FR2058821A5 - Cathodic sputtering device - Google Patents

Cathodic sputtering device

Info

Publication number
FR2058821A5
FR2058821A5 FR6933079A FR6933079A FR2058821A5 FR 2058821 A5 FR2058821 A5 FR 2058821A5 FR 6933079 A FR6933079 A FR 6933079A FR 6933079 A FR6933079 A FR 6933079A FR 2058821 A5 FR2058821 A5 FR 2058821A5
Authority
FR
France
Prior art keywords
grids
sputtering device
metallic
cathodic sputtering
enclosure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR6933079A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Radiotechnique Compelec RTC SA
Original Assignee
Radiotechnique Compelec RTC SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Radiotechnique Compelec RTC SA filed Critical Radiotechnique Compelec RTC SA
Priority to FR6933079A priority Critical patent/FR2058821A5/en
Application granted granted Critical
Publication of FR2058821A5 publication Critical patent/FR2058821A5/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Metallic welded joints in the device are maintained fluid tight by metallic grids which are brought to a potential close to that of the anode. The grids are placed between the part of the enclosure where the discharge is produced and the part closest to the non-metallic elements comprising the enclosure. The openings in the grids are pref. ca. 1/10mm.
FR6933079A 1969-09-29 1969-09-29 Cathodic sputtering device Expired FR2058821A5 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR6933079A FR2058821A5 (en) 1969-09-29 1969-09-29 Cathodic sputtering device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR6933079A FR2058821A5 (en) 1969-09-29 1969-09-29 Cathodic sputtering device

Publications (1)

Publication Number Publication Date
FR2058821A5 true FR2058821A5 (en) 1971-05-28

Family

ID=9040722

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6933079A Expired FR2058821A5 (en) 1969-09-29 1969-09-29 Cathodic sputtering device

Country Status (1)

Country Link
FR (1) FR2058821A5 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2352393A1 (en) * 1976-05-19 1977-12-16 Battelle Memorial Institute PROCESS FOR CARRYING OUT A DEPOSIT IN A LUMINESCENT DISCHARGE ON AT LEAST ONE SUBSTRATE, AND IONIC PICKLING OF THIS SUBSTRATE AND DEVICE FOR IMPLEMENTING THIS PROCESS

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2352393A1 (en) * 1976-05-19 1977-12-16 Battelle Memorial Institute PROCESS FOR CARRYING OUT A DEPOSIT IN A LUMINESCENT DISCHARGE ON AT LEAST ONE SUBSTRATE, AND IONIC PICKLING OF THIS SUBSTRATE AND DEVICE FOR IMPLEMENTING THIS PROCESS

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Legal Events

Date Code Title Description
ST Notification of lapse