FR1381922A - Méthode de fabrication de semi-conducteurs - Google Patents

Méthode de fabrication de semi-conducteurs

Info

Publication number
FR1381922A
FR1381922A FR963005A FR963005A FR1381922A FR 1381922 A FR1381922 A FR 1381922A FR 963005 A FR963005 A FR 963005A FR 963005 A FR963005 A FR 963005A FR 1381922 A FR1381922 A FR 1381922A
Authority
FR
France
Prior art keywords
semiconductor manufacturing
semiconductor
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR963005A
Other languages
English (en)
Inventor
Henley Frank Sterling
Cyril Francis Drake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Standard Electric Corp
Original Assignee
International Standard Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB5233/63A external-priority patent/GB998199A/en
Application filed by International Standard Electric Corp filed Critical International Standard Electric Corp
Priority to FR963005A priority Critical patent/FR1381922A/fr
Application granted granted Critical
Publication of FR1381922A publication Critical patent/FR1381922A/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02373—Group 14 semiconducting materials
    • H01L21/02381—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02524—Group 14 semiconducting materials
    • H01L21/02532—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02636—Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
    • H01L21/02639—Preparation of substrate for selective deposition

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
FR963005A 1963-02-08 1964-02-07 Méthode de fabrication de semi-conducteurs Expired FR1381922A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR963005A FR1381922A (fr) 1963-02-08 1964-02-07 Méthode de fabrication de semi-conducteurs

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB523263 1963-02-08
GB5233/63A GB998199A (en) 1963-02-08 1963-02-08 Improvements in or relating to the manufacture of semiconductor devices
FR963005A FR1381922A (fr) 1963-02-08 1964-02-07 Méthode de fabrication de semi-conducteurs

Publications (1)

Publication Number Publication Date
FR1381922A true FR1381922A (fr) 1964-12-14

Family

ID=27247753

Family Applications (1)

Application Number Title Priority Date Filing Date
FR963005A Expired FR1381922A (fr) 1963-02-08 1964-02-07 Méthode de fabrication de semi-conducteurs

Country Status (1)

Country Link
FR (1) FR1381922A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2252638A1 (fr) * 1973-11-23 1975-06-20 Commissariat Energie Atomique

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2252638A1 (fr) * 1973-11-23 1975-06-20 Commissariat Energie Atomique

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