FR2006054A1 - - Google Patents
Info
- Publication number
- FR2006054A1 FR2006054A1 FR6911069A FR6911069A FR2006054A1 FR 2006054 A1 FR2006054 A1 FR 2006054A1 FR 6911069 A FR6911069 A FR 6911069A FR 6911069 A FR6911069 A FR 6911069A FR 2006054 A1 FR2006054 A1 FR 2006054A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/02008—Multistep processes
- H01L21/0201—Specific process step
- H01L21/02024—Mirror polishing
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19681752163 DE1752163A1 (en) | 1968-04-11 | 1968-04-11 | Process for polishing semiconductor surfaces |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2006054A1 true FR2006054A1 (en) | 1969-12-19 |
Family
ID=5692658
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR6911069A Withdrawn FR2006054A1 (en) | 1968-04-11 | 1969-04-10 |
Country Status (6)
Country | Link |
---|---|
US (1) | US3877183A (en) |
BE (1) | BE731353A (en) |
CH (1) | CH505466A (en) |
DE (1) | DE1752163A1 (en) |
FR (1) | FR2006054A1 (en) |
GB (1) | GB1234894A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2327036A1 (en) * | 1975-10-08 | 1977-05-06 | Du Pont | Modified silica sol for polishing silicon and germanium - remaining stable without depolymerisation at high pH for rapid polishing |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2531431C3 (en) * | 1975-07-14 | 1979-03-01 | Wacker-Chemitronic Gesellschaft Fuer Elektronik-Grundstoffe Mbh, 8263 Burghausen | Polishing agents for producing haze-free semiconductor surfaces |
DE2538855A1 (en) * | 1975-09-01 | 1977-03-10 | Wacker Chemitronic | PROCESS FOR THE PRODUCTION OF VEIL-FREE SEMICONDUCTOR SURFACES, IN PARTICULAR VEIL-FREE SURFACES OF (111) -ORIENTED GALLIUM ARSENIDE |
JPS55113700A (en) * | 1979-02-19 | 1980-09-02 | Fujimi Kenmazai Kogyo Kk | Polishing method for gadolinium gallium garnet single crystal |
JPS5935429A (en) * | 1982-08-12 | 1984-02-27 | インタ−ナシヨナル ビジネス マシ−ンズ コ−ポレ−シヨン | Method of producing semiconductor wafer |
DE3237235C2 (en) * | 1982-10-07 | 1986-07-10 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Process for polishing III-V semiconductor surfaces |
US4588421A (en) * | 1984-10-15 | 1986-05-13 | Nalco Chemical Company | Aqueous silica compositions for polishing silicon wafers |
US5993685A (en) * | 1997-04-02 | 1999-11-30 | Advanced Technology Materials | Planarization composition for removing metal films |
US6319095B1 (en) * | 2000-03-09 | 2001-11-20 | Agere Systems Guardian Corp. | Colloidal suspension of abrasive particles containing magnesium as CMP slurry |
TWI509690B (en) * | 2006-12-21 | 2015-11-21 | Entegris Inc | Compositions and methods for the selective removal of silicon nitride |
SG11201403175PA (en) * | 2011-12-27 | 2014-08-28 | Konica Minolta Inc | Method for separating polishing material and regenerated polishing material |
CN111253910B (en) * | 2020-03-18 | 2021-07-16 | 昆山捷纳电子材料有限公司 | Preparation method of inorganic polyelectrolyte-silicon oxide composite polishing abrasive particles |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2275049A (en) * | 1942-03-03 | Polish | ||
US2375823A (en) * | 1941-10-16 | 1945-05-15 | Interchem Corp | Polishing composition |
US2375825A (en) * | 1941-10-16 | 1945-05-15 | Interchem Corp | Polishing compositions |
US2399237A (en) * | 1942-12-15 | 1946-04-30 | William T Maloney | Polishing material and process of preparing same |
US2955030A (en) * | 1959-02-25 | 1960-10-04 | Nat Lead Co | Polishing compositions |
US3170273A (en) * | 1963-01-10 | 1965-02-23 | Monsanto Co | Process for polishing semiconductor materials |
US3527028A (en) * | 1967-09-26 | 1970-09-08 | Bell Telephone Labor Inc | Preparation of semiconductor surfaces |
US3647381A (en) * | 1968-04-08 | 1972-03-07 | Gabriel Reiter | Dental-prophylaxis composition |
US3541017A (en) * | 1969-02-04 | 1970-11-17 | Indiana University Foundation | Denture cleanser preparations comprising zirconium silicate and zirconium dioxide |
US3754941A (en) * | 1971-01-04 | 1973-08-28 | Colgate Palmolive Co | Removal of metallic stains from porcelain surfaces |
-
1968
- 1968-04-11 DE DE19681752163 patent/DE1752163A1/en active Granted
-
1969
- 1969-04-10 BE BE731353D patent/BE731353A/xx unknown
- 1969-04-10 FR FR6911069A patent/FR2006054A1/fr not_active Withdrawn
- 1969-04-10 GB GB08372/69A patent/GB1234894A/en not_active Expired
- 1969-04-11 CH CH556969A patent/CH505466A/en not_active IP Right Cessation
-
1972
- 1972-08-28 US US284167A patent/US3877183A/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2327036A1 (en) * | 1975-10-08 | 1977-05-06 | Du Pont | Modified silica sol for polishing silicon and germanium - remaining stable without depolymerisation at high pH for rapid polishing |
Also Published As
Publication number | Publication date |
---|---|
DE1752163B2 (en) | 1974-07-25 |
BE731353A (en) | 1969-10-10 |
DE1752163C3 (en) | 1975-03-20 |
GB1234894A (en) | 1971-06-09 |
CH505466A (en) | 1971-03-31 |
US3877183A (en) | 1975-04-15 |
DE1752163A1 (en) | 1971-05-13 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |