FI902376A0 - Foerfarande foer framstaellning av litografiskt kaensliga grenade novolack. - Google Patents
Foerfarande foer framstaellning av litografiskt kaensliga grenade novolack.Info
- Publication number
- FI902376A0 FI902376A0 FI902376A FI902376A FI902376A0 FI 902376 A0 FI902376 A0 FI 902376A0 FI 902376 A FI902376 A FI 902376A FI 902376 A FI902376 A FI 902376A FI 902376 A0 FI902376 A0 FI 902376A0
- Authority
- FI
- Finland
- Prior art keywords
- litografiskt
- kaensliga
- novolack
- grenade
- foerfarande foer
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
- C08G8/10—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/351,154 US4939229A (en) | 1989-05-12 | 1989-05-12 | Method for preparing lithographically sensitive branched novolaks using a mannich base intermediate |
Publications (1)
Publication Number | Publication Date |
---|---|
FI902376A0 true FI902376A0 (fi) | 1990-05-11 |
Family
ID=23379799
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI902376A FI902376A0 (fi) | 1989-05-12 | 1990-05-11 | Foerfarande foer framstaellning av litografiskt kaensliga grenade novolack. |
Country Status (14)
Country | Link |
---|---|
US (1) | US4939229A (fi) |
EP (1) | EP0399691A3 (fi) |
JP (1) | JPH0347820A (fi) |
KR (1) | KR900018187A (fi) |
CN (1) | CN1022690C (fi) |
AU (1) | AU635929B2 (fi) |
BR (1) | BR9001952A (fi) |
CA (1) | CA2014644A1 (fi) |
FI (1) | FI902376A0 (fi) |
IL (1) | IL94352A0 (fi) |
MY (1) | MY105698A (fi) |
NO (1) | NO902062L (fi) |
PH (1) | PH26861A (fi) |
ZA (1) | ZA903559B (fi) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5091282A (en) * | 1989-04-03 | 1992-02-25 | Kabushiki Kaisha Toshiba | Alkali soluble phenol polymer photosensitive composition |
CA2015721A1 (en) * | 1989-05-12 | 1990-11-12 | Karen Ann Graziano | Method of using highly branched novolaks in photoresists |
EP1035438A3 (en) * | 1999-03-12 | 2000-09-20 | Shipley Company LLC | Phenolic resins and photoresist compositions comprising same |
TWI263861B (en) * | 1999-03-26 | 2006-10-11 | Shinetsu Chemical Co | Resist material and pattern forming method |
TWI314247B (en) * | 2002-03-04 | 2009-09-01 | Shipley Co Llc | Megative photordsists for short wavelength imaging |
US6828383B2 (en) * | 2002-12-13 | 2004-12-07 | Occidental Petroleum | Phenolic modified resorcinolic resins for rubber compounding |
US7425402B2 (en) * | 2003-08-13 | 2008-09-16 | Agfa Graphics, N.V. | Heat-sensitive lithographic printing plate precursor |
US7205084B2 (en) * | 2003-12-18 | 2007-04-17 | Agfa-Gevaert | Heat-sensitive lithographic printing plate precursor |
KR102417838B1 (ko) * | 2014-08-08 | 2022-07-06 | 닛산 가가쿠 가부시키가이샤 | 방향족 메틸올 화합물이 반응된 노볼락 수지를 포함하는 레지스트 하층막 형성 조성물 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2147789A (en) * | 1936-05-29 | 1939-02-21 | Du Pont | Resins from aminophenols and formaldehyde |
US2431011A (en) * | 1941-01-29 | 1947-11-18 | Standard Oil Dev Co | Corrosive inhibited additive for mineral lubricating oil composition |
US2636019A (en) * | 1951-06-26 | 1953-04-21 | Research Corp | Ion exchange resins from a trifunctional phenol, formaldehyde and a mannich base made from a trifunctional phenol, formaldehyde and a dialkylamine, morpholine or piperidine |
JPS57102960A (en) * | 1972-09-14 | 1982-06-26 | Yoshizaki Kozo | Production of thermosetting resin paint |
EP0070624B1 (en) * | 1981-06-22 | 1986-11-20 | Philip A. Hunt Chemical Corporation | Novolak resin and a positive photoresist composition containing the same |
JPS58101108A (ja) * | 1981-12-11 | 1983-06-16 | Unitika Ltd | キレ−ト形成基を有するフエノ−ル樹脂とその製造方法及び吸着処理方法 |
US4500691A (en) * | 1983-01-13 | 1985-02-19 | Ciba-Geigy Corporation | Phenol-novolaks containing amino groups |
US4474929A (en) * | 1983-09-30 | 1984-10-02 | The Dow Chemical Company | Polyglycidyl ethers of branched novolacs |
US4468507A (en) * | 1983-11-21 | 1984-08-28 | The Dow Chemical Company | Method of limiting rate of heat evolution during acid-catalyzed phenol/polymethylolphenol condensations |
SU1154297A1 (ru) * | 1984-01-04 | 1985-05-07 | Предприятие П/Я В-2304 | Герметизирующа порошкова композици |
US4571374A (en) * | 1984-12-27 | 1986-02-18 | Minnesota Mining And Manufacturing Company | Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive |
EP0662636A3 (en) * | 1986-10-23 | 1995-11-22 | Ciba Geigy Ag | Imaging processes. |
CA2015721A1 (en) * | 1989-05-12 | 1990-11-12 | Karen Ann Graziano | Method of using highly branched novolaks in photoresists |
-
1989
- 1989-05-12 US US07/351,154 patent/US4939229A/en not_active Expired - Fee Related
-
1990
- 1990-04-17 CA CA002014644A patent/CA2014644A1/en not_active Abandoned
- 1990-04-17 PH PH40380A patent/PH26861A/en unknown
- 1990-04-26 BR BR909001952A patent/BR9001952A/pt not_active Application Discontinuation
- 1990-05-07 JP JP2117295A patent/JPH0347820A/ja active Pending
- 1990-05-09 EP EP19900304969 patent/EP0399691A3/en not_active Withdrawn
- 1990-05-10 NO NO90902062A patent/NO902062L/no unknown
- 1990-05-10 ZA ZA903559A patent/ZA903559B/xx unknown
- 1990-05-10 MY MYPI90000741A patent/MY105698A/en unknown
- 1990-05-10 IL IL94352A patent/IL94352A0/xx not_active IP Right Cessation
- 1990-05-10 AU AU54884/90A patent/AU635929B2/en not_active Ceased
- 1990-05-11 FI FI902376A patent/FI902376A0/fi not_active Application Discontinuation
- 1990-05-11 KR KR1019900006667A patent/KR900018187A/ko not_active Application Discontinuation
- 1990-05-12 CN CN90102765A patent/CN1022690C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US4939229A (en) | 1990-07-03 |
AU635929B2 (en) | 1993-04-08 |
ZA903559B (en) | 1991-01-30 |
IL94352A0 (en) | 1991-03-10 |
PH26861A (en) | 1992-11-16 |
CA2014644A1 (en) | 1990-11-12 |
NO902062D0 (no) | 1990-05-10 |
CN1022690C (zh) | 1993-11-10 |
NO902062L (no) | 1990-11-13 |
EP0399691A2 (en) | 1990-11-28 |
KR900018187A (ko) | 1990-12-20 |
EP0399691A3 (en) | 1991-04-03 |
JPH0347820A (ja) | 1991-02-28 |
BR9001952A (pt) | 1991-07-30 |
AU5488490A (en) | 1990-11-15 |
MY105698A (en) | 1994-11-30 |
CN1047309A (zh) | 1990-11-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FA | Application withdrawn |
Owner name: ROHM AND HAAS CO |