FR1518811A - Dispositif de pulvérisation cathodique - Google Patents

Dispositif de pulvérisation cathodique

Info

Publication number
FR1518811A
FR1518811A FR93645A FR93645A FR1518811A FR 1518811 A FR1518811 A FR 1518811A FR 93645 A FR93645 A FR 93645A FR 93645 A FR93645 A FR 93645A FR 1518811 A FR1518811 A FR 1518811A
Authority
FR
France
Prior art keywords
sputtering device
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR93645A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Application granted granted Critical
Publication of FR1518811A publication Critical patent/FR1518811A/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR93645A 1966-02-04 1967-02-03 Dispositif de pulvérisation cathodique Expired FR1518811A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES0101807 1966-02-04

Publications (1)

Publication Number Publication Date
FR1518811A true FR1518811A (fr) 1968-03-29

Family

ID=7524009

Family Applications (1)

Application Number Title Priority Date Filing Date
FR93645A Expired FR1518811A (fr) 1966-02-04 1967-02-03 Dispositif de pulvérisation cathodique

Country Status (4)

Country Link
DE (1) DE1515314C2 (fr)
FR (1) FR1518811A (fr)
GB (1) GB1169991A (fr)
NL (1) NL6618296A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2509754A1 (fr) * 1981-07-18 1983-01-21 Gen Eng Radcliffe Cible de dispositif de pulverisation cathodique

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2940369C2 (de) * 1979-10-05 1982-10-21 W.C. Heraeus Gmbh, 6450 Hanau Target
DE3030320A1 (de) * 1980-08-11 1982-03-11 W.C. Heraeus Gmbh, 6450 Hanau Verfahren zur herstellung eines targets fuer kathodenzerstaeubung

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE465699C (de) * 1926-07-22 1928-09-21 Ernst Albers Schoenberg Dr Aus Stuecken verschiedener Metalle bestehende Kathode zur Herstellung elektrischer Widerstaende
DE542404C (de) * 1929-03-06 1932-01-23 Steatit Magnesia Akt Ges Verfahren zur Herstellung hochohmiger Widerstaende
GB830391A (en) * 1955-10-28 1960-03-16 Edwards High Vacuum Ltd Improvements in or relating to cathodic sputtering of metal and dielectric films

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2509754A1 (fr) * 1981-07-18 1983-01-21 Gen Eng Radcliffe Cible de dispositif de pulverisation cathodique

Also Published As

Publication number Publication date
GB1169991A (en) 1969-11-12
DE1515314C2 (de) 1973-12-13
DE1515314B1 (de) 1973-05-30
NL6618296A (fr) 1967-08-07

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