FR2421929A1 - Compositions, bains de placage et procede pour l'electrodeposition d'etain et/ou de plomb - Google Patents

Compositions, bains de placage et procede pour l'electrodeposition d'etain et/ou de plomb

Info

Publication number
FR2421929A1
FR2421929A1 FR7829542A FR7829542A FR2421929A1 FR 2421929 A1 FR2421929 A1 FR 2421929A1 FR 7829542 A FR7829542 A FR 7829542A FR 7829542 A FR7829542 A FR 7829542A FR 2421929 A1 FR2421929 A1 FR 2421929A1
Authority
FR
France
Prior art keywords
tin
lead
baths
compositions
electrodeposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7829542A
Other languages
English (en)
Other versions
FR2421929B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hull & Co R O
Original Assignee
Hull & Co R O
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hull & Co R O filed Critical Hull & Co R O
Publication of FR2421929A1 publication Critical patent/FR2421929A1/fr
Application granted granted Critical
Publication of FR2421929B1 publication Critical patent/FR2421929B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/30—Electroplating: Baths therefor from solutions of tin
    • C25D3/32—Electroplating: Baths therefor from solutions of tin characterised by the organic bath constituents used
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/34—Electroplating: Baths therefor from solutions of lead
    • C25D3/36—Electroplating: Baths therefor from solutions of lead characterised by the organic bath constituents used
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

L'invention concerne une composition qui est utile en particulier pour améliorer l'électrodéposition d'étain, de plomb ou d'un alliage étain-plomb à partir d'un bain acide aqueux d'électrodéposition. La nouvelle composition comprend un produit de réaction d'un composé hétérocyclique azoté non-saturé avec un mélange comprenant du formaldéhyde et un aldéhyde aliphatique non-saturé contenant jusqu'à environ six atomes de carbone. L'invention concerne aussi des bains acides aqueux d'électrodéposition contenant les additifs ci-dessus selon l'invention et des procédés pour déposer de l'étain, du plomb ou des alliages étain-plomb à partir de ces bains ainsi que des compositions d'additifs pour former les bains. Application au placage de supports.
FR7829542A 1978-04-05 1978-10-17 Compositions, bains de placage et procede pour l'electrodeposition d'etain et/ou de plomb Granted FR2421929A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/893,618 US4139425A (en) 1978-04-05 1978-04-05 Composition, plating bath, and method for electroplating tin and/or lead

Publications (2)

Publication Number Publication Date
FR2421929A1 true FR2421929A1 (fr) 1979-11-02
FR2421929B1 FR2421929B1 (fr) 1982-05-21

Family

ID=25401818

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7829542A Granted FR2421929A1 (fr) 1978-04-05 1978-10-17 Compositions, bains de placage et procede pour l'electrodeposition d'etain et/ou de plomb

Country Status (7)

Country Link
US (1) US4139425A (fr)
JP (1) JPS54134041A (fr)
AU (1) AU526543B2 (fr)
DE (1) DE2845137A1 (fr)
FR (1) FR2421929A1 (fr)
GB (1) GB1600186A (fr)
SE (1) SE444823B (fr)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL120216B1 (en) * 1979-01-11 1982-02-27 Politechnika Warszawska Process for electrochemical manufacture of bright tin coatingsovjannykh pokrytijj
US4381228A (en) * 1981-06-16 1983-04-26 Occidental Chemical Corporation Process and composition for the electrodeposition of tin and tin alloys
BG34691A1 (en) * 1981-07-14 1983-11-15 Todorov Electrolyte for depositing bright tin coatings
SE8204505L (sv) * 1981-09-08 1983-03-09 Occidental Chem Co Elektropletering for avsettning av tenn-blylegeringar pa olika underlag
US5066367B1 (en) * 1981-09-11 1993-12-21 I. Nobel Fred Limiting tin sludge formation in tin or tin/lead electroplating solutions
US4586990A (en) * 1982-03-15 1986-05-06 Gsp Metals & Chemicals Corporation Chelating metals
US4417957A (en) * 1982-09-03 1983-11-29 Columbia Chemical Corporation Aqueous acid plating bath and brightener mixture for producing semibright to bright electrodeposits of tin
JPS59182986A (ja) * 1983-04-01 1984-10-17 Keigo Obata スズ、鉛及びすず−鉛合金メツキ浴
US4502926A (en) * 1983-08-22 1985-03-05 Macdermid, Incorporated Method for electroplating metals using microemulsion additive compositions
JPS61117297A (ja) * 1984-11-13 1986-06-04 Ebara Yuujiraito Kk スズ属金属めつき液
US4818248A (en) * 1986-10-10 1989-04-04 Ciba-Geigy Corporation Process for dyeing natural or synthetic polyamide fibre materials with 1:1 metal complex dyes in presence of alkali metal fluordsilicate or amindnlum silicate
US5174887A (en) * 1987-12-10 1992-12-29 Learonal, Inc. High speed electroplating of tinplate
US4880507A (en) * 1987-12-10 1989-11-14 Learonal, Inc. Tin, lead or tin/lead alloy electrolytes for high speed electroplating
US4923576A (en) * 1988-07-06 1990-05-08 Technic, Inc. Additives for electroplating compositions and methods for their use
US4981564A (en) * 1988-07-06 1991-01-01 Technic Inc. Additives for electroplating compositions and methods for their use
US4885064A (en) * 1989-05-22 1989-12-05 Mcgean-Rohco, Inc. Additive composition, plating bath and method for electroplating tin and/or lead
DE3934866A1 (de) * 1989-10-19 1991-04-25 Blasberg Oberflaechentech Verfahren zur abscheidung von blei- und bleihaltigen schichten, elektrolyte zur durchfuehrung des verfahrens sowie verwendung von tensiden in sauren blei-elektrolyten
US5061351A (en) * 1990-07-23 1991-10-29 Enthone-Omi, Inc. Bright tin electrodeposition composition
US5282954A (en) * 1991-12-30 1994-02-01 Atotech Usa, Inc. Alkoxylated diamine surfactants in high-speed tin plating
US5814202A (en) * 1997-10-14 1998-09-29 Usx Corporation Electrolytic tin plating process with reduced sludge production
US6022467A (en) * 1997-10-14 2000-02-08 Usx Corporation Electrolytic tin plating process with reduced sludge production
US6063172A (en) * 1998-10-13 2000-05-16 Mcgean-Rohco, Inc. Aqueous immersion plating bath and method for plating
KR20040035826A (ko) * 2001-09-19 2004-04-29 허니웰 인터내셔널 인코포레이티드 전극이 부착된 양극 어셈블리
US20040231978A1 (en) * 2001-09-19 2004-11-25 White Tamara L Electrode attachment to anode assembly
US20060096867A1 (en) * 2004-11-10 2006-05-11 George Bokisa Tin alloy electroplating system
FR2906542B1 (fr) * 2006-10-03 2008-12-05 Electro Rech Sarl Bain d'electrodeposition de zinc ou d'alliages zinc nickel sur un substrat conducteur.
US7905994B2 (en) * 2007-10-03 2011-03-15 Moses Lake Industries, Inc. Substrate holder and electroplating system
US20090188553A1 (en) * 2008-01-25 2009-07-30 Emat Technology, Llc Methods of fabricating solar-cell structures and resulting solar-cell structures
KR20120005023A (ko) * 2009-04-07 2012-01-13 바스프 에스이 무공극 서브미크론 특징부 충전을 위한 억제제를 포함하는 금속 도금용 조성물
US8262894B2 (en) 2009-04-30 2012-09-11 Moses Lake Industries, Inc. High speed copper plating bath
JP5033979B1 (ja) * 2011-09-29 2012-09-26 ユケン工業株式会社 スズからなるめっき用酸性水系組成物
US20150122662A1 (en) * 2013-11-05 2015-05-07 Rohm And Haas Electronic Materials Llc Plating bath and method
US9809891B2 (en) 2014-06-30 2017-11-07 Rohm And Haas Electronic Materials Llc Plating method
TWI762731B (zh) * 2017-11-08 2022-05-01 美商羅門哈斯電子材料有限公司 銅電鍍組合物及在基板上電鍍銅之方法
CN113430594B (zh) * 2021-05-31 2022-04-01 季华实验室 一种含氮小分子的应用及电镀液

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR880185A (fr) * 1941-03-25 1943-03-16 Roehm & Haas Gmbh Procédé pour préparer des produits de réaction à poids moléculaire élevé à partir de dioxo-imidazolidines et d'aldéhydes
JPS4886740A (fr) * 1972-02-22 1973-11-15

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL134963C (fr) * 1963-08-28
US3850765A (en) * 1973-05-21 1974-11-26 Oxy Metal Finishing Corp Bright solder plating

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR880185A (fr) * 1941-03-25 1943-03-16 Roehm & Haas Gmbh Procédé pour préparer des produits de réaction à poids moléculaire élevé à partir de dioxo-imidazolidines et d'aldéhydes
JPS4886740A (fr) * 1972-02-22 1973-11-15

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
CA1974 *

Also Published As

Publication number Publication date
AU526543B2 (en) 1983-01-20
SE7810945L (sv) 1979-10-06
JPS54134041A (en) 1979-10-18
GB1600186A (en) 1981-10-14
SE444823B (sv) 1986-05-12
FR2421929B1 (fr) 1982-05-21
US4139425A (en) 1979-02-13
AU4066178A (en) 1980-05-01
DE2845137A1 (de) 1979-10-18

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