FR2905517B1 - Nouveaux precurseurs porogenes et couches dielectriques poreuses obtenues a partir de ceux-ci - Google Patents
Nouveaux precurseurs porogenes et couches dielectriques poreuses obtenues a partir de ceux-ciInfo
- Publication number
- FR2905517B1 FR2905517B1 FR0653576A FR0653576A FR2905517B1 FR 2905517 B1 FR2905517 B1 FR 2905517B1 FR 0653576 A FR0653576 A FR 0653576A FR 0653576 A FR0653576 A FR 0653576A FR 2905517 B1 FR2905517 B1 FR 2905517B1
- Authority
- FR
- France
- Prior art keywords
- porogenous
- precursors
- novel
- dielectric layers
- obtained therefrom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Formation Of Insulating Films (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0653576A FR2905517B1 (fr) | 2006-09-05 | 2006-09-05 | Nouveaux precurseurs porogenes et couches dielectriques poreuses obtenues a partir de ceux-ci |
EP07727138A EP2004872A1 (fr) | 2006-03-31 | 2007-03-20 | Nouvelles composition de precurseurs formant des pores et couches dielectriques poreuses obtenues a partir de ces compositions |
PCT/EP2007/052661 WO2007113104A1 (fr) | 2006-03-31 | 2007-03-20 | Nouvelles composition de precurseurs formant des pores et couches dielectriques poreuses obtenues a partir de ces compositions |
JP2009502025A JP4960439B2 (ja) | 2006-03-31 | 2007-03-20 | 新規な孔形成前駆体組成物及びそれから得られる多孔誘電層 |
US12/295,606 US20090136667A1 (en) | 2006-03-31 | 2007-03-20 | Novel pore-forming precursors composition and porous dielectric layers obtained therefrom |
TW096109824A TW200746298A (en) | 2006-03-31 | 2007-03-22 | Novel pore-forming precursors composition and porous dielectric layers obtained there from |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0653576A FR2905517B1 (fr) | 2006-09-05 | 2006-09-05 | Nouveaux precurseurs porogenes et couches dielectriques poreuses obtenues a partir de ceux-ci |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2905517A1 FR2905517A1 (fr) | 2008-03-07 |
FR2905517B1 true FR2905517B1 (fr) | 2009-04-24 |
Family
ID=37908097
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0653576A Active FR2905517B1 (fr) | 2006-03-31 | 2006-09-05 | Nouveaux precurseurs porogenes et couches dielectriques poreuses obtenues a partir de ceux-ci |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2905517B1 (fr) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7332445B2 (en) * | 2004-09-28 | 2008-02-19 | Air Products And Chemicals, Inc. | Porous low dielectric constant compositions and methods for making and using same |
-
2006
- 2006-09-05 FR FR0653576A patent/FR2905517B1/fr active Active
Also Published As
Publication number | Publication date |
---|---|
FR2905517A1 (fr) | 2008-03-07 |
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