FR2993428B1 - Applicateur d'onde de surface pour la production de plasma - Google Patents

Applicateur d'onde de surface pour la production de plasma

Info

Publication number
FR2993428B1
FR2993428B1 FR1256673A FR1256673A FR2993428B1 FR 2993428 B1 FR2993428 B1 FR 2993428B1 FR 1256673 A FR1256673 A FR 1256673A FR 1256673 A FR1256673 A FR 1256673A FR 2993428 B1 FR2993428 B1 FR 2993428B1
Authority
FR
France
Prior art keywords
surface wave
plasma production
wave applicator
applicator
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1256673A
Other languages
English (en)
Other versions
FR2993428A1 (fr
Inventor
Ana Lacoste
Jacques Pelletier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jacques Pelletier Fr
Universite Joseph Fourier Grenoble 1
Original Assignee
Centre National de la Recherche Scientifique CNRS
Universite Joseph Fourier Grenoble 1
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS, Universite Joseph Fourier Grenoble 1 filed Critical Centre National de la Recherche Scientifique CNRS
Priority to FR1256673A priority Critical patent/FR2993428B1/fr
Priority to JP2015520974A priority patent/JP6263175B2/ja
Priority to PCT/EP2013/064578 priority patent/WO2014009412A1/fr
Priority to CN201380036340.3A priority patent/CN104782235B/zh
Priority to EP13735272.0A priority patent/EP2873307B1/fr
Publication of FR2993428A1 publication Critical patent/FR2993428A1/fr
Application granted granted Critical
Publication of FR2993428B1 publication Critical patent/FR2993428B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H05H1/4615—Microwave discharges using surface waves

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
FR1256673A 2012-07-11 2012-07-11 Applicateur d'onde de surface pour la production de plasma Expired - Fee Related FR2993428B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR1256673A FR2993428B1 (fr) 2012-07-11 2012-07-11 Applicateur d'onde de surface pour la production de plasma
JP2015520974A JP6263175B2 (ja) 2012-07-11 2013-07-10 プラズマ生成用の表面波アプリケータ
PCT/EP2013/064578 WO2014009412A1 (fr) 2012-07-11 2013-07-10 Applicateur d'onde de surface pour la production de plasma
CN201380036340.3A CN104782235B (zh) 2012-07-11 2013-07-10 用于产生等离子体的表面波施加器
EP13735272.0A EP2873307B1 (fr) 2012-07-11 2013-07-10 Applicateur d'onde de surface et procédé pour la production de plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1256673A FR2993428B1 (fr) 2012-07-11 2012-07-11 Applicateur d'onde de surface pour la production de plasma

Publications (2)

Publication Number Publication Date
FR2993428A1 FR2993428A1 (fr) 2014-01-17
FR2993428B1 true FR2993428B1 (fr) 2014-08-08

Family

ID=46963891

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1256673A Expired - Fee Related FR2993428B1 (fr) 2012-07-11 2012-07-11 Applicateur d'onde de surface pour la production de plasma

Country Status (5)

Country Link
EP (1) EP2873307B1 (fr)
JP (1) JP6263175B2 (fr)
CN (1) CN104782235B (fr)
FR (1) FR2993428B1 (fr)
WO (1) WO2014009412A1 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3042092B1 (fr) * 2015-10-05 2019-07-26 Sairem Societe Pour L'application Industrielle De La Recherche En Electronique Et Micro Ondes Dispositif elementaire de production d’un plasma avec applicateur coaxial
FR3052326B1 (fr) * 2016-06-07 2018-06-29 Thales Generateur de plasma
KR101820242B1 (ko) * 2016-08-02 2018-01-18 한국기초과학지원연구원 수냉식 표면파 플라즈마 발생장치
KR101830007B1 (ko) * 2016-11-11 2018-02-19 한국기초과학지원연구원 동축 케이블 연결형 수냉식 표면파 플라즈마 발생장치
US11564292B2 (en) * 2019-09-27 2023-01-24 Applied Materials, Inc. Monolithic modular microwave source with integrated temperature control

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS579868A (en) * 1980-06-18 1982-01-19 Toshiba Corp Surface treating apparatus with microwave plasma
FR2583250B1 (fr) * 1985-06-07 1989-06-30 France Etat Procede et dispositif d'excitation d'un plasma par micro-ondes a la resonance cyclotronique electronique
JPH0594899A (ja) * 1991-10-02 1993-04-16 Nippon Steel Corp プラズマ処理装置
JPH0685525A (ja) * 1992-08-31 1994-03-25 Kyocera Corp １／２波長アンテナ
JPH05347508A (ja) * 1992-10-30 1993-12-27 Harada Ind Co Ltd 広帯域極超短波アンテナ
JPH0729889A (ja) * 1993-07-08 1995-01-31 Anelva Corp マイクロ波プラズマ処理装置
JPH0821476B2 (ja) * 1993-09-20 1996-03-04 ニチメン電子工研株式会社 Ｅｃｒプラズマ発生装置
JPH07161491A (ja) * 1993-12-02 1995-06-23 Daido Steel Co Ltd マイクロ波プラズマ処理装置
JPH0935651A (ja) * 1995-07-20 1997-02-07 Nissin Electric Co Ltd イオン源
JPH09245997A (ja) * 1996-03-05 1997-09-19 Nissin Electric Co Ltd カバーで覆われた内壁とアンテナを持つプラズマ室
JPH1083895A (ja) * 1996-09-06 1998-03-31 Hitachi Ltd プラズマ処理装置
JPH11102799A (ja) * 1997-09-26 1999-04-13 Mitsubishi Electric Corp プラズマ発生装置
JP4089022B2 (ja) * 1998-07-22 2008-05-21 日新イオン機器株式会社 自己電子放射型ｅｃｒイオンプラズマ源
JP2000277295A (ja) * 1999-03-25 2000-10-06 Toshiba Corp プラズマ処理装置
JP2002093597A (ja) * 2000-09-14 2002-03-29 Miura Gakuen プラズマ発生用アンテナ、プラズマ処理装置、プラズマ処理方法、及び被処理物の製造方法、並びに半導体装置の製造方法
FR2840451B1 (fr) * 2002-06-04 2004-08-13 Centre Nat Rech Scient Dispositif de production d'une nappe de plasma
JP5312411B2 (ja) * 2003-02-14 2013-10-09 東京エレクトロン株式会社 プラズマ発生装置およびリモートプラズマ処理装置
JP2005116362A (ja) * 2003-10-08 2005-04-28 Toshiba Corp マイクロ波励起のプラズマ処理装置およびプラズマ処理方法
JP2005353364A (ja) * 2004-06-09 2005-12-22 Shibaura Mechatronics Corp プラズマ発生装置、プラズマ処理装置及びプラズマ処理方法
JP4761244B2 (ja) * 2005-10-20 2011-08-31 株式会社小糸製作所 放電灯及び光源装置
JP4967107B2 (ja) * 2006-02-20 2012-07-04 国立大学法人名古屋大学 マイクロ波導入器、プラズマ発生装置及びプラズマ処理装置
FR2904177B1 (fr) * 2006-07-21 2008-11-07 Centre Nat Rech Scient Dispositif et procede de production et de confinement d'un plasma.
DE102006037144B4 (de) * 2006-08-09 2010-05-20 Roth & Rau Ag ECR-Plasmaquelle
FR2938150B1 (fr) * 2008-10-30 2010-12-17 Centre Nat Rech Scient Dispositif et procede de production et/ou de confinement d'un plasma
TW201105183A (en) * 2009-07-21 2011-02-01 Delta Electronics Inc Plasma generating apparatus
FR2955451A1 (fr) * 2010-05-25 2011-07-22 Centre Nat Rech Scient Dispositif de production d'un plasma, comportant au moins un applicateur coaxial

Also Published As

Publication number Publication date
CN104782235A (zh) 2015-07-15
FR2993428A1 (fr) 2014-01-17
WO2014009412A1 (fr) 2014-01-16
EP2873307A1 (fr) 2015-05-20
CN104782235B (zh) 2017-03-08
JP2015530694A (ja) 2015-10-15
JP6263175B2 (ja) 2018-01-17
EP2873307B1 (fr) 2016-07-06

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Legal Events

Date Code Title Description
TQ Partial transmission of property

Owner name: UNIVERSITE JOSEPH FOURIER - GRENOBLE 1, FR

Effective date: 20140221

Owner name: JACQUES PELLETIER, FR

Effective date: 20140221

PLFP Fee payment

Year of fee payment: 5

PLFP Fee payment

Year of fee payment: 5

ST Notification of lapse

Effective date: 20180330