FR2741474B1 - Chambre de traitement sous vide, procede de pulverisation sous vide et dispositif formant magnetron pour la chambre - Google Patents
Chambre de traitement sous vide, procede de pulverisation sous vide et dispositif formant magnetron pour la chambreInfo
- Publication number
- FR2741474B1 FR2741474B1 FR9613539A FR9613539A FR2741474B1 FR 2741474 B1 FR2741474 B1 FR 2741474B1 FR 9613539 A FR9613539 A FR 9613539A FR 9613539 A FR9613539 A FR 9613539A FR 2741474 B1 FR2741474 B1 FR 2741474B1
- Authority
- FR
- France
- Prior art keywords
- chamber
- vacuum
- forming device
- spraying method
- processing chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3438—Electrodes other than cathode
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH03251/95A CH691686A5 (de) | 1995-11-16 | 1995-11-16 | Vakuumbehandlungskammer. |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2741474A1 FR2741474A1 (fr) | 1997-05-23 |
FR2741474B1 true FR2741474B1 (fr) | 2003-02-14 |
Family
ID=4251930
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR9613539A Expired - Fee Related FR2741474B1 (fr) | 1995-11-16 | 1996-11-06 | Chambre de traitement sous vide, procede de pulverisation sous vide et dispositif formant magnetron pour la chambre |
Country Status (5)
Country | Link |
---|---|
US (1) | US5733419A (fr) |
JP (1) | JPH09170077A (fr) |
CH (1) | CH691686A5 (fr) |
DE (1) | DE19646700B4 (fr) |
FR (1) | FR2741474B1 (fr) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19757353C1 (de) * | 1997-12-22 | 1999-07-29 | Fraunhofer Ges Forschung | Einrichtung zum Betreiben einer Niederdruckentladung |
DE19834592A1 (de) * | 1998-07-31 | 2000-02-03 | Leybold Systems Gmbh | Vorrichtung zum Beschichten von plattenförmigen Substraten |
DE19947932C1 (de) * | 1999-09-28 | 2001-04-26 | Fraunhofer Ges Forschung | Einrichtung zum Magnetronzerstäuben |
US20040216843A1 (en) * | 2003-05-01 | 2004-11-04 | Kuang-Chung Peng | Plasm etching device |
US20080017501A1 (en) * | 2006-07-21 | 2008-01-24 | Makoto Inagawa | Cooled dark space shield for multi-cathode design |
KR101046520B1 (ko) | 2007-09-07 | 2011-07-04 | 어플라이드 머티어리얼스, 인코포레이티드 | 내부 챔버 상의 부산물 막 증착을 제어하기 위한 pecvd 시스템에서의 소스 가스 흐름 경로 제어 |
BE1018645A5 (fr) * | 2007-09-24 | 2011-06-07 | Ardenne Anlagentech Gmbh | Systeme de magnetron avec support de cible blinde. |
DE102009051056B4 (de) * | 2009-10-28 | 2012-04-05 | Von Ardenne Anlagentechnik Gmbh | Verfahren zum Wiederherstellen des Betriebszustandes der Entladung beim Magnetronsputtern und Schaltung zur Durchführung des Verfahrens |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE222900C (fr) * | ||||
US3514391A (en) * | 1967-05-05 | 1970-05-26 | Nat Res Corp | Sputtering apparatus with finned anode |
JPS527669A (en) * | 1975-07-08 | 1977-01-20 | Jeol Ltd | Sputtering apparatus |
DE3427587A1 (de) * | 1984-07-26 | 1986-02-06 | Leybold-Heraeus GmbH, 5000 Köln | Zerstaeubungseinrichtung fuer katodenzerstaeubungsanlagen |
DE4026367A1 (de) * | 1990-06-25 | 1992-03-12 | Leybold Ag | Vorrichtung zum beschichten von substraten |
US5106474A (en) * | 1990-11-21 | 1992-04-21 | Viratec Thin Films, Inc. | Anode structures for magnetron sputtering apparatus |
JPH05230646A (ja) * | 1992-02-19 | 1993-09-07 | Toshiba Corp | スパッタ装置 |
CH689767A5 (de) * | 1992-03-24 | 1999-10-15 | Balzers Hochvakuum | Verfahren zur Werkstueckbehandlung in einer Vakuumatmosphaere und Vakuumbehandlungsanlage. |
US6296743B1 (en) * | 1993-04-02 | 2001-10-02 | Applied Materials, Inc. | Apparatus for DC reactive plasma vapor deposition of an electrically insulating material using a shielded secondary anode |
US5403458A (en) * | 1993-08-05 | 1995-04-04 | Guardian Industries Corp. | Sputter-coating target and method of use |
-
1995
- 1995-11-16 CH CH03251/95A patent/CH691686A5/de not_active IP Right Cessation
-
1996
- 1996-02-08 US US08/598,326 patent/US5733419A/en not_active Expired - Lifetime
- 1996-11-06 FR FR9613539A patent/FR2741474B1/fr not_active Expired - Fee Related
- 1996-11-12 DE DE19646700A patent/DE19646700B4/de not_active Expired - Fee Related
- 1996-11-15 JP JP8304673A patent/JPH09170077A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
FR2741474A1 (fr) | 1997-05-23 |
CH691686A5 (de) | 2001-09-14 |
DE19646700B4 (de) | 2010-03-25 |
US5733419A (en) | 1998-03-31 |
JPH09170077A (ja) | 1997-06-30 |
DE19646700A1 (de) | 1997-05-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
AU3327495A (en) | Semiconductor processing spray coating apparatus | |
EP0594453A3 (en) | Process for forming deposited film for light-receiving member , light-receiving member produced by the process, deposited film forming apparatus, and method for cleaning deposited film forming apparatus | |
EP0609104A3 (fr) | Couches fonctionnelles déposées, procédé et appareil pour leur production. | |
EP0663683A3 (fr) | Appareil de traitement par plasma magnétronique et méthode de traitement. | |
FR2741474B1 (fr) | Chambre de traitement sous vide, procede de pulverisation sous vide et dispositif formant magnetron pour la chambre | |
HU9602683D0 (en) | Process for deactivating or destroying microorganisms | |
FR2696426B1 (fr) | Procede pour le masquage d'une piece, et installation de traitement sous vide. | |
GB9523926D0 (en) | Operation of pulsed droplet deposition apparatus | |
PL322332A1 (en) | Apparatus for detecting targets | |
EP0731430A3 (fr) | Appareil de traitement de données de vente | |
AU650252B2 (en) | Process and apparatus for removing cyanide from liquid waste | |
GB9604503D0 (en) | Distiller apparatus | |
FI973173A0 (fi) | Menetelmä kondensaatin käsittelemiseksi | |
EP0657563A3 (fr) | Appareil de revêtement sous vide. | |
FR2667179B1 (fr) | Procede de determination de l'orientation d'articles transportes. | |
GR980300040T1 (en) | Apparatus for high speed morphological processing | |
HUP9600209A3 (en) | Process for the extraction of periplasmatic proteins from microorganisms in the presence of arginin | |
FR2733227B1 (fr) | Procede pour la preparation de 1,1-difluoroethane | |
FR2680123B1 (fr) | Procede de traitement de residus fortement polluants pour l'environnement. | |
FR2689142B1 (fr) | Procédé de traitement contre la corrosion, matériau obtenu par ledit procédé et dispositif pour la mise en Óoeuvre du procédé. | |
FR2736645B1 (fr) | Procede de preparation discontinue de polylaurinelactame | |
CA2192608A1 (fr) | Conteneur transportable de filtration pour la transformation energetique des dechets | |
MA24015A1 (fr) | Procede pour la preparation de dioxo-azabicyclohexanes | |
IL124875A (en) | Process for the desalination of water and apparatus for carrying out the process | |
FR2738769B1 (fr) | Dispositif et procede pour la fabrication de pieces composites presentant un insert et pieces composites obtenues par ce procede |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |
Effective date: 20100730 |