FR2375624A1 - Procede pour l'obtention d'enregistrements en relief - Google Patents

Procede pour l'obtention d'enregistrements en relief

Info

Publication number
FR2375624A1
FR2375624A1 FR7738594A FR7738594A FR2375624A1 FR 2375624 A1 FR2375624 A1 FR 2375624A1 FR 7738594 A FR7738594 A FR 7738594A FR 7738594 A FR7738594 A FR 7738594A FR 2375624 A1 FR2375624 A1 FR 2375624A1
Authority
FR
France
Prior art keywords
layer
photopolymerizable
support
procedure
washing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7738594A
Other languages
English (en)
Other versions
FR2375624B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of FR2375624A1 publication Critical patent/FR2375624A1/fr
Application granted granted Critical
Publication of FR2375624B1 publication Critical patent/FR2375624B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

L'invention est relative à un procédé pour l'obtention d'enregistrement en relief au cours duquel on applique une matière de transfert de couche comprenant une couche photopolymérisable rigide sur un support de couche temporaire flexible, de telle façon sur un support de couche permanent que la couche photopolymérisable soit reliée solidement à cette dernière, on expose la couche photopolymérisable reliée au support permanent à la lumière selon une image, on enlève le support de couche temporaire avant ou après l'exposition, on enlève les parties non exposées de la couche par lavage avec un révélateur et on modifie éventuellement par attaque ou par dépôt de métal la partie de la surface mise à nu par le lavage, caractérisé en ce que l'on utilise une couche photopolymérisable composée d'au moins deux couches partielles photopolymérisables de compositions différentes.
FR7738594A 1976-12-23 1977-12-21 Procede pour l'obtention d'enregistrements en relief Granted FR2375624A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2658422A DE2658422C2 (de) 1976-12-23 1976-12-23 Verfahren zur Herstellung eines Negativ-Trockenresistfilms

Publications (2)

Publication Number Publication Date
FR2375624A1 true FR2375624A1 (fr) 1978-07-21
FR2375624B1 FR2375624B1 (fr) 1980-08-22

Family

ID=5996394

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7738594A Granted FR2375624A1 (fr) 1976-12-23 1977-12-21 Procede pour l'obtention d'enregistrements en relief

Country Status (11)

Country Link
US (1) US4337308A (fr)
JP (1) JPS5382322A (fr)
BE (1) BE862048A (fr)
BR (1) BR7708588A (fr)
CH (1) CH635203A5 (fr)
DE (1) DE2658422C2 (fr)
FR (1) FR2375624A1 (fr)
GB (1) GB1597607A (fr)
IT (1) IT1090632B (fr)
NL (1) NL186723C (fr)
SE (1) SE435108B (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2486671A1 (fr) * 1978-12-25 1982-01-15 Kuznetsov Vladimir Photoresists secs a couches minces
EP0729071A1 (fr) * 1995-02-15 1996-08-28 Schablonentechnik Kufstein Aktiengesellschaft Procédé pour la fabrication d'une matrice d'impression

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4349620A (en) 1979-06-15 1982-09-14 E. I. Du Pont De Nemours And Company Solvent developable photoresist film
JPS58134632A (ja) * 1982-02-05 1983-08-10 Mitsubishi Rayon Co Ltd 感光性積層物
US4504566A (en) * 1982-11-01 1985-03-12 E. I. Du Pont De Nemours And Company Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers
US4786569A (en) * 1985-09-04 1988-11-22 Ciba-Geigy Corporation Adhesively bonded photostructurable polyimide film
DE3606266A1 (de) * 1986-02-27 1987-09-03 Basf Ag Lichtempfindliches aufzeichnungselement
DE3618373A1 (de) * 1986-05-31 1987-12-03 Basf Ag Lichtempfindliches aufzeichnungselement
DE3827245A1 (de) * 1988-08-11 1990-02-15 Hoechst Ag Photopolymerisierbares aufzeichnungsmaterial
DE4024908A1 (de) * 1990-08-06 1992-02-20 Ant Nachrichtentech Verfahren zum herstellen von resistmustern auf substraten
US5288589A (en) * 1992-12-03 1994-02-22 Mckeever Mark R Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits
US5405731A (en) * 1992-12-22 1995-04-11 E. I. Du Pont De Nemours And Company Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits
KR100599219B1 (ko) 1999-06-24 2006-07-12 히다치 가세고교 가부시끼가이샤 감광성 엘리먼트, 감광성 엘리먼트롤, 이것을 사용한레지스트패턴의 제조법, 레지스트패턴, 레지스트패턴적층기판, 배선패턴의 제조법 및 배선패턴
JP2004020643A (ja) * 2002-06-12 2004-01-22 Fuji Photo Film Co Ltd ドライフィルムレジスト及びプリント基板の製造方法
JP5264589B2 (ja) * 2008-03-28 2013-08-14 富士フイルム株式会社 同時２光子吸収３次元光記録媒体および同時２光子３次元光記録方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE755709A (fr) * 1969-10-29 1971-02-15 Shipley Co Procede d'application d'une reserve photographique sur un support et produit obtenu
DE2558530A1 (de) * 1974-12-28 1976-07-08 Fuji Photo Film Co Ltd Bilderzeugungsverfahren

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2964401A (en) * 1957-02-18 1960-12-13 Du Pont Photopolymerizable elements and processes
GB841454A (en) * 1957-09-16 1960-07-13 Du Pont Improvements in or relating to photopolymerisable elements
NL245513A (fr) * 1959-01-23
US3615435A (en) * 1968-02-14 1971-10-26 Du Pont Photohardenable image reproduction element with integral pigmented layer and process for use
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists
BE759791A (nl) * 1969-12-11 1971-06-03 Agfa Gevaert Nv Installatie voor het opdragen van verschillende lagen
US3785817A (en) * 1970-10-05 1974-01-15 A Kuchta Transfer of photopolymer images by irradiation
CA993709A (en) * 1971-01-21 1976-07-27 Leo Roos Composite, mask-forming photohardenable elements
US3770438A (en) * 1971-12-09 1973-11-06 J Celeste Photopolymerizable transfer elements
US3982943A (en) * 1974-03-05 1976-09-28 Ibm Corporation Lift-off method of fabricating thin films and a structure utilizable as a lift-off mask
DE2448850C2 (de) * 1974-10-14 1986-03-13 Hoechst Ag, 6230 Frankfurt Verfahren zum Übertragen einer trockenen thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE755709A (fr) * 1969-10-29 1971-02-15 Shipley Co Procede d'application d'une reserve photographique sur un support et produit obtenu
DE2558530A1 (de) * 1974-12-28 1976-07-08 Fuji Photo Film Co Ltd Bilderzeugungsverfahren

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2486671A1 (fr) * 1978-12-25 1982-01-15 Kuznetsov Vladimir Photoresists secs a couches minces
EP0729071A1 (fr) * 1995-02-15 1996-08-28 Schablonentechnik Kufstein Aktiengesellschaft Procédé pour la fabrication d'une matrice d'impression

Also Published As

Publication number Publication date
US4337308A (en) 1982-06-29
NL7714128A (nl) 1978-06-27
JPS5382322A (en) 1978-07-20
FR2375624B1 (fr) 1980-08-22
DE2658422A1 (de) 1978-06-29
NL186723C (nl) 1991-02-01
NL186723B (nl) 1990-09-03
SE435108B (sv) 1984-09-03
CH635203A5 (de) 1983-03-15
JPS6131855B2 (fr) 1986-07-23
SE7714551L (sv) 1978-06-24
BE862048A (fr) 1978-06-20
IT1090632B (it) 1985-06-26
DE2658422C2 (de) 1986-05-22
GB1597607A (en) 1981-09-09
BR7708588A (pt) 1978-08-08

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Legal Events

Date Code Title Description
ST Notification of lapse