FR2345810A1 - IMPROVEMENTS TO PHOTOVOLTAIC DEVICES AND CURRENT RECTIFIER DEVICES - Google Patents

IMPROVEMENTS TO PHOTOVOLTAIC DEVICES AND CURRENT RECTIFIER DEVICES

Info

Publication number
FR2345810A1
FR2345810A1 FR7708346A FR7708346A FR2345810A1 FR 2345810 A1 FR2345810 A1 FR 2345810A1 FR 7708346 A FR7708346 A FR 7708346A FR 7708346 A FR7708346 A FR 7708346A FR 2345810 A1 FR2345810 A1 FR 2345810A1
Authority
FR
France
Prior art keywords
devices
current rectifier
photovoltaic
photovoltaic devices
rectifier devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7708346A
Other languages
French (fr)
Other versions
FR2345810B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/710,186 external-priority patent/US4142195A/en
Application filed by RCA Corp filed Critical RCA Corp
Publication of FR2345810A1 publication Critical patent/FR2345810A1/en
Application granted granted Critical
Publication of FR2345810B1 publication Critical patent/FR2345810B1/fr
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/20Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
    • H01L31/202Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic System
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02367Substrates
    • H01L21/0237Materials
    • H01L21/02425Conductive materials, e.g. metallic silicides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02436Intermediate layers between substrates and deposited layers
    • H01L21/02439Materials
    • H01L21/02441Group 14 semiconducting materials
    • H01L21/0245Silicon, silicon germanium, germanium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02436Intermediate layers between substrates and deposited layers
    • H01L21/02439Materials
    • H01L21/02469Group 12/16 materials
    • H01L21/02474Sulfides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • H01L21/02524Group 14 semiconducting materials
    • H01L21/02532Silicon, silicon germanium, germanium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02617Deposition types
    • H01L21/0262Reduction or decomposition of gaseous compounds, e.g. CVD
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/04Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
    • H01L31/07Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the Schottky type
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product
FR7708346A 1976-03-22 1977-03-21 IMPROVEMENTS TO PHOTOVOLTAIC DEVICES AND CURRENT RECTIFIER DEVICES Granted FR2345810A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US66890876A 1976-03-22 1976-03-22
US05/710,186 US4142195A (en) 1976-03-22 1976-07-30 Schottky barrier semiconductor device and method of making same

Publications (2)

Publication Number Publication Date
FR2345810A1 true FR2345810A1 (en) 1977-10-21
FR2345810B1 FR2345810B1 (en) 1982-04-09

Family

ID=27100017

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7708346A Granted FR2345810A1 (en) 1976-03-22 1977-03-21 IMPROVEMENTS TO PHOTOVOLTAIC DEVICES AND CURRENT RECTIFIER DEVICES

Country Status (6)

Country Link
JP (1) JPS52122471A (en)
CA (1) CA1078078A (en)
DE (1) DE2711365A1 (en)
FR (1) FR2345810A1 (en)
GB (1) GB1572846A (en)
HK (1) HK72084A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2432765A1 (en) * 1978-03-16 1980-02-29 Energy Conversion Devices Inc METHOD FOR MANUFACTURING SEMICONDUCTOR FILM AND SEMICONDUCTOR FILM USING THE SAME
EP0008406A1 (en) * 1978-08-23 1980-03-05 Siemens Aktiengesellschaft Method for producing a passivating layer on a silicon semiconductor body
FR2451637A1 (en) * 1979-03-12 1980-10-10 Rca Corp AMORPHOUS SILICON SOLAR CELL
FR2452072A1 (en) * 1979-03-20 1980-10-17 Sanyo Electric Co DEVICE FOR TRANSFORMING SOLAR ENERGY INTO ANOTHER FORM OF ENERGY
FR2454182A1 (en) * 1979-02-05 1980-11-07 Siemens Ag PROCESS FOR MANUFACTURING SEMICONDUCTOR BODIES CONSTITUTED BY AMORPHOUS SILICON, USING DISCHARGE DISCHARGE
FR2454186A1 (en) * 1977-10-12 1980-11-07 Energy Conversion Devices Inc AMORPHOUS SEMICONDUCTORS AND PROCESS FOR THEIR PREPARATION
FR2462782A1 (en) * 1979-08-03 1981-02-13 Thomson Csf PROCESS FOR PRODUCING A LAYER CONTAINING SILICON AND PHOTOELECTRIC CONVERSION DEVICE USING THE SAME
FR2463508A1 (en) * 1979-08-16 1981-02-20 Anvar Ohmic contact mfr. on hydrogenated amorphous silicon - using intermediate layer starved of hydrogen
EP0029379A1 (en) * 1979-11-15 1981-05-27 Thomson-Csf X or gamma rays detector, especially for radiology; X ray apparatus comprising such a detector
FR2487535A1 (en) * 1977-12-22 1982-01-29 Canon Kk
EP0060699A2 (en) * 1981-03-13 1982-09-22 Hitachi, Ltd. Method of manufacturing photosensors

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2394173A1 (en) * 1977-06-06 1979-01-05 Thomson Csf METHOD OF MANUFACTURING ELECTRONIC DEVICES WHICH INCLUDE A THIN LAYER OF AMORPHIC SILICON AND AN ELECTRONIC DEVICE OBTAINED BY SUCH A PROCESS
US4163677A (en) * 1978-04-28 1979-08-07 Rca Corporation Schottky barrier amorphous silicon solar cell with thin doped region adjacent metal Schottky barrier
JPS54145537A (en) * 1978-05-04 1979-11-13 Canon Inc Preparation of electrophotographic image forming material
US4226643A (en) * 1979-07-16 1980-10-07 Rca Corporation Method of enhancing the electronic properties of an undoped and/or N-type hydrogenated amorphous silicon film
JPS5728368A (en) * 1980-07-28 1982-02-16 Hitachi Ltd Manufacture of semiconductor film
JPS604273A (en) * 1983-06-22 1985-01-10 Toshiba Corp Photoelectric conversion member
JPS604274A (en) * 1983-06-22 1985-01-10 Toshiba Corp Photoelectric conversion member
JPS6088955A (en) * 1983-10-21 1985-05-18 Stanley Electric Co Ltd Plasma cvd device
JPS62142374A (en) * 1986-11-29 1987-06-25 Shunpei Yamazaki Manufacture of photoelectric conversion semiconductor device
JP2704569B2 (en) * 1991-06-28 1998-01-26 株式会社半導体エネルギー研究所 Semiconductor device manufacturing method
JPH077168A (en) * 1994-04-15 1995-01-10 Semiconductor Energy Lab Co Ltd Photoeletcric conversion semiconductor device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NV320/76 *

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2454186A1 (en) * 1977-10-12 1980-11-07 Energy Conversion Devices Inc AMORPHOUS SEMICONDUCTORS AND PROCESS FOR THEIR PREPARATION
FR2487535A1 (en) * 1977-12-22 1982-01-29 Canon Kk
FR2432765A1 (en) * 1978-03-16 1980-02-29 Energy Conversion Devices Inc METHOD FOR MANUFACTURING SEMICONDUCTOR FILM AND SEMICONDUCTOR FILM USING THE SAME
EP0008406A1 (en) * 1978-08-23 1980-03-05 Siemens Aktiengesellschaft Method for producing a passivating layer on a silicon semiconductor body
FR2454182A1 (en) * 1979-02-05 1980-11-07 Siemens Ag PROCESS FOR MANUFACTURING SEMICONDUCTOR BODIES CONSTITUTED BY AMORPHOUS SILICON, USING DISCHARGE DISCHARGE
FR2451637A1 (en) * 1979-03-12 1980-10-10 Rca Corp AMORPHOUS SILICON SOLAR CELL
FR2452072A1 (en) * 1979-03-20 1980-10-17 Sanyo Electric Co DEVICE FOR TRANSFORMING SOLAR ENERGY INTO ANOTHER FORM OF ENERGY
FR2462782A1 (en) * 1979-08-03 1981-02-13 Thomson Csf PROCESS FOR PRODUCING A LAYER CONTAINING SILICON AND PHOTOELECTRIC CONVERSION DEVICE USING THE SAME
EP0024378A1 (en) * 1979-08-03 1981-03-04 Thomson-Csf Method of manufacturing a layer containig silicon with an hybrid structure between an amorphous and a polycrystalline form, and solar cell containig such a layer
FR2463508A1 (en) * 1979-08-16 1981-02-20 Anvar Ohmic contact mfr. on hydrogenated amorphous silicon - using intermediate layer starved of hydrogen
EP0029379A1 (en) * 1979-11-15 1981-05-27 Thomson-Csf X or gamma rays detector, especially for radiology; X ray apparatus comprising such a detector
EP0060699A2 (en) * 1981-03-13 1982-09-22 Hitachi, Ltd. Method of manufacturing photosensors
EP0060699A3 (en) * 1981-03-13 1983-10-19 Hitachi, Ltd. Method of manufacturing photosensors

Also Published As

Publication number Publication date
CA1078078A (en) 1980-05-20
GB1572846A (en) 1980-08-06
JPS52122471A (en) 1977-10-14
DE2711365A1 (en) 1977-09-29
HK72084A (en) 1984-09-28
DE2711365C2 (en) 1988-09-01
FR2345810B1 (en) 1982-04-09
JPS616556B2 (en) 1986-02-27

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Legal Events

Date Code Title Description
ST Notification of lapse