FR1518811A - Dispositif de pulvérisation cathodique - Google Patents
Dispositif de pulvérisation cathodiqueInfo
- Publication number
- FR1518811A FR1518811A FR93645A FR93645A FR1518811A FR 1518811 A FR1518811 A FR 1518811A FR 93645 A FR93645 A FR 93645A FR 93645 A FR93645 A FR 93645A FR 1518811 A FR1518811 A FR 1518811A
- Authority
- FR
- France
- Prior art keywords
- sputtering device
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DES0101807 | 1966-02-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1518811A true FR1518811A (fr) | 1968-03-29 |
Family
ID=7524009
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR93645A Expired FR1518811A (fr) | 1966-02-04 | 1967-02-03 | Dispositif de pulvérisation cathodique |
Country Status (4)
Country | Link |
---|---|
DE (1) | DE1515314C2 (fr) |
FR (1) | FR1518811A (fr) |
GB (1) | GB1169991A (fr) |
NL (1) | NL6618296A (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2509754A1 (fr) * | 1981-07-18 | 1983-01-21 | Gen Eng Radcliffe | Cible de dispositif de pulverisation cathodique |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2940369C2 (de) * | 1979-10-05 | 1982-10-21 | W.C. Heraeus Gmbh, 6450 Hanau | Target |
DE3030320A1 (de) * | 1980-08-11 | 1982-03-11 | W.C. Heraeus Gmbh, 6450 Hanau | Verfahren zur herstellung eines targets fuer kathodenzerstaeubung |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE465699C (de) * | 1926-07-22 | 1928-09-21 | Ernst Albers Schoenberg Dr | Aus Stuecken verschiedener Metalle bestehende Kathode zur Herstellung elektrischer Widerstaende |
DE542404C (de) * | 1929-03-06 | 1932-01-23 | Steatit Magnesia Akt Ges | Verfahren zur Herstellung hochohmiger Widerstaende |
GB830391A (en) * | 1955-10-28 | 1960-03-16 | Edwards High Vacuum Ltd | Improvements in or relating to cathodic sputtering of metal and dielectric films |
-
1966
- 1966-02-04 DE DE19661515314 patent/DE1515314C2/de not_active Expired
- 1966-12-28 NL NL6618296A patent/NL6618296A/xx unknown
-
1967
- 1967-02-03 GB GB525367A patent/GB1169991A/en not_active Expired
- 1967-02-03 FR FR93645A patent/FR1518811A/fr not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2509754A1 (fr) * | 1981-07-18 | 1983-01-21 | Gen Eng Radcliffe | Cible de dispositif de pulverisation cathodique |
Also Published As
Publication number | Publication date |
---|---|
GB1169991A (en) | 1969-11-12 |
DE1515314C2 (de) | 1973-12-13 |
DE1515314B1 (de) | 1973-05-30 |
NL6618296A (fr) | 1967-08-07 |
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