FI981802A0 - Ohutkalvo-elektroluminesenssi-laite ja menetelmä sen valmistamiseksi - Google Patents

Ohutkalvo-elektroluminesenssi-laite ja menetelmä sen valmistamiseksi

Info

Publication number
FI981802A0
FI981802A0 FI981802A FI981802A FI981802A0 FI 981802 A0 FI981802 A0 FI 981802A0 FI 981802 A FI981802 A FI 981802A FI 981802 A FI981802 A FI 981802A FI 981802 A0 FI981802 A0 FI 981802A0
Authority
FI
Finland
Prior art keywords
manufacture
thin film
electroluminescent device
film electroluminescent
thin
Prior art date
Application number
FI981802A
Other languages
English (en)
Swedish (sv)
Other versions
FI981802A (fi
FI105643B (fi
Inventor
Gitte Haerkoenen
Kari Haerkoenen
Arto Pakkala
Tuomas Pitkaenen
Original Assignee
Planar International Oy Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Planar International Oy Ltd filed Critical Planar International Oy Ltd
Priority to FI981802A priority Critical patent/FI105643B/fi
Publication of FI981802A0 publication Critical patent/FI981802A0/fi
Priority to JP11233749A priority patent/JP2000068072A/ja
Priority to DE1999139658 priority patent/DE19939658A1/de
Publication of FI981802A publication Critical patent/FI981802A/fi
Application granted granted Critical
Publication of FI105643B publication Critical patent/FI105643B/fi

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/14—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material, or by the simultaneous addition of the electroluminescent material in or onto the light source
    • H05B33/145—Arrangements of the electroluminescent material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
FI981802A 1998-08-21 1998-08-21 Ohutkalvo-elektroluminesenssilaite ja menetelmä sen valmistamiseksi FI105643B (fi)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FI981802A FI105643B (fi) 1998-08-21 1998-08-21 Ohutkalvo-elektroluminesenssilaite ja menetelmä sen valmistamiseksi
JP11233749A JP2000068072A (ja) 1998-08-21 1999-08-20 薄膜エレクトロルミネッセンスデバイスとその製造方法
DE1999139658 DE19939658A1 (de) 1998-08-21 1999-08-20 Elektrolumineszente Dünnfilmvorrichtung und Verfahren zu deren Herstellung

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI981802 1998-08-21
FI981802A FI105643B (fi) 1998-08-21 1998-08-21 Ohutkalvo-elektroluminesenssilaite ja menetelmä sen valmistamiseksi

Publications (3)

Publication Number Publication Date
FI981802A0 true FI981802A0 (fi) 1998-08-21
FI981802A FI981802A (fi) 2000-02-22
FI105643B FI105643B (fi) 2000-09-15

Family

ID=8552342

Family Applications (1)

Application Number Title Priority Date Filing Date
FI981802A FI105643B (fi) 1998-08-21 1998-08-21 Ohutkalvo-elektroluminesenssilaite ja menetelmä sen valmistamiseksi

Country Status (3)

Country Link
JP (1) JP2000068072A (fi)
DE (1) DE19939658A1 (fi)
FI (1) FI105643B (fi)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6620723B1 (en) 2000-06-27 2003-09-16 Applied Materials, Inc. Formation of boride barrier layers using chemisorption techniques
US6551929B1 (en) 2000-06-28 2003-04-22 Applied Materials, Inc. Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniques
US7732327B2 (en) 2000-06-28 2010-06-08 Applied Materials, Inc. Vapor deposition of tungsten materials
US7405158B2 (en) 2000-06-28 2008-07-29 Applied Materials, Inc. Methods for depositing tungsten layers employing atomic layer deposition techniques
US7964505B2 (en) 2005-01-19 2011-06-21 Applied Materials, Inc. Atomic layer deposition of tungsten materials
US6765178B2 (en) 2000-12-29 2004-07-20 Applied Materials, Inc. Chamber for uniform substrate heating
US6825447B2 (en) 2000-12-29 2004-11-30 Applied Materials, Inc. Apparatus and method for uniform substrate heating and contaminate collection
US6951804B2 (en) 2001-02-02 2005-10-04 Applied Materials, Inc. Formation of a tantalum-nitride layer
US6878206B2 (en) 2001-07-16 2005-04-12 Applied Materials, Inc. Lid assembly for a processing system to facilitate sequential deposition techniques
US6660126B2 (en) 2001-03-02 2003-12-09 Applied Materials, Inc. Lid assembly for a processing system to facilitate sequential deposition techniques
US6734020B2 (en) 2001-03-07 2004-05-11 Applied Materials, Inc. Valve control system for atomic layer deposition chamber
US7211144B2 (en) 2001-07-13 2007-05-01 Applied Materials, Inc. Pulsed nucleation deposition of tungsten layers
US7780785B2 (en) 2001-10-26 2010-08-24 Applied Materials, Inc. Gas delivery apparatus for atomic layer deposition
US6916398B2 (en) 2001-10-26 2005-07-12 Applied Materials, Inc. Gas delivery apparatus and method for atomic layer deposition
US6729824B2 (en) 2001-12-14 2004-05-04 Applied Materials, Inc. Dual robot processing system
US6620670B2 (en) 2002-01-18 2003-09-16 Applied Materials, Inc. Process conditions and precursors for atomic layer deposition (ALD) of AL2O3
US6911391B2 (en) 2002-01-26 2005-06-28 Applied Materials, Inc. Integration of titanium and titanium nitride layers
US6998014B2 (en) 2002-01-26 2006-02-14 Applied Materials, Inc. Apparatus and method for plasma assisted deposition
US6827978B2 (en) 2002-02-11 2004-12-07 Applied Materials, Inc. Deposition of tungsten films
US6833161B2 (en) 2002-02-26 2004-12-21 Applied Materials, Inc. Cyclical deposition of tungsten nitride for metal oxide gate electrode
US6720027B2 (en) 2002-04-08 2004-04-13 Applied Materials, Inc. Cyclical deposition of a variable content titanium silicon nitride layer
US7279432B2 (en) 2002-04-16 2007-10-09 Applied Materials, Inc. System and method for forming an integrated barrier layer
AU2003285237A1 (en) * 2002-12-20 2004-07-14 Ifire Technology Corp. Barrier layer for thick film dielectric electroluminescent displays

Also Published As

Publication number Publication date
DE19939658A1 (de) 2000-03-23
FI981802A (fi) 2000-02-22
FI105643B (fi) 2000-09-15
JP2000068072A (ja) 2000-03-03

Similar Documents

Publication Publication Date Title
FI981802A0 (fi) Ohutkalvo-elektroluminesenssi-laite ja menetelmä sen valmistamiseksi
DE59905083D1 (de) Dünnfilm-piezoresonator
FI962833A0 (fi) Elektroluminesenssi-ohutkalvolaite
FI20000899A (fi) Menetelmä ja laitteisto ohutkalvon kasvattamiseksi substraatille
DE69931221D1 (de) SOI-Substrat und Herstellungsverfahren dafür
DE69936526D1 (de) Silizium dünnschicht photoelektrische vorrichtung
DE60019573D1 (de) Laserkalibrierungsvorrichtung und -verfahren
FI951340A0 (fi) SOI-substraatti ja menetelmä sen valmistamiseksi
DE69913672D1 (de) Lichtstreuender film und herstellungsverfahren
DE69823060D1 (de) Transportverfahren und -vorrichtung
DE60142499D1 (de) Abdeckfolientnahmevorrichtung und -verfahren
DE69909882D1 (de) Anzeigesteuerungsverfaren und -gerät
DE69943295D1 (de) Block-resistenter film
DE69941200D1 (de) Elektrolumineszente Vorrichtung und Herstellungsverfahren
DE69827300D1 (de) Anisotropischer film
EE9900291A (et) Aparaat ja meetod seadme paigutamiseks ja juhtimiseks
KR950026041A (ko) 박막센서소자 및 그제조방법
DE69917096D1 (de) Verlegeverfahren und -Vorrichtung
FI982192A0 (fi) Menetelmä elintoiminnan mittaamiseksi ja mittalaite
DE59914895D1 (de) Messverfahren und -vorrichtung
AU2001274075A1 (en) Method and device for determining the thickness of transparent organic layers
FR2778867B1 (fr) Film laminateur
EE04333B1 (et) Meetod ja seade rongi positsioneerimiseks
DE69923613D1 (de) Dünnschichttransistor-Herstellungsverfahren
FI981431A0 (fi) Mittausmenetelmä

Legal Events

Date Code Title Description
PC Transfer of assignment of patent

Owner name: BENEQ OY

MA Patent expired