FR2540892B1 - SUBSTRATE HEATING METHOD AND DEVICE FOR MOLECULAR JET EPITAXY - Google Patents
SUBSTRATE HEATING METHOD AND DEVICE FOR MOLECULAR JET EPITAXYInfo
- Publication number
- FR2540892B1 FR2540892B1 FR8401544A FR8401544A FR2540892B1 FR 2540892 B1 FR2540892 B1 FR 2540892B1 FR 8401544 A FR8401544 A FR 8401544A FR 8401544 A FR8401544 A FR 8401544A FR 2540892 B1 FR2540892 B1 FR 2540892B1
- Authority
- FR
- France
- Prior art keywords
- heating method
- substrate heating
- molecular jet
- jet epitaxy
- epitaxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
- C30B23/06—Heating of the deposition chamber, the substrate or the materials to be evaporated
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/465,800 US4492852A (en) | 1983-02-11 | 1983-02-11 | Growth substrate heating arrangement for UHV silicon MBE |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2540892A1 FR2540892A1 (en) | 1984-08-17 |
FR2540892B1 true FR2540892B1 (en) | 1986-06-13 |
Family
ID=23849202
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8401544A Expired FR2540892B1 (en) | 1983-02-11 | 1984-02-01 | SUBSTRATE HEATING METHOD AND DEVICE FOR MOLECULAR JET EPITAXY |
Country Status (7)
Country | Link |
---|---|
US (1) | US4492852A (en) |
JP (1) | JPS59152619A (en) |
CA (1) | CA1207090A (en) |
DE (1) | DE3404780A1 (en) |
FR (1) | FR2540892B1 (en) |
GB (1) | GB2134932B (en) |
NL (1) | NL8400317A (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4877573A (en) * | 1985-12-19 | 1989-10-31 | Litton Systems, Inc. | Substrate holder for wafers during MBE growth |
EP0227228A3 (en) * | 1985-12-19 | 1990-01-10 | Litton Systems, Inc. | Substrate holder for wafers during mbe growth |
JPH069297A (en) * | 1991-12-09 | 1994-01-18 | Sumitomo Electric Ind Ltd | Film forming device |
JPH0811718B2 (en) * | 1992-02-27 | 1996-02-07 | 大同ほくさん株式会社 | Gas source molecular beam epitaxy system |
US5329097A (en) * | 1993-05-19 | 1994-07-12 | The United States Of America As Represented By The Secretary Of The Navy | Compact substrate heater for use in an oxidizing atmosphere |
US5775416A (en) * | 1995-11-17 | 1998-07-07 | Cvc Products, Inc. | Temperature controlled chuck for vacuum processing |
DE19727432A1 (en) * | 1997-06-27 | 1999-05-06 | Siemens Ag | Growth substrate holder has a heat conductive screen for providing uniform temperature distribution |
RU2468468C2 (en) * | 2010-11-30 | 2012-11-27 | Федеральное Государственное Бюджетное Образовательное Учреждение Высшего Профессионального Образования "Нижегородский Государственный Университет Им. Н.И. Лобачевского" | Substrate heating device for semiconductor structure manufacturing plant |
CN114566571B (en) * | 2022-04-24 | 2022-07-26 | 江苏第三代半导体研究院有限公司 | Preparation method of semiconductor epitaxial wafer based on temperature compensation and semiconductor epitaxial wafer |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2995475A (en) * | 1958-11-04 | 1961-08-08 | Bell Telephone Labor Inc | Fabrication of semiconductor devices |
US3091556A (en) * | 1959-11-25 | 1963-05-28 | Ibm | Method for improving the sharp transition of superconductive films |
DE1619998B2 (en) * | 1967-04-07 | 1976-07-29 | Siemens AG, 1000 Berlin und 8000 München | DEVICE FOR THE THERMAL TREATMENT OF DISC-SHAPED SEMICONDUCTOR BODIES |
US3560252A (en) * | 1968-08-13 | 1971-02-02 | Air Reduction | Vapor deposition method including specified solid angle of radiant heater |
US3842794A (en) * | 1973-06-29 | 1974-10-22 | Ibm | Apparatus for high temperature semiconductor processing |
US4101759A (en) * | 1976-10-26 | 1978-07-18 | General Electric Company | Semiconductor body heater |
US4084096A (en) * | 1977-02-14 | 1978-04-11 | Edwards Miles L | Electrically activated infrared source |
JPS54111771A (en) * | 1978-02-22 | 1979-09-01 | Toshiba Corp | Gas phase reaction unit of semiconductor substrate |
-
1983
- 1983-02-11 US US06/465,800 patent/US4492852A/en not_active Expired - Lifetime
-
1984
- 1984-01-30 CA CA000446319A patent/CA1207090A/en not_active Expired
- 1984-02-01 FR FR8401544A patent/FR2540892B1/en not_active Expired
- 1984-02-02 NL NL8400317A patent/NL8400317A/en not_active Application Discontinuation
- 1984-02-07 GB GB08403169A patent/GB2134932B/en not_active Expired
- 1984-02-10 JP JP59022025A patent/JPS59152619A/en active Pending
- 1984-02-10 DE DE19843404780 patent/DE3404780A1/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
GB2134932B (en) | 1986-01-15 |
DE3404780A1 (en) | 1984-08-16 |
CA1207090A (en) | 1986-07-02 |
JPS59152619A (en) | 1984-08-31 |
GB2134932A (en) | 1984-08-22 |
US4492852A (en) | 1985-01-08 |
NL8400317A (en) | 1984-09-03 |
FR2540892A1 (en) | 1984-08-17 |
GB8403169D0 (en) | 1984-03-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |