FR2740466B1 - ANTISTATIC COMPOSITION AND PHOTOGRAPHIC PRODUCT CONTAINING A LAYER OF THIS COMPOSITION - Google Patents

ANTISTATIC COMPOSITION AND PHOTOGRAPHIC PRODUCT CONTAINING A LAYER OF THIS COMPOSITION

Info

Publication number
FR2740466B1
FR2740466B1 FR9612936A FR9612936A FR2740466B1 FR 2740466 B1 FR2740466 B1 FR 2740466B1 FR 9612936 A FR9612936 A FR 9612936A FR 9612936 A FR9612936 A FR 9612936A FR 2740466 B1 FR2740466 B1 FR 2740466B1
Authority
FR
France
Prior art keywords
composition
layer
product containing
photographic product
antistatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9612936A
Other languages
French (fr)
Other versions
FR2740466A1 (en
Inventor
Olivier Jean Christia Poncelet
Jeannine Rigola
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Pathe SA
Original Assignee
Kodak Pathe SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR9512816A external-priority patent/FR2740465A1/en
Application filed by Kodak Pathe SA filed Critical Kodak Pathe SA
Priority to FR9612936A priority Critical patent/FR2740466B1/en
Publication of FR2740466A1 publication Critical patent/FR2740466A1/en
Application granted granted Critical
Publication of FR2740466B1 publication Critical patent/FR2740466B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/20—Silicates
    • C01B33/26—Aluminium-containing silicates, i.e. silico-aluminates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
FR9612936A 1995-10-25 1996-10-18 ANTISTATIC COMPOSITION AND PHOTOGRAPHIC PRODUCT CONTAINING A LAYER OF THIS COMPOSITION Expired - Fee Related FR2740466B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR9612936A FR2740466B1 (en) 1995-10-25 1996-10-18 ANTISTATIC COMPOSITION AND PHOTOGRAPHIC PRODUCT CONTAINING A LAYER OF THIS COMPOSITION

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9512816A FR2740465A1 (en) 1995-10-25 1995-10-25 Aqueous film-forming antistatic composition for use in photographic materials
FR9612936A FR2740466B1 (en) 1995-10-25 1996-10-18 ANTISTATIC COMPOSITION AND PHOTOGRAPHIC PRODUCT CONTAINING A LAYER OF THIS COMPOSITION

Publications (2)

Publication Number Publication Date
FR2740466A1 FR2740466A1 (en) 1997-04-30
FR2740466B1 true FR2740466B1 (en) 1998-05-22

Family

ID=26232295

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9612936A Expired - Fee Related FR2740466B1 (en) 1995-10-25 1996-10-18 ANTISTATIC COMPOSITION AND PHOTOGRAPHIC PRODUCT CONTAINING A LAYER OF THIS COMPOSITION

Country Status (1)

Country Link
FR (1) FR2740466B1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2760754B1 (en) * 1997-03-12 2003-06-06 Kodak Pathe ANTISTATIC COMPOSITION AND PHOTOGRAPHIC PRODUCT CONTAINING A LAYER OF THIS COMPOSITION
FR2802912B1 (en) * 1999-12-27 2002-02-15 Eastman Kodak Co PROCESS FOR PREPARING AN ALUMINOSILICATE POLYMER

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1574954A (en) * 1977-03-28 1980-09-10 Nat Res Dev Synthetic imogolite
GB2025384B (en) * 1978-07-07 1982-08-11 Macaulay Inst For Soil Researc Synthesising imogolite
JPS6398656A (en) * 1986-10-15 1988-04-30 Fuji Photo Film Co Ltd Silver halide photographic sensitive material
US5372923A (en) * 1992-05-13 1994-12-13 Konica Corporation Light-sensitive silver halide photographic material
EP0657774A1 (en) * 1993-12-13 1995-06-14 Minnesota Mining And Manufacturing Company Antistatic coatings

Also Published As

Publication number Publication date
FR2740466A1 (en) 1997-04-30

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Legal Events

Date Code Title Description
TP Transmission of property
ST Notification of lapse