continu d'au moins un monomere (meth)acrylique pour l'obtention de polymeres a haut taux de solide
JP4127682B2 (ja) * 1999-06-07 2008-07-30 株式会社東芝 パターン形成方法
JP2012513512A (ja) * 2008-12-23 2012-06-14 ビーエーエスエフ ソシエタス・ヨーロピア 非相溶性硬質ブロックからなる相分離型ブロックコポリマーと高剛性の成形材料
JP2010180353A (ja) * 2009-02-06 2010-08-19 Kyoto Univ ブロック共重合体の製造方法
US8398868B2 (en) * 2009-05-19 2013-03-19 International Business Machines Corporation Directed self-assembly of block copolymers using segmented prepatterns
US8304493B2 (en) 2010-08-20 2012-11-06 Micron Technology, Inc. Methods of forming block copolymers
FR2974094A1 (fr) 2011-04-15 2012-10-19 Arkema France Procede de preparation de surfaces
JP6218241B2 (ja) 2011-07-29 2017-10-25 ウィスコンシン・アルムナイ・リサーチ・ファウンデーションＷｉｓｃｏｎｓｉｎ Ａｌｕｍｎｉ Ｒｅｓｅａｒｃｈ Ｆｏｕｎｄａｔｉｏｎ 薄膜の誘導組織化用ブロック共重合体物質を調製する方法並びにブロック共重合体を有する組成物および構造物
CN103842859A (zh) * 2011-11-10 2014-06-04 吉坤日矿日石能源株式会社 相位差膜及具备其的液晶显示装置
US8513356B1 (en) * 2012-02-10 2013-08-20 Dow Global Technologies Llc Diblock copolymer blend composition
US9127113B2 (en) * 2012-05-16 2015-09-08 Rohm And Haas Electronic Materials Llc Polystyrene-polyacrylate block copolymers, methods of manufacture thereof and articles comprising the same

Also Published As

Publication number Publication date
JP2017524760A (ja) 2017-08-31
FR3022249A1 (fr) 2015-12-18
SG11201610321UA (en) 2017-01-27
US20170145250A1 (en) 2017-05-25
TW201609936A (zh) 2016-03-16
CN106661171A (zh) 2017-05-10
JP6449342B2 (ja) 2019-01-09
US9976053B2 (en) 2018-05-22
WO2015189495A1 (fr) 2015-12-17
KR20170016482A (ko) 2017-02-13
TWI567127B (zh) 2017-01-21
EP3155028A1 (fr) 2017-04-19
KR101922353B1 (ko) 2018-11-26

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