FR2369610A1 - Mecanisme pour positionner et maintenir un objet dans une assiette choisie - Google Patents

Mecanisme pour positionner et maintenir un objet dans une assiette choisie

Info

Publication number
FR2369610A1
FR2369610A1 FR7728523A FR7728523A FR2369610A1 FR 2369610 A1 FR2369610 A1 FR 2369610A1 FR 7728523 A FR7728523 A FR 7728523A FR 7728523 A FR7728523 A FR 7728523A FR 2369610 A1 FR2369610 A1 FR 2369610A1
Authority
FR
France
Prior art keywords
positioning
holding
photomask
support
patch
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7728523A
Other languages
English (en)
Other versions
FR2369610B1 (fr
Inventor
Andrew F Horr
William F White
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2369610A1 publication Critical patent/FR2369610A1/fr
Application granted granted Critical
Publication of FR2369610B1 publication Critical patent/FR2369610B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

Appareil de positionnement Il permet le positionnement et l'alignement d'une pastille semi-conductrice 30 par rapport à un photomasque. La pastille est placée sur un support à dépression 23 et le support est poussé d'un côté par le ressort diaphragme 21 et de l'autre par les doigts 16 s'appuyant sur les éléments 32. Un détecteur à pression 17a place sur l'anneau de raccordement 11 permet de déterminer la position de la pastille par rapport au plan de référence et de commander l'ajustement par les circuits 39 à l'aide des translateurs 14 commandant les bras 15. Evite les contacts de la pastille revêtue de photorésistant avec des dispositifs et peut être utilisé pour l'exposition des pastilles à l'aide d'un photomasque.
FR7728523A 1976-11-01 1977-09-14 Mecanisme pour positionner et maintenir un objet dans une assiette choisie Granted FR2369610A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/737,819 US4093378A (en) 1976-11-01 1976-11-01 Alignment apparatus

Publications (2)

Publication Number Publication Date
FR2369610A1 true FR2369610A1 (fr) 1978-05-26
FR2369610B1 FR2369610B1 (fr) 1980-01-04

Family

ID=24965450

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7728523A Granted FR2369610A1 (fr) 1976-11-01 1977-09-14 Mecanisme pour positionner et maintenir un objet dans une assiette choisie

Country Status (6)

Country Link
US (1) US4093378A (fr)
JP (1) JPS5356974A (fr)
BR (1) BR7707305A (fr)
DE (1) DE2748101C3 (fr)
FR (1) FR2369610A1 (fr)
GB (1) GB1583970A (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0077559A2 (fr) * 1981-10-19 1983-04-27 Hitachi, Ltd. Dispositif pour profiler la surface des plaquettes semi-conductrices
EP0100526A2 (fr) * 1982-08-04 1984-02-15 The Perkin-Elmer Corporation Appareil pour l'alignement et le contrôle de la distance entre un masque et un disque utilisés en lithographie à rayon-X
EP0150074A2 (fr) * 1984-01-23 1985-07-31 Disco Abrasive Systems, Ltd. Procédé et dispositif pour meuler la surface d'une plaquette d'un semi-conducteur
EP0188045A1 (fr) * 1984-01-10 1986-07-23 Hewlett-Packard Company Mandrin déformable
CN104772722A (zh) * 2014-12-31 2015-07-15 苏州市博奥塑胶电子有限公司 一种新型下模具

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4189230A (en) * 1977-10-26 1980-02-19 Fujitsu Limited Wafer holder with spring-loaded wafer-holding means
GB2063524B (en) * 1978-10-20 1982-12-22 Hitachi Ltd Method of positioning a wafer in a projection aligner
JPS562630A (en) * 1979-06-22 1981-01-12 Hitachi Ltd Installing of wafer position in projection aligner
US4198159A (en) * 1978-12-29 1980-04-15 International Business Machines Corporation Optical alignment system in projection printing
US4344160A (en) * 1980-05-02 1982-08-10 The Perkin-Elmer Corporation Automatic wafer focusing and flattening system
JPS59154023A (ja) * 1983-02-22 1984-09-03 Nippon Kogaku Kk <Nikon> 板状体の姿勢制御装置
KR900001241B1 (ko) * 1985-04-17 1990-03-05 가부시기가이샤 히다찌세이사꾸쇼 광 노출 장치
US4749867A (en) * 1985-04-30 1988-06-07 Canon Kabushiki Kaisha Exposure apparatus
JPS611021A (ja) * 1985-05-13 1986-01-07 Hitachi Ltd 露光装置における位置設定方法
US4637713A (en) * 1985-09-27 1987-01-20 Scss Instruments, Inc. Pellicle mounting apparatus
US4791458A (en) * 1986-11-13 1988-12-13 Masi Amerigo De Multi-purpose apparatus for the imaging of printed wired boards
DE3725188A1 (de) * 1987-07-29 1989-02-09 Siemens Ag Halbautomatischer substrathalter fuer waermeprozesse
JP2601834B2 (ja) * 1987-08-26 1997-04-16 株式会社東芝 テーブル装置
JPH03142828A (ja) * 1989-10-27 1991-06-18 Tokyo Electron Ltd 処理装置
DE4114284C2 (de) * 1991-05-02 1993-10-07 Juergen Dipl Ing Pickenhan Vorrichtung zum Behandeln oder Bearbeiten eines Werkstückes, insbesondere einer Schaltkarte
DE4116392C2 (de) * 1991-05-18 2001-05-03 Micronas Gmbh Halterung zur einseitigen Naßätzung von Halbleiterscheiben
DE4120497C2 (de) * 1991-06-21 1994-05-26 Zeiss Carl Jena Gmbh Ausrichtevorrichtung zur Justierung von im funktionellen und geometrischen Zusammenhang stehenden Objekten
AT405224B (de) * 1992-06-05 1999-06-25 Thallner Erich Vorrichtung zum ausrichten, zusammenführen und festhalten von scheibenförmigen bauteilen
JPH06268051A (ja) * 1993-03-10 1994-09-22 Mitsubishi Electric Corp ウエハ剥し装置
JP3445374B2 (ja) * 1994-09-06 2003-09-08 富士写真フイルム株式会社 写真プリンタの可変マスク機構および可変マスク機構のマスク位置決め方法
US5563684A (en) * 1994-11-30 1996-10-08 Sgs-Thomson Microelectronics, Inc. Adaptive wafer modulator for placing a selected pattern on a semiconductor wafer
US5773951A (en) * 1996-03-25 1998-06-30 Digital Test Corporation Wafer prober having sub-micron alignment accuracy
US6113165A (en) * 1998-10-02 2000-09-05 Taiwan Semiconductor Manufacturing Co., Ltd. Self-sensing wafer holder and method of using
US7530271B2 (en) * 2003-03-13 2009-05-12 Sonix, Inc. Method and apparatus for coupling ultrasound between an integral ultrasonic transducer assembly and an object
JP4067511B2 (ja) * 2004-04-07 2008-03-26 アイシン化工株式会社 セグメント摩擦材の製造方法
US7661315B2 (en) * 2004-05-24 2010-02-16 Sonix, Inc. Method and apparatus for ultrasonic scanning of a fabrication wafer
US7917317B2 (en) * 2006-07-07 2011-03-29 Sonix, Inc. Ultrasonic inspection using acoustic modeling

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2170279A1 (fr) * 1972-02-02 1973-09-14 Ibm

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3674368A (en) * 1970-05-11 1972-07-04 Johannsmeier Karl Heinz Out of contact optical alignment and exposure apparatus
US3722996A (en) * 1971-01-04 1973-03-27 Electromask Inc Optical pattern generator or repeating projector or the like
US3940211A (en) * 1971-03-22 1976-02-24 Kasper Instruments, Inc. Step-and-repeat projection alignment and exposure system
US3955072A (en) * 1971-03-22 1976-05-04 Kasper Instruments, Inc. Apparatus for the automatic alignment of two superimposed objects for example a semiconductor wafer and a transparent mask
JPS5837114B2 (ja) * 1972-01-19 1983-08-13 キヤノン株式会社 デンキシキマニピユレ−タ
US3858978A (en) * 1973-08-10 1975-01-07 Kasper Instruments Chuck for use in out-of-contact optical alignment and exposure apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2170279A1 (fr) * 1972-02-02 1973-09-14 Ibm

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0077559A2 (fr) * 1981-10-19 1983-04-27 Hitachi, Ltd. Dispositif pour profiler la surface des plaquettes semi-conductrices
EP0077559A3 (en) * 1981-10-19 1983-10-05 Hitachi, Ltd. Wafer transforming device
EP0100526A2 (fr) * 1982-08-04 1984-02-15 The Perkin-Elmer Corporation Appareil pour l'alignement et le contrôle de la distance entre un masque et un disque utilisés en lithographie à rayon-X
EP0100526A3 (en) * 1982-08-04 1986-03-19 The Perkin-Elmer Corporation Apparatus for effecting alignment and spacing control of a mask and wafer for use in x-ray lithography
EP0188045A1 (fr) * 1984-01-10 1986-07-23 Hewlett-Packard Company Mandrin déformable
EP0150074A2 (fr) * 1984-01-23 1985-07-31 Disco Abrasive Systems, Ltd. Procédé et dispositif pour meuler la surface d'une plaquette d'un semi-conducteur
EP0150074A3 (en) * 1984-01-23 1987-05-13 Disco Abrasive Systems, Ltd. Method and apparatus for grinding the surface of a semiconductor wafer
CN104772722A (zh) * 2014-12-31 2015-07-15 苏州市博奥塑胶电子有限公司 一种新型下模具

Also Published As

Publication number Publication date
DE2748101B2 (de) 1979-04-26
JPS5343024B2 (fr) 1978-11-16
DE2748101C3 (de) 1979-12-13
FR2369610B1 (fr) 1980-01-04
US4093378A (en) 1978-06-06
GB1583970A (en) 1981-02-04
BR7707305A (pt) 1978-07-25
JPS5356974A (en) 1978-05-23
DE2748101A1 (de) 1978-05-03

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Legal Events

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ST Notification of lapse