FR2470384B1 - Dispositif de surveillance et de commande de processus plasmiques - Google Patents
Dispositif de surveillance et de commande de processus plasmiquesInfo
- Publication number
- FR2470384B1 FR2470384B1 FR808024994A FR8024994A FR2470384B1 FR 2470384 B1 FR2470384 B1 FR 2470384B1 FR 808024994 A FR808024994 A FR 808024994A FR 8024994 A FR8024994 A FR 8024994A FR 2470384 B1 FR2470384 B1 FR 2470384B1
- Authority
- FR
- France
- Prior art keywords
- plasmic
- controlling device
- process monitoring
- monitoring
- controlling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19792947542 DE2947542A1 (de) | 1979-11-26 | 1979-11-26 | Einrichtung zur ueberwachung und/oder steuerung von plasmaprozessen |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2470384A1 FR2470384A1 (fr) | 1981-05-29 |
FR2470384B1 true FR2470384B1 (fr) | 1985-07-26 |
Family
ID=6086881
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR808024994A Expired FR2470384B1 (fr) | 1979-11-26 | 1980-11-25 | Dispositif de surveillance et de commande de processus plasmiques |
Country Status (4)
Country | Link |
---|---|
US (1) | US4362936A (fr) |
DE (1) | DE2947542A1 (fr) |
FR (1) | FR2470384B1 (fr) |
GB (1) | GB2064210B (fr) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2950330C2 (de) * | 1979-12-14 | 1983-06-01 | Leybold-Heraeus GmbH, 5000 Köln | Vorrichtung zur chemischen Analyse von Proben |
DE3467825D1 (en) * | 1983-08-31 | 1988-01-07 | Toshiba Kk | Method of producing an optical information recording medium |
US4665315A (en) * | 1985-04-01 | 1987-05-12 | Control Data Corporation | Method and apparatus for in-situ plasma cleaning of electron beam optical systems |
DE3542111A1 (de) * | 1985-11-28 | 1987-06-04 | Nukem Gmbh | Verfahren zur durchfuehrung eines glimmprozesses |
US4692630A (en) * | 1986-05-27 | 1987-09-08 | Inficon Leybold-Heraeus | Wavelength specific detection system for measuring the partial pressure of a gas excited by an electron beam |
DE3709177A1 (de) * | 1987-03-20 | 1988-09-29 | Leybold Ag | Verfahren und vorrichtung zur regelung der reaktiven schichtabscheidung auf substraten mittels magnetronkatoden |
US4888199A (en) * | 1987-07-15 | 1989-12-19 | The Boc Group, Inc. | Plasma thin film deposition process |
DE3803840A1 (de) * | 1988-02-09 | 1989-08-17 | Leybold Ag | Fotometer |
JPH01268859A (ja) * | 1988-04-20 | 1989-10-26 | Casio Comput Co Ltd | 透明導電膜の形成方法および形成装置 |
DE4108001C1 (fr) * | 1991-03-13 | 1992-07-09 | Forschungszentrum Juelich Gmbh, 5170 Juelich, De | |
DE4123589C2 (de) * | 1991-07-17 | 2001-03-29 | Leybold Ag | Vorrichtung zum Messen der Lichtstrahlung eines Plasmas |
DE4138927C2 (de) * | 1991-11-27 | 2000-01-13 | Leybold Ag | Vorrichtung zur Bestimmung der Gaskonzentration in einer Vakuumkammer |
DE4235200C1 (fr) * | 1992-10-19 | 1993-07-29 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De | |
DE4242633C2 (de) * | 1992-12-17 | 1996-11-14 | Fraunhofer Ges Forschung | Verfahren zur Durchführung von stabilen Niederdruck-Glimmprozessen |
DE4322101C2 (de) * | 1993-07-02 | 1995-06-14 | Bergmann Thorald | Ionenquelle für Flugzeit-Massenspektrometer |
DE19515271C2 (de) * | 1995-04-26 | 1999-09-02 | Bruker Daltonik Gmbh | Vorrichtung für den gasgeführten Transport von Ionen durch ein Kapillarrohr |
JPH09324268A (ja) * | 1996-06-07 | 1997-12-16 | Fujitsu Ltd | 真空処理装置 |
US7511246B2 (en) | 2002-12-12 | 2009-03-31 | Perkinelmer Las Inc. | Induction device for generating a plasma |
CA2595230C (fr) | 2005-03-11 | 2016-05-03 | Perkinelmer, Inc. | Plasmas et procedes d'utilisation |
US7742167B2 (en) * | 2005-06-17 | 2010-06-22 | Perkinelmer Health Sciences, Inc. | Optical emission device with boost device |
US8622735B2 (en) * | 2005-06-17 | 2014-01-07 | Perkinelmer Health Sciences, Inc. | Boost devices and methods of using them |
JP2008544454A (ja) * | 2005-06-17 | 2008-12-04 | パーキンエルマー・インコーポレイテッド | 増強装置及びその使用方法 |
US7453059B2 (en) * | 2006-03-10 | 2008-11-18 | Varian Semiconductor Equipment Associates, Inc. | Technique for monitoring and controlling a plasma process |
US7476849B2 (en) * | 2006-03-10 | 2009-01-13 | Varian Semiconductor Equipment Associates, Inc. | Technique for monitoring and controlling a plasma process |
WO2010030718A2 (fr) * | 2008-09-11 | 2010-03-18 | Varian Semiconductor Equipment Associates, Inc. | Technique pour la surveillance et la commande d’un traitement par plasma à l’aide d’un spectromètre de mobilité ionique |
US8304262B2 (en) * | 2011-02-17 | 2012-11-06 | Lam Research Corporation | Wiggling control for pseudo-hardmask |
DE102012200211A1 (de) * | 2012-01-09 | 2013-07-11 | Carl Zeiss Nts Gmbh | Vorrichtung und Verfahren zur Oberflächenbearbeitung eines Substrates |
GB201212540D0 (en) | 2012-07-13 | 2012-08-29 | Uab Electrum Balticum | Vacuum treatment process monitoring and control |
WO2014011919A2 (fr) | 2012-07-13 | 2014-01-16 | Perkinelmer Health Sciences, Inc. | Torches et procédés d'utilisation de celles-ci |
TWI592650B (zh) | 2015-08-20 | 2017-07-21 | 國立臺灣大學 | 檢測裝置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3096438A (en) * | 1961-04-24 | 1963-07-02 | Rodger V Neidigh | Apparatus for the mass analysis of plasmas on a continuous basis |
US3676672A (en) * | 1969-02-03 | 1972-07-11 | Benjamin B Meckel | Large diameter ion beam apparatus with an apertured plate electrode to maintain uniform flux density across the beam |
US3648047A (en) * | 1970-07-13 | 1972-03-07 | Perkin Elmer Corp | Sensitivity control for mass spectrometer |
DE2255302C3 (de) * | 1972-11-11 | 1980-09-11 | Leybold-Heraeus Gmbh, 5000 Koeln | Einrichtung für die Sekundär-Ionen-Massenspektroskopie |
US3861878A (en) * | 1972-12-19 | 1975-01-21 | Us Navy | General purpose analyzer for plasma media |
US3953732A (en) * | 1973-09-28 | 1976-04-27 | The University Of Rochester | Dynamic mass spectrometer |
-
1979
- 1979-11-26 DE DE19792947542 patent/DE2947542A1/de not_active Ceased
-
1980
- 1980-09-10 GB GB8029262A patent/GB2064210B/en not_active Expired
- 1980-11-25 FR FR808024994A patent/FR2470384B1/fr not_active Expired
- 1980-11-26 US US06/210,596 patent/US4362936A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US4362936A (en) | 1982-12-07 |
GB2064210B (en) | 1984-02-08 |
DE2947542A1 (de) | 1981-06-04 |
GB2064210A (en) | 1981-06-10 |
FR2470384A1 (fr) | 1981-05-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |