FR2274073A1 - Procede de positionnement automatique des surfaces d'image et/ou d'objet dans les copieurs optiques - Google Patents

Procede de positionnement automatique des surfaces d'image et/ou d'objet dans les copieurs optiques

Info

Publication number
FR2274073A1
FR2274073A1 FR7514031A FR7514031A FR2274073A1 FR 2274073 A1 FR2274073 A1 FR 2274073A1 FR 7514031 A FR7514031 A FR 7514031A FR 7514031 A FR7514031 A FR 7514031A FR 2274073 A1 FR2274073 A1 FR 2274073A1
Authority
FR
France
Prior art keywords
positioning image
object surfaces
automatically positioning
optical copiers
copiers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7514031A
Other languages
English (en)
French (fr)
Other versions
FR2274073B1 (ja
Inventor
Hans-Erdmann Korth
Albert Frosch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19742427323 external-priority patent/DE2427323C2/de
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2274073A1 publication Critical patent/FR2274073A1/fr
Application granted granted Critical
Publication of FR2274073B1 publication Critical patent/FR2274073B1/fr
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Focusing (AREA)
  • Projection-Type Copiers In General (AREA)
  • Automatic Focus Adjustment (AREA)
FR7514031A 1974-06-06 1975-04-29 Procede de positionnement automatique des surfaces d'image et/ou d'objet dans les copieurs optiques Granted FR2274073A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742427323 DE2427323C2 (de) 1974-06-06 Verfahren zur automatischen Positionierung der Bild- und/oder Objektflächen bei optischen Kopiervorrichtungen

Publications (2)

Publication Number Publication Date
FR2274073A1 true FR2274073A1 (fr) 1976-01-02
FR2274073B1 FR2274073B1 (ja) 1977-07-08

Family

ID=5917467

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7514031A Granted FR2274073A1 (fr) 1974-06-06 1975-04-29 Procede de positionnement automatique des surfaces d'image et/ou d'objet dans les copieurs optiques

Country Status (5)

Country Link
JP (1) JPS5925212B2 (ja)
CA (1) CA1032382A (ja)
FR (1) FR2274073A1 (ja)
GB (1) GB1501908A (ja)
IT (1) IT1037606B (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2447050A1 (fr) * 1978-10-19 1980-08-14 Censor Patent Versuch Dispositif pour projeter l'image d'un masque sur un substrat
EP0015789A1 (fr) * 1979-02-27 1980-09-17 Thomson-Csf Dispositif optique de projection en photorépétition
EP0017044A2 (en) * 1979-04-02 1980-10-15 Eaton-Optimetrix Inc. A system for positioning a utilization device
EP0019721A1 (de) * 1979-05-30 1980-12-10 International Business Machines Corporation Optische Projektionseinrichtung zum Ausrichten eines Projektionsbildes auf einer Oberfläche
US4540278A (en) * 1979-04-02 1985-09-10 Optimetrix Corporation Optical focusing system
EP0341983A2 (en) * 1988-05-10 1989-11-15 Canon Kabushiki Kaisha Exposure system
US5276725A (en) * 1988-05-10 1994-01-04 Canon Kabushiki Kaisha Exposure system

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607764B2 (ja) * 1976-04-28 1985-02-27 キヤノン株式会社 走査型光検出装置
JPS53135653A (en) * 1977-05-01 1978-11-27 Canon Inc Photoelectric detecting optical device
JPS5532662A (en) * 1978-08-30 1980-03-07 Bando Chem Ind Ltd Stamp compound
JPS5817446A (ja) * 1981-07-24 1983-02-01 Hitachi Ltd 投影露光方法および装置
JPS59100406A (ja) * 1982-11-30 1984-06-09 Asahi Optical Co Ltd 顕微鏡系における自動合焦装置
JPS6021051A (ja) * 1983-07-14 1985-02-02 Nippon Telegr & Teleph Corp <Ntt> レンズ投影露光方法及び装置
JPS6174338A (ja) * 1984-09-20 1986-04-16 Hitachi Ltd 縮小投影露光装置およびその方法
JPS61221716A (ja) * 1985-01-22 1986-10-02 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン 顕微鏡を用いる光学的検査装置の自動焦点装置
JP2622841B2 (ja) * 1987-09-24 1997-06-25 旭光学工業株式会社 露光装置
JP2501053B2 (ja) * 1991-10-04 1996-05-29 株式会社日立製作所 紫外パルスレ―ザによる投影式露光方法
JPH0712019B2 (ja) * 1992-03-13 1995-02-08 株式会社日立製作所 投影露光方法及び投影露光装置
JP2530423B2 (ja) * 1994-04-22 1996-09-04 株式会社日立製作所 パタ−ン刻印装置
GB2414294B (en) 2004-05-20 2006-08-02 Teraview Ltd Apparatus and method for investigating a sample
CN109947140B (zh) * 2019-04-03 2023-08-22 辽宁科技大学 一种5自由度激光准直微调装置及其调节方法

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2447050A1 (fr) * 1978-10-19 1980-08-14 Censor Patent Versuch Dispositif pour projeter l'image d'un masque sur un substrat
EP0015789A1 (fr) * 1979-02-27 1980-09-17 Thomson-Csf Dispositif optique de projection en photorépétition
FR2450470A1 (fr) * 1979-02-27 1980-09-26 Thomson Csf Systeme optique de projection en photorepetition
EP0017044A2 (en) * 1979-04-02 1980-10-15 Eaton-Optimetrix Inc. A system for positioning a utilization device
EP0017044A3 (en) * 1979-04-02 1980-12-10 Optimetrix Corporation Optical focusing system
US4540278A (en) * 1979-04-02 1985-09-10 Optimetrix Corporation Optical focusing system
EP0019721A1 (de) * 1979-05-30 1980-12-10 International Business Machines Corporation Optische Projektionseinrichtung zum Ausrichten eines Projektionsbildes auf einer Oberfläche
EP0341983A2 (en) * 1988-05-10 1989-11-15 Canon Kabushiki Kaisha Exposure system
EP0341983A3 (en) * 1988-05-10 1990-06-13 Canon Kabushiki Kaisha Exposure system
US5276725A (en) * 1988-05-10 1994-01-04 Canon Kabushiki Kaisha Exposure system

Also Published As

Publication number Publication date
FR2274073B1 (ja) 1977-07-08
DE2427323B1 (de) 1975-09-25
JPS516565A (ja) 1976-01-20
CA1032382A (en) 1978-06-06
GB1501908A (en) 1978-02-22
DE2427323A1 (ja) 1975-09-25
JPS5925212B2 (ja) 1984-06-15
IT1037606B (it) 1979-11-20

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Legal Events

Date Code Title Description
ST Notification of lapse