FR2377654A1 - METHOD FOR MANUFACTURING A PLATE FOR FLAT PRINTING - Google Patents
METHOD FOR MANUFACTURING A PLATE FOR FLAT PRINTINGInfo
- Publication number
- FR2377654A1 FR2377654A1 FR7801186A FR7801186A FR2377654A1 FR 2377654 A1 FR2377654 A1 FR 2377654A1 FR 7801186 A FR7801186 A FR 7801186A FR 7801186 A FR7801186 A FR 7801186A FR 2377654 A1 FR2377654 A1 FR 2377654A1
- Authority
- FR
- France
- Prior art keywords
- substrate
- plate
- image pattern
- ultra
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
Abstract
L'invention est relative à un procédé pour la préparation d'une plaque sèche pour l'impression à plat caractérisé en ce qu'il comprend les stades suivants : a. on revêt une surface d'un substrat transparent à la lumière ultra-violette d'une silicone photodurcissable non durcie, b. on porte la surface du substrat ainsi revêtue en contact direct avec une surface d'une plaque de support pour former un élément laminé, c. on munit l'autre surface du substrat d'une configuration d'image faite d'une manière opaque à la lumière ultra-violette, d. on irradie l'élément laminé de lumière ultra-violette du côté où se trouve la configuration d'image, et e. on sépare le substrat de la plaque de support de façon qu'une partie de la couche de silicone photodurcie est transférée à la surface de la surface de support pour former une plage exempte d'image, tandis qu'une partie de la couche de silicone non durcie reste en place à la surface du substrat, correspondant à la configuration d'image sur la surface du substrat.The invention relates to a process for the preparation of a dry plate for flatbed printing, characterized in that it comprises the following stages: a. coating a surface of a substrate transparent to ultra-violet light with an uncured photocurable silicone, b. the surface of the substrate thus coated is brought in direct contact with a surface of a support plate to form a laminate element, c. the other surface of the substrate is provided with an image pattern made opaque to ultra-violet light, d. the laminated element is irradiated with ultraviolet light on the side where the image pattern is located, and e. separating the substrate from the backing plate so that part of the photocured silicone layer is transferred to the surface of the backing surface to form an image-free patch, while part of the silicone layer uncured remains in place on the surface of the substrate, matching the image pattern on the surface of the substrate.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP433577A JPS5391803A (en) | 1977-01-18 | 1977-01-18 | Method of producing lithographic printing plate |
JP3395677A JPS53120905A (en) | 1977-03-29 | 1977-03-29 | Method of producing lithographic printing plate |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2377654A1 true FR2377654A1 (en) | 1978-08-11 |
FR2377654B1 FR2377654B1 (en) | 1982-04-23 |
Family
ID=26338083
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7801186A Granted FR2377654A1 (en) | 1977-01-18 | 1978-01-17 | METHOD FOR MANUFACTURING A PLATE FOR FLAT PRINTING |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE2802085A1 (en) |
FR (1) | FR2377654A1 (en) |
GB (1) | GB1588063A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2453433A1 (en) * | 1979-04-05 | 1980-10-31 | Dainippon Printing Co Ltd | PROCESS FOR THE MANUFACTURE OF PLATES FOR FLAT PRINTING |
EP0568744A1 (en) * | 1992-05-04 | 1993-11-10 | Hoechst Celanese Corporation | A photosensitive printing plate developed by a peel-apart process |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0487797A1 (en) * | 1990-11-28 | 1992-06-03 | Toyo Ink Manufacturing Co., Ltd. | Image forming method |
US5417164A (en) * | 1991-07-24 | 1995-05-23 | Nippon Shokubai Co., Ltd. | Thermosensitive recording material and thermosensitive recording method |
US7795462B2 (en) * | 2005-01-13 | 2010-09-14 | Xerox Corporation | Crosslinked siloxane outmost layer having aromatic silicon-containing compounds for photoreceptors |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1323869A (en) * | 1970-10-29 | 1973-07-18 | Dainippon Printing Co Ltd | Photopolymerizable compositions |
FR2308126A1 (en) * | 1975-04-14 | 1976-11-12 | Dainippon Printing Co Ltd | PLANOGRAPHIC PRINTING PLATES AND THEIR MANUFACTURING PROCESS |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2207495A1 (en) * | 1971-02-20 | 1972-08-24 | Dainippon Printing Co Ltd | Planographic printing plates and processes for their manufacture |
JPS51134204A (en) * | 1975-05-14 | 1976-11-20 | Nippon Kakoh Seishi Kk | Method of making lithographic press plate |
-
1978
- 1978-01-17 FR FR7801186A patent/FR2377654A1/en active Granted
- 1978-01-18 DE DE19782802085 patent/DE2802085A1/en not_active Withdrawn
- 1978-01-18 GB GB203078A patent/GB1588063A/en not_active Expired
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1323869A (en) * | 1970-10-29 | 1973-07-18 | Dainippon Printing Co Ltd | Photopolymerizable compositions |
FR2308126A1 (en) * | 1975-04-14 | 1976-11-12 | Dainippon Printing Co Ltd | PLANOGRAPHIC PRINTING PLATES AND THEIR MANUFACTURING PROCESS |
Non-Patent Citations (1)
Title |
---|
XEROX DISCLOSURE JOURNAL, volume 1, No. 2, February 1976, R.G. CRYSTAL: 'Process for preparing photocurable waterless lithographic printing masters, page 15 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2453433A1 (en) * | 1979-04-05 | 1980-10-31 | Dainippon Printing Co Ltd | PROCESS FOR THE MANUFACTURE OF PLATES FOR FLAT PRINTING |
US5565303A (en) * | 1990-12-19 | 1996-10-15 | Shaw; Sonya Y. | Photosensitive printing plate developed by a peel-apart process |
EP0568744A1 (en) * | 1992-05-04 | 1993-11-10 | Hoechst Celanese Corporation | A photosensitive printing plate developed by a peel-apart process |
Also Published As
Publication number | Publication date |
---|---|
DE2802085A1 (en) | 1978-07-20 |
FR2377654B1 (en) | 1982-04-23 |
GB1588063A (en) | 1981-04-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ES8606679A1 (en) | Image-producing process. | |
CA2056307A1 (en) | Method of manufacturing a stamper | |
DE3377022D1 (en) | Photosensitive stripping material and process for obtaining a photoresist stencil | |
CS215019B2 (en) | Method of galvanoplastic production of precise flat objects | |
EP0116415A3 (en) | Improvements in or relating to the production of lines of separation in a sheet or other member | |
CA2345517A1 (en) | Method and assembly for producing printing plates | |
BE899388A (en) | CO-EXTRUSION APPARATUS AND METHOD INCLUDING A VALVE HOLDER PLATE AND A POWER SUPPLY. | |
DE69033623T2 (en) | ENGRAVING PROCESS WITH IMAGE MASK AND LIGHT-SENSITIVE LAMINATE FILM FOR THIS IMAGE MASK | |
EP0141868A1 (en) | High resolution phototransparency image forming with photopolymers | |
FR2618568B1 (en) | METHOD FOR MANUFACTURING A DEVICE FOR MODULATING LIGHT | |
FR2377654A1 (en) | METHOD FOR MANUFACTURING A PLATE FOR FLAT PRINTING | |
JP2515521B2 (en) | Improved masking exposure method and plate making method using the same | |
EP0697377A3 (en) | Process for production of glass substrate coated with finely patterned Nesa glass membrane | |
KR960029649A (en) | Method for manufacturing multilayer optical recording medium and apparatus therefor | |
DE3374790D1 (en) | Method for forming thin films | |
FR2453433A1 (en) | PROCESS FOR THE MANUFACTURE OF PLATES FOR FLAT PRINTING | |
JPH08305006A (en) | Production of photosensitive resin plate | |
JPS5753124A (en) | Crystal resonator unit and its production | |
US4445775A (en) | Registration blocks for a photomask assembly | |
JPS55135484A (en) | Manufacture of color solid state pickup element plate | |
JPS57173805A (en) | Optical filter and its manufacture | |
JP2529107B2 (en) | Screen printing plate manufacturing method | |
KR860003534A (en) | Contact printing apparatus using liquid photopolymer | |
EP0257574A3 (en) | Photo/pressure sensitive sheet exposing apparatus | |
JPS6488536A (en) | Dry film photoresist and manufacture thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |