FR2470384B1 - Dispositif de surveillance et de commande de processus plasmiques - Google Patents

Dispositif de surveillance et de commande de processus plasmiques

Info

Publication number
FR2470384B1
FR2470384B1 FR808024994A FR8024994A FR2470384B1 FR 2470384 B1 FR2470384 B1 FR 2470384B1 FR 808024994 A FR808024994 A FR 808024994A FR 8024994 A FR8024994 A FR 8024994A FR 2470384 B1 FR2470384 B1 FR 2470384B1
Authority
FR
France
Prior art keywords
plasmic
controlling device
process monitoring
monitoring
controlling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR808024994A
Other languages
English (en)
Other versions
FR2470384A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers und Leybold Deutschland Holding AG
Original Assignee
Leybold Heraeus GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Heraeus GmbH filed Critical Leybold Heraeus GmbH
Publication of FR2470384A1 publication Critical patent/FR2470384A1/fr
Application granted granted Critical
Publication of FR2470384B1 publication Critical patent/FR2470384B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
FR808024994A 1979-11-26 1980-11-25 Dispositif de surveillance et de commande de processus plasmiques Expired FR2470384B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19792947542 DE2947542A1 (de) 1979-11-26 1979-11-26 Einrichtung zur ueberwachung und/oder steuerung von plasmaprozessen

Publications (2)

Publication Number Publication Date
FR2470384A1 FR2470384A1 (fr) 1981-05-29
FR2470384B1 true FR2470384B1 (fr) 1985-07-26

Family

ID=6086881

Family Applications (1)

Application Number Title Priority Date Filing Date
FR808024994A Expired FR2470384B1 (fr) 1979-11-26 1980-11-25 Dispositif de surveillance et de commande de processus plasmiques

Country Status (4)

Country Link
US (1) US4362936A (fr)
DE (1) DE2947542A1 (fr)
FR (1) FR2470384B1 (fr)
GB (1) GB2064210B (fr)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2950330C2 (de) * 1979-12-14 1983-06-01 Leybold-Heraeus GmbH, 5000 Köln Vorrichtung zur chemischen Analyse von Proben
DE3467825D1 (en) * 1983-08-31 1988-01-07 Toshiba Kk Method of producing an optical information recording medium
US4665315A (en) * 1985-04-01 1987-05-12 Control Data Corporation Method and apparatus for in-situ plasma cleaning of electron beam optical systems
DE3542111A1 (de) * 1985-11-28 1987-06-04 Nukem Gmbh Verfahren zur durchfuehrung eines glimmprozesses
US4692630A (en) * 1986-05-27 1987-09-08 Inficon Leybold-Heraeus Wavelength specific detection system for measuring the partial pressure of a gas excited by an electron beam
DE3709177A1 (de) * 1987-03-20 1988-09-29 Leybold Ag Verfahren und vorrichtung zur regelung der reaktiven schichtabscheidung auf substraten mittels magnetronkatoden
US4888199A (en) * 1987-07-15 1989-12-19 The Boc Group, Inc. Plasma thin film deposition process
DE3803840A1 (de) * 1988-02-09 1989-08-17 Leybold Ag Fotometer
JPH01268859A (ja) * 1988-04-20 1989-10-26 Casio Comput Co Ltd 透明導電膜の形成方法および形成装置
DE4108001C1 (fr) * 1991-03-13 1992-07-09 Forschungszentrum Juelich Gmbh, 5170 Juelich, De
DE4123589C2 (de) * 1991-07-17 2001-03-29 Leybold Ag Vorrichtung zum Messen der Lichtstrahlung eines Plasmas
DE4138927C2 (de) * 1991-11-27 2000-01-13 Leybold Ag Vorrichtung zur Bestimmung der Gaskonzentration in einer Vakuumkammer
DE4235200C1 (fr) * 1992-10-19 1993-07-29 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
DE4242633C2 (de) * 1992-12-17 1996-11-14 Fraunhofer Ges Forschung Verfahren zur Durchführung von stabilen Niederdruck-Glimmprozessen
DE4322101C2 (de) * 1993-07-02 1995-06-14 Bergmann Thorald Ionenquelle für Flugzeit-Massenspektrometer
DE19515271C2 (de) * 1995-04-26 1999-09-02 Bruker Daltonik Gmbh Vorrichtung für den gasgeführten Transport von Ionen durch ein Kapillarrohr
JPH09324268A (ja) * 1996-06-07 1997-12-16 Fujitsu Ltd 真空処理装置
US7511246B2 (en) 2002-12-12 2009-03-31 Perkinelmer Las Inc. Induction device for generating a plasma
CA2595230C (fr) 2005-03-11 2016-05-03 Perkinelmer, Inc. Plasmas et procedes d'utilisation
US7742167B2 (en) * 2005-06-17 2010-06-22 Perkinelmer Health Sciences, Inc. Optical emission device with boost device
US8622735B2 (en) * 2005-06-17 2014-01-07 Perkinelmer Health Sciences, Inc. Boost devices and methods of using them
JP2008544454A (ja) * 2005-06-17 2008-12-04 パーキンエルマー・インコーポレイテッド 増強装置及びその使用方法
US7453059B2 (en) * 2006-03-10 2008-11-18 Varian Semiconductor Equipment Associates, Inc. Technique for monitoring and controlling a plasma process
US7476849B2 (en) * 2006-03-10 2009-01-13 Varian Semiconductor Equipment Associates, Inc. Technique for monitoring and controlling a plasma process
WO2010030718A2 (fr) * 2008-09-11 2010-03-18 Varian Semiconductor Equipment Associates, Inc. Technique pour la surveillance et la commande d’un traitement par plasma à l’aide d’un spectromètre de mobilité ionique
US8304262B2 (en) * 2011-02-17 2012-11-06 Lam Research Corporation Wiggling control for pseudo-hardmask
DE102012200211A1 (de) * 2012-01-09 2013-07-11 Carl Zeiss Nts Gmbh Vorrichtung und Verfahren zur Oberflächenbearbeitung eines Substrates
GB201212540D0 (en) 2012-07-13 2012-08-29 Uab Electrum Balticum Vacuum treatment process monitoring and control
WO2014011919A2 (fr) 2012-07-13 2014-01-16 Perkinelmer Health Sciences, Inc. Torches et procédés d'utilisation de celles-ci
TWI592650B (zh) 2015-08-20 2017-07-21 國立臺灣大學 檢測裝置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3096438A (en) * 1961-04-24 1963-07-02 Rodger V Neidigh Apparatus for the mass analysis of plasmas on a continuous basis
US3676672A (en) * 1969-02-03 1972-07-11 Benjamin B Meckel Large diameter ion beam apparatus with an apertured plate electrode to maintain uniform flux density across the beam
US3648047A (en) * 1970-07-13 1972-03-07 Perkin Elmer Corp Sensitivity control for mass spectrometer
DE2255302C3 (de) * 1972-11-11 1980-09-11 Leybold-Heraeus Gmbh, 5000 Koeln Einrichtung für die Sekundär-Ionen-Massenspektroskopie
US3861878A (en) * 1972-12-19 1975-01-21 Us Navy General purpose analyzer for plasma media
US3953732A (en) * 1973-09-28 1976-04-27 The University Of Rochester Dynamic mass spectrometer

Also Published As

Publication number Publication date
US4362936A (en) 1982-12-07
GB2064210B (en) 1984-02-08
DE2947542A1 (de) 1981-06-04
GB2064210A (en) 1981-06-10
FR2470384A1 (fr) 1981-05-29

Similar Documents

Publication Publication Date Title
FR2470384B1 (fr) Dispositif de surveillance et de commande de processus plasmiques
IT1156178B (it) Apparecchio e metodo per l'irrorazione con comando a distanza
BE868857A (fr) Procede et dispositif de thermoformage
FR2607354B1 (fr) Procede et dispositif de pollinisation
JPS53104029A (en) Monitoring system and device of responsible condition of lambderrsensor
FR2344368A1 (fr) Procede et dispositif de brasage
JPS53120572A (en) Facility monitoring method and device
BE875350A (fr) Dispositif d'entretoisement, notamment pour des vitrages multiples et son procede de realisation
FR2436438B1 (fr) Procede et dispositif de commande d'affichage de sequence
BE879879A (fr) Procede et dispositif de detection d'intrusion
DE3067676D1 (en) Optical perforating apparatus and system
GB2000347A (en) Alarm device
BE884061A (fr) Dispositif de balisage lumineux et son procede de preparation
FR2592513B1 (fr) Dispositif de surveillance video-mobile
BE853780A (fr) Procede et dispositif de rivetage
FR2344332A1 (fr) Procede et dispositif de tirage de monocristaux
FR2622596B1 (fr) Procede et dispositif de decokage
BE883441A (fr) Procede et dispositif de surveillance de pression
NO147814C (no) Fremgangsmaate og anlegg for elektromagnetisk overvaakning
BE871554R (fr) Procede et dispositif pour la surveillance de courts-circuits
BE865542A (fr) Procede et dispositif pour la surveillance de courts-circuits
FR2340467A1 (fr) Dispositif de retenue d'isolant et son procede de fixation
BE870437A (fr) Procede et dispositif de mise a la terre
FR2351344A1 (fr) Dispositif d'accouplement d'un tube et son procede de realisation
FR2350458A1 (fr) Procede et dispositif de forage subaquatique

Legal Events

Date Code Title Description
ST Notification of lapse