FR2531103B1 - Bain pour le depot chimique de nickel et/ou de cobalt utilisant un reducteur a base de bore ou de phosphore - Google Patents

Bain pour le depot chimique de nickel et/ou de cobalt utilisant un reducteur a base de bore ou de phosphore

Info

Publication number
FR2531103B1
FR2531103B1 FR8213431A FR8213431A FR2531103B1 FR 2531103 B1 FR2531103 B1 FR 2531103B1 FR 8213431 A FR8213431 A FR 8213431A FR 8213431 A FR8213431 A FR 8213431A FR 2531103 B1 FR2531103 B1 FR 2531103B1
Authority
FR
France
Prior art keywords
cobalt
boron
phosphorus
bath
nickel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8213431A
Other languages
English (en)
Other versions
FR2531103A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Office National dEtudes et de Recherches Aerospatiales ONERA
Original Assignee
Office National dEtudes et de Recherches Aerospatiales ONERA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Office National dEtudes et de Recherches Aerospatiales ONERA filed Critical Office National dEtudes et de Recherches Aerospatiales ONERA
Priority to FR8213431A priority Critical patent/FR2531103B1/fr
Priority to EP83401550A priority patent/EP0102874B1/fr
Priority to DE8383401550T priority patent/DE3368088D1/de
Priority to US06/518,431 priority patent/US4486233A/en
Priority to JP58137922A priority patent/JPS5943857A/ja
Publication of FR2531103A1 publication Critical patent/FR2531103A1/fr
Application granted granted Critical
Publication of FR2531103B1 publication Critical patent/FR2531103B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
FR8213431A 1982-07-30 1982-07-30 Bain pour le depot chimique de nickel et/ou de cobalt utilisant un reducteur a base de bore ou de phosphore Expired FR2531103B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR8213431A FR2531103B1 (fr) 1982-07-30 1982-07-30 Bain pour le depot chimique de nickel et/ou de cobalt utilisant un reducteur a base de bore ou de phosphore
EP83401550A EP0102874B1 (fr) 1982-07-30 1983-07-27 Bain pour le dépôt chimique de nickel et/ou de cobalt utilisant un réducteur à base de bore ou de phosphore
DE8383401550T DE3368088D1 (en) 1982-07-30 1983-07-27 Nickel or cobalt chemical plating bath using reducing agents containing boron or phosphor
US06/518,431 US4486233A (en) 1982-07-30 1983-07-29 Nickel and/or cobalt chemical plating bath using a reducing agent based on boron or phosphorous
JP58137922A JPS5943857A (ja) 1982-07-30 1983-07-29 硼素又は燐基の還元剤を用いるニツケル及び／又はコバルト化学メツキ浴

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8213431A FR2531103B1 (fr) 1982-07-30 1982-07-30 Bain pour le depot chimique de nickel et/ou de cobalt utilisant un reducteur a base de bore ou de phosphore

Publications (2)

Publication Number Publication Date
FR2531103A1 FR2531103A1 (fr) 1984-02-03
FR2531103B1 true FR2531103B1 (fr) 1985-11-22

Family

ID=9276523

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8213431A Expired FR2531103B1 (fr) 1982-07-30 1982-07-30 Bain pour le depot chimique de nickel et/ou de cobalt utilisant un reducteur a base de bore ou de phosphore

Country Status (5)

Country Link
US (1) US4486233A (fr)
EP (1) EP0102874B1 (fr)
JP (1) JPS5943857A (fr)
DE (1) DE3368088D1 (fr)
FR (1) FR2531103B1 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4624865A (en) * 1984-05-21 1986-11-25 Carolina Solvents, Inc. Electrically conductive microballoons and compositions incorporating same
US5017410A (en) * 1988-05-23 1991-05-21 United Technologies Corporation Wear resistant electroless nickel-boron coating compositions
US5196053A (en) * 1991-11-27 1993-03-23 Mcgean-Rohco, Inc. Complexing agent for displacement tin plating
JP2968147B2 (ja) * 1993-04-07 1999-10-25 日本パーカライジング株式会社 亜鉛含有金属めっき鋼板用酸性置換めっき液組成物
US5624480A (en) * 1993-04-07 1997-04-29 Henkel Corporation Composition and process for substitutionally plating zinciferous surfaces
CA2178146C (fr) * 1995-06-06 2002-01-15 Mark W. Zitko Depot autocatalytique d'un alliage de nickel-cobalt-phosphore
US6183546B1 (en) 1998-11-02 2001-02-06 Mccomas Industries International Coating compositions containing nickel and boron
FR2787472B1 (fr) 1998-12-16 2001-03-09 Onera (Off Nat Aerospatiale) Procede pour produire une poudre d'alliage metallique de type mcraly et revetements obtenus avec cette poudre
EP1306465B1 (fr) * 2001-10-24 2011-03-16 Rohm and Haas Electronic Materials LLC Stabilisants pour des solutions de placage sans courant et méthodes d'utilisation
KR100859259B1 (ko) * 2005-12-29 2008-09-18 주식회사 엘지화학 캡층 형성을 위한 코발트 계열 합금 무전해 도금 용액 및이를 이용하는 무전해 도금 방법
JP2019210501A (ja) * 2018-06-01 2019-12-12 奥野製薬工業株式会社 無電解ニッケルめっき液用安定剤、並びにそれを用いためっき液、めっき方法及び分析方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3147154A (en) * 1961-05-25 1964-09-01 Texaco Inc Method of depositing metal-containing material onto an extended surface
CA1079454A (fr) * 1975-11-03 1980-06-17 Michael Gulla Nickelage sans electrolyse
JPS56108869A (en) * 1980-01-31 1981-08-28 Asahi Glass Co Ltd Nickel coat forming method
US4368223A (en) * 1981-06-01 1983-01-11 Asahi Glass Company, Ltd. Process for preparing nickel layer
EP0066656B1 (fr) * 1981-06-02 1985-09-25 Asahi Glass Company Ltd. Procédé pour la préparation d'une couche de nickel

Also Published As

Publication number Publication date
EP0102874A1 (fr) 1984-03-14
US4486233A (en) 1984-12-04
FR2531103A1 (fr) 1984-02-03
DE3368088D1 (en) 1987-01-15
JPS5943857A (ja) 1984-03-12
EP0102874B1 (fr) 1986-12-03

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