FR2818263B1 - Substrat pour materiau a insoler - Google Patents

Substrat pour materiau a insoler

Info

Publication number
FR2818263B1
FR2818263B1 FR0016315A FR0016315A FR2818263B1 FR 2818263 B1 FR2818263 B1 FR 2818263B1 FR 0016315 A FR0016315 A FR 0016315A FR 0016315 A FR0016315 A FR 0016315A FR 2818263 B1 FR2818263 B1 FR 2818263B1
Authority
FR
France
Prior art keywords
substrate
insulating material
insulating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0016315A
Other languages
English (en)
Other versions
FR2818263A1 (fr
Inventor
Patrick Pouteau
Patrick Chaton
Francois Perraut
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR0016315A priority Critical patent/FR2818263B1/fr
Priority to EP01270808A priority patent/EP1346260A1/fr
Priority to JP2002550444A priority patent/JP2004523780A/ja
Priority to AU2002219292A priority patent/AU2002219292A1/en
Priority to PCT/FR2001/003959 priority patent/WO2002048795A1/fr
Priority to US10/450,386 priority patent/US20040047057A1/en
Publication of FR2818263A1 publication Critical patent/FR2818263A1/fr
Application granted granted Critical
Publication of FR2818263B1 publication Critical patent/FR2818263B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00277—Apparatus
    • B01J2219/00497—Features relating to the solid phase supports
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00583—Features relative to the processes being carried out
    • B01J2219/00596—Solid-phase processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00583—Features relative to the processes being carried out
    • B01J2219/00603—Making arrays on substantially continuous surfaces
    • B01J2219/00605—Making arrays on substantially continuous surfaces the compounds being directly bound or immobilised to solid supports
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00583—Features relative to the processes being carried out
    • B01J2219/00603—Making arrays on substantially continuous surfaces
    • B01J2219/00605—Making arrays on substantially continuous surfaces the compounds being directly bound or immobilised to solid supports
    • B01J2219/00612—Making arrays on substantially continuous surfaces the compounds being directly bound or immobilised to solid supports the surface being inorganic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
    • B01J2219/00709—Type of synthesis
    • B01J2219/00711—Light-directed synthesis

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optical Elements Other Than Lenses (AREA)
FR0016315A 2000-12-14 2000-12-14 Substrat pour materiau a insoler Expired - Fee Related FR2818263B1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR0016315A FR2818263B1 (fr) 2000-12-14 2000-12-14 Substrat pour materiau a insoler
EP01270808A EP1346260A1 (fr) 2000-12-14 2001-12-12 Substrat pour materiau a insoler
JP2002550444A JP2004523780A (ja) 2000-12-14 2001-12-12 照射材料のための基板
AU2002219292A AU2002219292A1 (en) 2000-12-14 2001-12-12 Substrate for material to be exposed
PCT/FR2001/003959 WO2002048795A1 (fr) 2000-12-14 2001-12-12 Substrat pour materiau a insoler
US10/450,386 US20040047057A1 (en) 2000-12-14 2001-12-12 Substrate for material to be exposed

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0016315A FR2818263B1 (fr) 2000-12-14 2000-12-14 Substrat pour materiau a insoler

Publications (2)

Publication Number Publication Date
FR2818263A1 FR2818263A1 (fr) 2002-06-21
FR2818263B1 true FR2818263B1 (fr) 2004-02-20

Family

ID=8857656

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0016315A Expired - Fee Related FR2818263B1 (fr) 2000-12-14 2000-12-14 Substrat pour materiau a insoler

Country Status (6)

Country Link
US (1) US20040047057A1 (fr)
EP (1) EP1346260A1 (fr)
JP (1) JP2004523780A (fr)
AU (1) AU2002219292A1 (fr)
FR (1) FR2818263B1 (fr)
WO (1) WO2002048795A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050074781A1 (en) * 2003-10-02 2005-04-07 Herbert von Schroeder Nucleic acid braided J-probes
US8610986B2 (en) * 2009-04-06 2013-12-17 The Board Of Trustees Of The University Of Illinois Mirror arrays for maskless photolithography and image display
US8394502B2 (en) * 2009-09-14 2013-03-12 Ocean Thin Films, Inc. Highly durable first surface silver based optical coatings and method of making the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2561946B2 (ja) * 1988-08-31 1996-12-11 ホーヤ株式会社 多層膜裏面反射鏡
US5736257A (en) * 1995-04-25 1998-04-07 Us Navy Photoactivatable polymers for producing patterned biomolecular assemblies
JPH09185174A (ja) * 1995-12-28 1997-07-15 Oki Electric Ind Co Ltd ウエハのパターニング方法
DE19608428C2 (de) * 1996-03-05 2000-10-19 Forschungszentrum Juelich Gmbh Chemischer Sensor
US6042995A (en) * 1997-12-09 2000-03-28 Lucent Technologies Inc. Lithographic process for device fabrication using a multilayer mask which has been previously inspected
US6165896A (en) * 1998-06-25 2000-12-26 Siemens Aktiengesellschaft Self-aligned formation and method for semiconductors
US6274871B1 (en) * 1998-10-22 2001-08-14 Vysis, Inc. Method and system for performing infrared study on a biological sample
US6320206B1 (en) * 1999-02-05 2001-11-20 Lumileds Lighting, U.S., Llc Light emitting devices having wafer bonded aluminum gallium indium nitride structures and mirror stacks
KR100379411B1 (ko) * 1999-06-28 2003-04-10 엘지전자 주식회사 바이오칩 및 그의 생체 물질 패터닝 및 측정 방법
US6494997B1 (en) * 2000-08-18 2002-12-17 General Electric Company Radio frequency magnetron sputtering for lighting applications
US6589717B1 (en) * 2000-11-17 2003-07-08 Advanced Micro Devices, Inc. Photon assisted deposition of hard mask formation for use in manufacture of both devices and masks
FR2849195B1 (fr) * 2002-12-20 2005-01-21 Commissariat Energie Atomique Biocapteur a substrat quelconque pouvant etre caracterise en deflexion photothermique

Also Published As

Publication number Publication date
FR2818263A1 (fr) 2002-06-21
WO2002048795A1 (fr) 2002-06-20
US20040047057A1 (en) 2004-03-11
AU2002219292A1 (en) 2002-06-24
JP2004523780A (ja) 2004-08-05
EP1346260A1 (fr) 2003-09-24

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20090831