FR2014490A1 - - Google Patents

Info

Publication number
FR2014490A1
FR2014490A1 FR6918095A FR6918095A FR2014490A1 FR 2014490 A1 FR2014490 A1 FR 2014490A1 FR 6918095 A FR6918095 A FR 6918095A FR 6918095 A FR6918095 A FR 6918095A FR 2014490 A1 FR2014490 A1 FR 2014490A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR6918095A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2014490A1 publication Critical patent/FR2014490A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
FR6918095A 1968-07-03 1969-06-04 Withdrawn FR2014490A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US74229768A 1968-07-03 1968-07-03

Publications (1)

Publication Number Publication Date
FR2014490A1 true FR2014490A1 (en) 1970-04-17

Family

ID=24984258

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6918095A Withdrawn FR2014490A1 (en) 1968-07-03 1969-06-04

Country Status (3)

Country Link
JP (1) JPS4817592B1 (en)
FR (1) FR2014490A1 (en)
GB (1) GB1269408A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0036780A2 (en) * 1980-03-24 1981-09-30 Hitachi, Ltd. Method of producing photoelectric transducers

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5376211A (en) * 1990-09-29 1994-12-27 Tokyo Electron Limited Magnetron plasma processing apparatus and processing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0036780A2 (en) * 1980-03-24 1981-09-30 Hitachi, Ltd. Method of producing photoelectric transducers
EP0036780A3 (en) * 1980-03-24 1982-08-04 Hitachi, Ltd. Method of producing photoelectric transducers

Also Published As

Publication number Publication date
DE1933467B2 (en) 1973-07-19
JPS4817592B1 (en) 1973-05-30
DE1933467A1 (en) 1970-03-05
GB1269408A (en) 1972-04-06

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Legal Events

Date Code Title Description
ST Notification of lapse