FR1339898A - Procédé pour le polissage de l'arséniure de gallium - Google Patents
Procédé pour le polissage de l'arséniure de galliumInfo
- Publication number
- FR1339898A FR1339898A FR916188A FR916188A FR1339898A FR 1339898 A FR1339898 A FR 1339898A FR 916188 A FR916188 A FR 916188A FR 916188 A FR916188 A FR 916188A FR 1339898 A FR1339898 A FR 1339898A
- Authority
- FR
- France
- Prior art keywords
- gallium arsenide
- polishing gallium
- polishing
- arsenide
- gallium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 title 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 238000005498 polishing Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/30—Acidic compositions for etching other metallic material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
- C23F3/04—Heavy metals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
- H01L21/30612—Etching of AIIIBV compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Weting (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US163126A US3156596A (en) | 1961-12-29 | 1961-12-29 | Method for polishing gallium arsenide |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1339898A true FR1339898A (fr) | 1963-10-11 |
Family
ID=22588597
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR916188A Expired FR1339898A (fr) | 1961-12-29 | 1962-11-21 | Procédé pour le polissage de l'arséniure de gallium |
Country Status (3)
Country | Link |
---|---|
US (1) | US3156596A (fr) |
FR (1) | FR1339898A (fr) |
GB (1) | GB945933A (fr) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3262825A (en) * | 1961-12-29 | 1966-07-26 | Bell Telephone Labor Inc | Method for etching crystals of group iii(a)-v(a) compounds and etchant used therefor |
DE1216651B (de) * | 1963-03-28 | 1966-05-12 | Siemens Ag | Verfahren zum polierenden Abtragen von einkristallinen Halbleiterkoerpern, insbesondere Halbleiterscheiben |
DE1287409B (de) * | 1966-04-21 | 1969-01-16 | Telefunken Patent | Verfahren und Vorrichtung zum Herstellen planer Oberflaechen auf Halbleiterscheiben unter Verwendung einer Beizfluessigkeit |
US3629023A (en) * | 1968-07-17 | 1971-12-21 | Minnesota Mining & Mfg | METHOD OF CHEMICALLY POLISHING CRYSTALS OF II(b){14 VI(a) SYSTEM |
FR2168936B1 (fr) * | 1972-01-27 | 1977-04-01 | Labo Electronique Physique | |
JPS5071261A (fr) * | 1973-10-25 | 1975-06-13 | ||
US4184908A (en) * | 1978-10-05 | 1980-01-22 | The United States Of America As Represented By The Secretary Of The Navy | Method for polishing cadmium sulfide semiconductors |
US4323422A (en) * | 1980-04-24 | 1982-04-06 | Calawa Arthur R | Method for preparing optically flat damage-free surfaces |
US4380490A (en) * | 1981-03-27 | 1983-04-19 | Bell Telephone Laboratories, Incorporated | Method of preparing semiconductor surfaces |
US4869779A (en) * | 1987-07-27 | 1989-09-26 | Acheson Robert E | Hydroplane polishing device and method |
US11897087B2 (en) * | 2021-03-11 | 2024-02-13 | Board Of Trustees Of Michigan State University | Polishing apparatus for smoothing diamonds |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2539455A (en) * | 1944-01-27 | 1951-01-30 | Mazia Joseph | Electrolytic polishing of metals |
US2841477A (en) * | 1957-03-04 | 1958-07-01 | Pacific Semiconductors Inc | Photochemically activated gaseous etching method |
US3024148A (en) * | 1957-08-30 | 1962-03-06 | Minneapols Honeywell Regulator | Methods of chemically polishing germanium |
-
1961
- 1961-12-29 US US163126A patent/US3156596A/en not_active Expired - Lifetime
-
1962
- 1962-11-20 GB GB43788/62A patent/GB945933A/en not_active Expired
- 1962-11-21 FR FR916188A patent/FR1339898A/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
US3156596A (en) | 1964-11-10 |
GB945933A (en) | 1964-01-08 |
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