FR2327569A1 - PHOTOSENSITIVE RESIN COMPOSITION - Google Patents

PHOTOSENSITIVE RESIN COMPOSITION

Info

Publication number
FR2327569A1
FR2327569A1 FR7344539A FR7344539A FR2327569A1 FR 2327569 A1 FR2327569 A1 FR 2327569A1 FR 7344539 A FR7344539 A FR 7344539A FR 7344539 A FR7344539 A FR 7344539A FR 2327569 A1 FR2327569 A1 FR 2327569A1
Authority
FR
France
Prior art keywords
resin composition
photosensitive resin
photosensitive
composition
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7344539A
Other languages
French (fr)
Other versions
FR2327569B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of FR2327569A1 publication Critical patent/FR2327569A1/en
Application granted granted Critical
Publication of FR2327569B1 publication Critical patent/FR2327569B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerization Catalysts (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polyurethanes Or Polyureas (AREA)
FR7344539A 1972-12-14 1973-12-13 PHOTOSENSITIVE RESIN COMPOSITION Granted FR2327569A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31520772A 1972-12-14 1972-12-14

Publications (2)

Publication Number Publication Date
FR2327569A1 true FR2327569A1 (en) 1977-05-06
FR2327569B1 FR2327569B1 (en) 1978-03-24

Family

ID=23223361

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7344539A Granted FR2327569A1 (en) 1972-12-14 1973-12-13 PHOTOSENSITIVE RESIN COMPOSITION

Country Status (9)

Country Link
JP (1) JPS543727B2 (en)
BR (1) BR7309820D0 (en)
CH (1) CH587500A5 (en)
DE (1) DE2361931A1 (en)
FR (1) FR2327569A1 (en)
GB (1) GB1463818A (en)
IT (1) IT1000315B (en)
NL (1) NL7317180A (en)
SE (1) SE404094B (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
LU75749A1 (en) * 1976-09-08 1978-04-27
NL8001085A (en) * 1979-02-27 1980-08-29 Minnesota Mining & Mfg PHOTOSENSITIVE MATERIALS AND OBJECTS.
DE2948554A1 (en) * 1979-12-03 1981-06-04 Hoechst Ag, 6000 Frankfurt LIGHT SENSITIVE MIXTURE
US4316949A (en) * 1979-12-14 1982-02-23 Minnesota Mining And Manufacturing Company Photoreactive oligomer composition and printing plate
JPS584421U (en) * 1981-07-02 1983-01-12 東海興業株式会社 Weatherstrip with curtain rail
JPS5938747A (en) * 1982-08-27 1984-03-02 Okamoto Kagaku Kogyo Kk Photosensitive lithographic plate
JPS6471114A (en) * 1987-05-02 1989-03-16 Hope Seiki Assembly and manufacturing device for tip type electrolytic capacitor
DE3824146A1 (en) * 1988-07-16 1990-02-22 Hoechst Ag LIGHT-CURABLE ELASTOMERIC MIXTURE AND RECEIVED RECORD MATERIAL FOR THE PRODUCTION OF FLEXO PRINTING PLATES
WO1993006528A1 (en) * 1991-09-13 1993-04-01 Sun Chemical Corporation Positive-working coating compositions
US5466789A (en) * 1992-01-21 1995-11-14 Du Pont (Uk) Limited Polyunsaturated diazonium compounds
GB2263906B (en) * 1992-01-21 1995-11-08 Du Pont Improvements in or relating to polyunsaturated diazonium compounds
US5534623A (en) * 1993-01-21 1996-07-09 Du Pont (Uk) Limited Process for preparing a polyunsaturated diazonium compounds
ES2320561T3 (en) 2005-11-18 2009-05-25 Agfa Graphics N.V. METHOD FOR MANUFACTURING A LITHOGRAPHIC PRINT IRON.

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2102382A1 (en) * 1970-01-19 1971-09-09 Dainippon Ink & Chemicals Photopolymerizable compositions

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2102382A1 (en) * 1970-01-19 1971-09-09 Dainippon Ink & Chemicals Photopolymerizable compositions

Also Published As

Publication number Publication date
AU6328473A (en) 1975-06-12
BR7309820D0 (en) 1974-09-24
FR2327569B1 (en) 1978-03-24
JPS543727B2 (en) 1979-02-26
DE2361931A1 (en) 1974-06-20
JPS5018585A (en) 1975-02-27
IT1000315B (en) 1976-03-30
GB1463818A (en) 1977-02-09
CH587500A5 (en) 1977-05-13
NL7317180A (en) 1974-06-18
SE404094B (en) 1978-09-18

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Legal Events

Date Code Title Description
ST Notification of lapse