FR2056222A5 - - Google Patents

Info

Publication number
FR2056222A5
FR2056222A5 FR7020075A FR7020075A FR2056222A5 FR 2056222 A5 FR2056222 A5 FR 2056222A5 FR 7020075 A FR7020075 A FR 7020075A FR 7020075 A FR7020075 A FR 7020075A FR 2056222 A5 FR2056222 A5 FR 2056222A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7020075A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of FR2056222A5 publication Critical patent/FR2056222A5/fr
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D3/00Control of position or direction
    • G05D3/12Control of position or direction using feedback
    • G05D3/20Control of position or direction using feedback using a digital comparing device

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR7020075A 1969-07-02 1970-06-02 Expired FR2056222A5 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19691933487 DE1933487A1 (de) 1969-07-02 1969-07-02 Lichtpunktschreiber

Publications (1)

Publication Number Publication Date
FR2056222A5 true FR2056222A5 (fr) 1971-05-14

Family

ID=5738610

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7020075A Expired FR2056222A5 (fr) 1969-07-02 1970-06-02

Country Status (3)

Country Link
DE (1) DE1933487A1 (fr)
FR (1) FR2056222A5 (fr)
GB (1) GB1308030A (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2135425B1 (fr) * 1971-05-04 1973-08-10 Thomson Csf
US4500182A (en) * 1982-12-27 1985-02-19 Nicolet Instrument Corporation Photoplotter
NL2008426A (en) 2011-04-08 2012-10-09 Asml Netherlands Bv Lithographic apparatus, programmable patterning device and lithographic method.

Also Published As

Publication number Publication date
GB1308030A (en) 1973-02-21
DE1933487A1 (de) 1971-01-14

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Legal Events

Date Code Title Description
ST Notification of lapse