FR2464495B1 - HIGH-CUT DIRECTIONAL SPATIAL FILTER FOR DEFECT INSPECTION APPARATUS - Google Patents
HIGH-CUT DIRECTIONAL SPATIAL FILTER FOR DEFECT INSPECTION APPARATUSInfo
- Publication number
- FR2464495B1 FR2464495B1 FR8018592A FR8018592A FR2464495B1 FR 2464495 B1 FR2464495 B1 FR 2464495B1 FR 8018592 A FR8018592 A FR 8018592A FR 8018592 A FR8018592 A FR 8018592A FR 2464495 B1 FR2464495 B1 FR 2464495B1
- Authority
- FR
- France
- Prior art keywords
- inspection apparatus
- defect inspection
- spatial filter
- directional spatial
- cut
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/46—Systems using spatial filters
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Image Processing (AREA)
- Optical Head (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10864779A JPS6027964B2 (en) | 1979-08-28 | 1979-08-28 | Directional high-cut spatial frequency filter |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2464495A1 FR2464495A1 (en) | 1981-03-06 |
FR2464495B1 true FR2464495B1 (en) | 1986-05-16 |
Family
ID=14490098
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8018592A Expired FR2464495B1 (en) | 1979-08-28 | 1980-08-27 | HIGH-CUT DIRECTIONAL SPATIAL FILTER FOR DEFECT INSPECTION APPARATUS |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS6027964B2 (en) |
DE (1) | DE3031816A1 (en) |
FR (1) | FR2464495B1 (en) |
GB (1) | GB2058395B (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58158921A (en) * | 1982-03-16 | 1983-09-21 | Dainippon Printing Co Ltd | Defect inspection apparatus of regular pattern |
JPS608823A (en) * | 1983-06-29 | 1985-01-17 | Hamamatsu Photonics Kk | Spatial optical modulator |
JPH0827443B2 (en) * | 1986-10-16 | 1996-03-21 | オリンパス光学工業株式会社 | Shuriren optical device |
JPH0682102B2 (en) * | 1987-02-27 | 1994-10-19 | 三菱電機株式会社 | Pattern defect inspection device and pattern defect inspection method |
FR2641928B1 (en) * | 1989-01-17 | 1996-09-13 | Thomson Csf | IMAGE PROJECTION DEVICE |
JPH0755741Y2 (en) * | 1991-01-25 | 1995-12-20 | 富士通テン株式会社 | Floating lock mechanism for disc player |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3614232A (en) * | 1968-11-25 | 1971-10-19 | Ibm | Pattern defect sensing using error free blocking spacial filter |
US4000949A (en) * | 1969-09-15 | 1977-01-04 | Western Electric Company, Inc. | Photomask inspection by optical spatial filtering |
US3790280A (en) * | 1972-05-03 | 1974-02-05 | Western Electric Co | Spatial filtering system utilizing compensating elements |
JPS5324301B2 (en) * | 1974-09-09 | 1978-07-20 | ||
JPS5276088A (en) * | 1975-12-22 | 1977-06-25 | Toshiba Corp | System for inspecting defects of pattern having directivity |
-
1979
- 1979-08-28 JP JP10864779A patent/JPS6027964B2/en not_active Expired
-
1980
- 1980-08-22 DE DE19803031816 patent/DE3031816A1/en active Granted
- 1980-08-26 GB GB8027602A patent/GB2058395B/en not_active Expired
- 1980-08-27 FR FR8018592A patent/FR2464495B1/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB2058395A (en) | 1981-04-08 |
DE3031816C2 (en) | 1990-06-28 |
JPS5633621A (en) | 1981-04-04 |
DE3031816A1 (en) | 1981-03-19 |
JPS6027964B2 (en) | 1985-07-02 |
GB2058395B (en) | 1983-04-27 |
FR2464495A1 (en) | 1981-03-06 |
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