FI864308A0 - Maskningssammansaettning med masken avlastande egenskap. - Google Patents

Maskningssammansaettning med masken avlastande egenskap.

Info

Publication number
FI864308A0
FI864308A0 FI864308A FI864308A FI864308A0 FI 864308 A0 FI864308 A0 FI 864308A0 FI 864308 A FI864308 A FI 864308A FI 864308 A FI864308 A FI 864308A FI 864308 A0 FI864308 A0 FI 864308A0
Authority
FI
Finland
Prior art keywords
maskningssammansaettning
egenskap
avlastande
masken
med
Prior art date
Application number
FI864308A
Other languages
English (en)
Other versions
FI82846B (fi
FI864308A (fi
FI82846C (fi
Inventor
Robert A Boudreau
Original Assignee
Gte Prod Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gte Prod Corp filed Critical Gte Prod Corp
Publication of FI864308A0 publication Critical patent/FI864308A0/fi
Publication of FI864308A publication Critical patent/FI864308A/fi
Publication of FI82846B publication Critical patent/FI82846B/fi
Application granted granted Critical
Publication of FI82846C publication Critical patent/FI82846C/fi

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/042—Coating on selected surface areas, e.g. using masks using masks
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/944—Shadow

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FI864308A 1985-10-23 1986-10-23 Maskarrangemang foer att bilda tunnfilmsstrukturmoenster. FI82846C (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/790,589 US4615781A (en) 1985-10-23 1985-10-23 Mask assembly having mask stress relieving feature
US79058985 1985-10-23

Publications (4)

Publication Number Publication Date
FI864308A0 true FI864308A0 (fi) 1986-10-23
FI864308A FI864308A (fi) 1987-04-24
FI82846B FI82846B (fi) 1991-01-15
FI82846C FI82846C (fi) 1991-04-25

Family

ID=25151163

Family Applications (1)

Application Number Title Priority Date Filing Date
FI864308A FI82846C (fi) 1985-10-23 1986-10-23 Maskarrangemang foer att bilda tunnfilmsstrukturmoenster.

Country Status (5)

Country Link
US (1) US4615781A (fi)
EP (1) EP0219872A3 (fi)
JP (1) JPS62202491A (fi)
CA (1) CA1283282C (fi)
FI (1) FI82846C (fi)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4915057A (en) * 1985-10-23 1990-04-10 Gte Products Corporation Apparatus and method for registration of shadow masked thin-film patterns
US4746548A (en) * 1985-10-23 1988-05-24 Gte Products Corporation Method for registration of shadow masked thin-film patterns
US4715940A (en) * 1985-10-23 1987-12-29 Gte Products Corporation Mask for patterning electrode structures in thin film EL devices
JPH04151890A (ja) * 1990-10-15 1992-05-25 Cmk Corp プリント配線板の製造工程におけるスルーホールのマスキング方法
US5669972A (en) * 1995-04-27 1997-09-23 International Business Machines Corporation Flex tab thick film metal mask
JPH1050478A (ja) * 1996-04-19 1998-02-20 Toray Ind Inc 有機電界発光素子およびその製造方法
US6753131B1 (en) 1996-07-22 2004-06-22 President And Fellows Of Harvard College Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element
US5818697A (en) 1997-03-21 1998-10-06 International Business Machines Corporation Flexible thin film ball grid array containing solder mask
KR100340174B1 (ko) * 1999-04-06 2002-06-12 이동준 전기화학적 바이오센서 테스트 스트립, 그 제조방법 및 전기화학적 바이오센서
US6469439B2 (en) * 1999-06-15 2002-10-22 Toray Industries, Inc. Process for producing an organic electroluminescent device
WO2001041968A2 (en) * 1999-11-18 2001-06-14 Main Tape Company, Inc. Process for forming film covered sheet metal material and sheet metal material so covered
DE10062713C1 (de) * 2000-12-15 2002-09-05 Zeiss Carl Verfahren zum Beschichten von Substraten und Maskenhaltern
US6662718B2 (en) * 2001-06-29 2003-12-16 International Business Machines Corporation Screening mask having a stress-relieving area
KR100469252B1 (ko) * 2002-04-12 2005-02-02 엘지전자 주식회사 쉐도우 마스크 및 그를 이용한 풀칼라 유기 ｅｌ 표시소자
JP4440563B2 (ja) * 2002-06-03 2010-03-24 三星モバイルディスプレイ株式會社 有機電子発光素子の薄膜蒸着用マスクフレーム組立体
US6943066B2 (en) * 2002-06-05 2005-09-13 Advantech Global, Ltd Active matrix backplane for controlling controlled elements and method of manufacture thereof
JP4608874B2 (ja) * 2003-12-02 2011-01-12 ソニー株式会社 蒸着マスクおよびその製造方法
US20060086321A1 (en) * 2004-10-22 2006-04-27 Advantech Global, Ltd Substrate-to-mask alignment and securing system with temperature control for use in an automated shadow mask vacuum deposition process
KR100603408B1 (ko) * 2004-12-16 2006-07-20 삼성에스디아이 주식회사 수직형 마스크 이송장치 및 이를 구비한 증착장치
JP4331707B2 (ja) * 2004-12-16 2009-09-16 三星モバイルディスプレイ株式會社 整列システム、垂直型トレイ移送装置及びこれを具備した蒸着装置
US20060160249A1 (en) * 2005-01-17 2006-07-20 Tien-Yu Chou Method for fabricating biochips or biosensors using cd/dvd making compatible processes
JP2006199998A (ja) * 2005-01-20 2006-08-03 Seiko Epson Corp 成膜装置、成膜方法
US7271111B2 (en) * 2005-06-08 2007-09-18 Advantech Global, Ltd Shadow mask deposition of materials using reconfigurable shadow masks
JP2009170200A (ja) * 2008-01-15 2009-07-30 Sony Corp 表示装置の製造方法
DE102008037387A1 (de) * 2008-09-24 2010-03-25 Aixtron Ag Verfahren sowie Vorrichtung zum Abscheiden lateral strukturierter Schichten mittels einer magnetisch auf einem Substrathalter gehaltenen Schattenmaske
EP2425034B1 (en) * 2009-04-03 2016-07-13 OSRAM OLED GmbH An arrangement for holding a substrate in a material deposition apparatus
CN103388121B (zh) * 2012-05-08 2017-07-11 昆山允升吉光电科技有限公司 一种高精度金属掩模板的混合制作工艺
CN108359935B (zh) * 2018-05-22 2020-04-17 京东方科技集团股份有限公司 掩膜板及其制作方法、蒸镀方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3510349A (en) * 1966-11-15 1970-05-05 Us Air Force Vacuum deposited interconnection matrix
US3678892A (en) * 1970-05-19 1972-07-25 Western Electric Co Pallet and mask for substrates
US4049857A (en) * 1976-07-28 1977-09-20 International Business Machines Corporation Deposition mask and methods of making same
US4096821A (en) * 1976-12-13 1978-06-27 Westinghouse Electric Corp. System for fabricating thin-film electronic components
JPS54103552A (en) * 1978-02-01 1979-08-15 Hitachi Electronics Pattern formation method
US4344988A (en) * 1978-08-01 1982-08-17 Nippon Sheet Glass Co., Ltd. Method for forming patterned coating
JPS5754265A (ja) * 1980-09-18 1982-03-31 Toshiba Corp Kinzokuhimakukeiseihoho
US4335161A (en) * 1980-11-03 1982-06-15 Xerox Corporation Thin film transistors, thin film transistor arrays, and a process for preparing the same
US4322277A (en) * 1980-11-17 1982-03-30 Rca Corporation Step mask for substrate sputtering
US4391034A (en) * 1980-12-22 1983-07-05 Ibm Corporation Thermally compensated shadow mask
US4437966A (en) * 1982-09-30 1984-03-20 Gte Products Corporation Sputtering cathode apparatus
US4511599A (en) * 1983-03-01 1985-04-16 Sigmatron Associates Mask for vacuum depositing back metal electrodes on EL panel

Also Published As

Publication number Publication date
EP0219872A2 (en) 1987-04-29
FI82846B (fi) 1991-01-15
FI864308A (fi) 1987-04-24
EP0219872A3 (en) 1989-03-22
US4615781A (en) 1986-10-07
CA1283282C (en) 1991-04-23
FI82846C (fi) 1991-04-25
JPS62202491A (ja) 1987-09-07

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Legal Events

Date Code Title Description
MM Patent lapsed

Owner name: GTE PRODUCTS CORPORATION