FR2957939B1 - Dispositif d'injection de gaz modulaire - Google Patents

Dispositif d'injection de gaz modulaire

Info

Publication number
FR2957939B1
FR2957939B1 FR1001257A FR1001257A FR2957939B1 FR 2957939 B1 FR2957939 B1 FR 2957939B1 FR 1001257 A FR1001257 A FR 1001257A FR 1001257 A FR1001257 A FR 1001257A FR 2957939 B1 FR2957939 B1 FR 2957939B1
Authority
FR
France
Prior art keywords
injection device
gas injection
modular gas
modular
injection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1001257A
Other languages
English (en)
Other versions
FR2957939A1 (fr
Inventor
Jacques Constant Stefan Kools
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KOOLERHEADZ
Original Assignee
KOOLERHEADZ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR1001257A priority Critical patent/FR2957939B1/fr
Application filed by KOOLERHEADZ filed Critical KOOLERHEADZ
Priority to US13/638,047 priority patent/US8721835B2/en
Priority to PCT/IB2011/051273 priority patent/WO2011121507A1/fr
Priority to US13/638,094 priority patent/US9410248B2/en
Priority to EP11716061.4A priority patent/EP2553143B1/fr
Priority to PCT/IB2011/051274 priority patent/WO2011121508A1/fr
Priority to EP11717025.8A priority patent/EP2553144B1/fr
Publication of FR2957939A1 publication Critical patent/FR2957939A1/fr
Application granted granted Critical
Publication of FR2957939B1 publication Critical patent/FR2957939B1/fr
Priority to US15/204,404 priority patent/US10221479B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/001—Feed or outlet devices as such, e.g. feeding tubes
    • B01J4/002—Nozzle-type elements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45582—Expansion of gas before it reaches the substrate
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
    • F15D—FLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOW OF GASES OR LIQUIDS
    • F15D1/00—Influencing flow of fluids
    • F15D1/08—Influencing flow of fluids of jets leaving an orifice
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2204/00—Aspects relating to feed or outlet devices; Regulating devices for feed or outlet devices
    • B01J2204/002—Aspects relating to feed or outlet devices; Regulating devices for feed or outlet devices the feeding side being of particular interest

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Vapour Deposition (AREA)
FR1001257A 2010-03-29 2010-03-29 Dispositif d'injection de gaz modulaire Expired - Fee Related FR2957939B1 (fr)

Priority Applications (8)

Application Number Priority Date Filing Date Title
FR1001257A FR2957939B1 (fr) 2010-03-29 2010-03-29 Dispositif d'injection de gaz modulaire
PCT/IB2011/051273 WO2011121507A1 (fr) 2010-03-29 2011-03-25 Dispositif d'injection de gaz à vitesse uniforme
US13/638,094 US9410248B2 (en) 2010-03-29 2011-03-25 Modular gas injection device
EP11716061.4A EP2553143B1 (fr) 2010-03-29 2011-03-25 Dispositif modulaire d'injection de gaz
US13/638,047 US8721835B2 (en) 2010-03-29 2011-03-25 Gas injection device with uniform gas velocity
PCT/IB2011/051274 WO2011121508A1 (fr) 2010-03-29 2011-03-25 Dispositif modulaire d'injection de gaz
EP11717025.8A EP2553144B1 (fr) 2010-03-29 2011-03-25 Dispositif d'injection de gaz à vitesse uniforme
US15/204,404 US10221479B2 (en) 2010-03-29 2016-07-07 Modular gas injection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1001257A FR2957939B1 (fr) 2010-03-29 2010-03-29 Dispositif d'injection de gaz modulaire

Publications (2)

Publication Number Publication Date
FR2957939A1 FR2957939A1 (fr) 2011-09-30
FR2957939B1 true FR2957939B1 (fr) 2012-08-17

Family

ID=42733780

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1001257A Expired - Fee Related FR2957939B1 (fr) 2010-03-29 2010-03-29 Dispositif d'injection de gaz modulaire

Country Status (1)

Country Link
FR (1) FR2957939B1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3029939A1 (fr) * 2014-12-16 2016-06-17 Saint-Gobain Lumilog Reacteur de depot chimique en phase vapeur
CN111232451B (zh) * 2020-03-17 2022-04-05 江西盛源新材料有限公司 粉剂物料投料装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3525527A1 (de) * 1985-07-17 1987-01-29 Vsr Eng Foerdertechnik Hochgeschwindigkeits-ausblasduese
FI84573C (fi) * 1990-03-20 1991-12-27 Raute Oy Blaosanordning foer vindspridning av spaonor.
FR2661554A1 (fr) * 1990-04-30 1991-10-31 Philips Electronique Lab Dispositif d'introduction des gaz dans la chambre d'un reacteur d'epitaxie, chambre de reacteur comportant un tel dispositif d'introduction de gaz, et utilisation d'une telle chambre pour la realisation de couches semiconductrices.
GB2286856B (en) * 1994-02-16 1998-09-16 Mitsubishi Electric Corp Blower
US20010032588A1 (en) * 2000-04-21 2001-10-25 Kenji Harafuji Semiconductor film deposition apparatus
US6544869B1 (en) * 2000-06-23 2003-04-08 Matsushita Electric Industrial Co., Ltd. Method and apparatus for depositing semiconductor film and method for fabricating semiconductor device
US7163587B2 (en) * 2002-02-08 2007-01-16 Axcelis Technologies, Inc. Reactor assembly and processing method
DE10325629A1 (de) * 2003-03-21 2004-10-07 Forschungszentrum Jülich GmbH Verfahren zur Abscheidung von Verbindungen auf einem Substrat mittels metallorganischer Gasphasendeposition

Also Published As

Publication number Publication date
FR2957939A1 (fr) 2011-09-30

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Name of requester: ENCAPSULIX, FR

Effective date: 20130415

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