FR2183978A1 - Vacuum deposition - by target rod and low voltage magnetically focused electrical discharge - Google Patents

Vacuum deposition - by target rod and low voltage magnetically focused electrical discharge

Info

Publication number
FR2183978A1
FR2183978A1 FR7316647A FR7316647A FR2183978A1 FR 2183978 A1 FR2183978 A1 FR 2183978A1 FR 7316647 A FR7316647 A FR 7316647A FR 7316647 A FR7316647 A FR 7316647A FR 2183978 A1 FR2183978 A1 FR 2183978A1
Authority
FR
France
Prior art keywords
target rod
low voltage
vacuum deposition
electrical discharge
magnetically focused
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7316647A
Other languages
English (en)
French (fr)
Other versions
FR2183978B3 (de
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers Patent und Beteiligungs AG
Original Assignee
Balzers Patent und Beteiligungs AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent und Beteiligungs AG filed Critical Balzers Patent und Beteiligungs AG
Publication of FR2183978A1 publication Critical patent/FR2183978A1/fr
Application granted granted Critical
Publication of FR2183978B3 publication Critical patent/FR2183978B3/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354—Introduction of auxiliary energy into the plasma
    • C23C14/355—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR7316647A 1972-05-09 1973-05-09 Vacuum deposition - by target rod and low voltage magnetically focused electrical discharge Granted FR2183978A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH691072A CH551498A (de) 1972-05-09 1972-05-09 Anordnung zur aufstaeubung von stoffen auf unterlagen mittels einer elektrischen niederspannungsentladung.

Publications (2)

Publication Number Publication Date
FR2183978A1 true FR2183978A1 (en) 1973-12-21
FR2183978B3 FR2183978B3 (de) 1976-04-23

Family

ID=4316966

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7316647A Granted FR2183978A1 (en) 1972-05-09 1973-05-09 Vacuum deposition - by target rod and low voltage magnetically focused electrical discharge

Country Status (4)

Country Link
CH (1) CH551498A (de)
DE (1) DE2321665A1 (de)
FR (1) FR2183978A1 (de)
NL (1) NL7207901A (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2772185A1 (fr) * 1997-11-26 1999-06-11 Vapor Technologies Inc Cathode de pulverisation cathodique ou d'evaporation par arc et appareil la comportant

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2800852C2 (de) * 1978-01-10 1983-07-14 Jurij Akimovič Moskva Dmitriev Einrichtung zum Ionenplasma-Beschichten
DE2830134C2 (de) 1978-07-08 1983-12-08 Wolfgang Ing.(grad.) 7981 Grünkraut Kieferle Verfahren zum Ablagern einer Metall- oder Legierungsschicht auf ein elektrisch leitendes Werkstück
DE2857102C2 (de) * 1978-07-08 1983-12-01 Wolfgang Ing.(grad.) 7981 Grünkraut Kieferle Vorrichtung zum Eindiffundieren und Auflagern einer Metall- oder Legierungsschicht auf ein elektrisch leitendes Werkstück
DE3272083D1 (en) * 1982-03-31 1986-08-28 Ibm Deutschland Reactor for reactive ion etching, and etching process
DE3580953D1 (de) * 1984-08-31 1991-01-31 Anelva Corp Entladungsvorrichtung.
DE3615361C2 (de) * 1986-05-06 1994-09-01 Santos Pereira Ribeiro Car Dos Vorrichtung zur Oberflächenbehandlung von Werkstücken
US10056237B2 (en) 2012-09-14 2018-08-21 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
US9793098B2 (en) 2012-09-14 2017-10-17 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
US9412569B2 (en) 2012-09-14 2016-08-09 Vapor Technologies, Inc. Remote arc discharge plasma assisted processes
ES2563862T3 (es) * 2013-03-15 2016-03-16 Vapor Technologies, Inc. Depósito en fase de vapor de recubrimiento por inmersión en un plasma de arco a baja presión y tratamiento iónico

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2772185A1 (fr) * 1997-11-26 1999-06-11 Vapor Technologies Inc Cathode de pulverisation cathodique ou d'evaporation par arc et appareil la comportant

Also Published As

Publication number Publication date
NL7207901A (de) 1973-11-13
FR2183978B3 (de) 1976-04-23
CH551498A (de) 1974-07-15
DE2321665A1 (de) 1973-11-22

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Legal Events

Date Code Title Description
ST Notification of lapse