FI20095307A0 - Päällystysmenetelmä ja -laitteisto - Google Patents
Päällystysmenetelmä ja -laitteistoInfo
- Publication number
- FI20095307A0 FI20095307A0 FI20095307A FI20095307A FI20095307A0 FI 20095307 A0 FI20095307 A0 FI 20095307A0 FI 20095307 A FI20095307 A FI 20095307A FI 20095307 A FI20095307 A FI 20095307A FI 20095307 A0 FI20095307 A0 FI 20095307A0
- Authority
- FI
- Finland
- Prior art keywords
- coating
- equipment
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
- C23C16/45548—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction
- C23C16/45551—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction for relative movement of the substrate and the gas injectors or half-reaction reactor compartments
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2/00—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
- B01J2/006—Coating of the granules without description of the process or the device by which the granules are obtained
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4417—Methods specially adapted for coating powder
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45519—Inert gas curtains
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
- C23C16/45548—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20095307A FI20095307A0 (fi) | 2009-03-25 | 2009-03-25 | Päällystysmenetelmä ja -laitteisto |
TW099108648A TW201038762A (en) | 2009-03-25 | 2010-03-24 | Method and apparatus for coating |
CN2010800136711A CN102362008B (zh) | 2009-03-25 | 2010-03-25 | 用于涂覆的方法和设备 |
US13/258,152 US8945676B2 (en) | 2009-03-25 | 2010-03-25 | Method and apparatus for coating |
EA201190201A EA024073B1 (ru) | 2009-03-25 | 2010-03-25 | Способ и устройство для нанесения покрытий |
PCT/FI2010/050234 WO2010109076A1 (en) | 2009-03-25 | 2010-03-25 | Method and apparatus for coating |
EP10755492.5A EP2411557B1 (en) | 2009-03-25 | 2010-03-25 | Method and apparatus for coating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20095307A FI20095307A0 (fi) | 2009-03-25 | 2009-03-25 | Päällystysmenetelmä ja -laitteisto |
Publications (1)
Publication Number | Publication Date |
---|---|
FI20095307A0 true FI20095307A0 (fi) | 2009-03-25 |
Family
ID=40510304
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI20095307A FI20095307A0 (fi) | 2009-03-25 | 2009-03-25 | Päällystysmenetelmä ja -laitteisto |
Country Status (7)
Country | Link |
---|---|
US (1) | US8945676B2 (fi) |
EP (1) | EP2411557B1 (fi) |
CN (1) | CN102362008B (fi) |
EA (1) | EA024073B1 (fi) |
FI (1) | FI20095307A0 (fi) |
TW (1) | TW201038762A (fi) |
WO (1) | WO2010109076A1 (fi) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FI126894B (fi) | 2014-12-22 | 2017-07-31 | Beneq Oy | Suutinpää, laitteisto ja menetelmä substraatin pinnan pinnoittamiseksi |
KR102514043B1 (ko) * | 2016-07-18 | 2023-03-24 | 삼성전자주식회사 | 반도체 소자의 제조 방법 |
CN107254675B (zh) * | 2017-06-07 | 2019-07-09 | 华中科技大学 | 一种纳米颗粒空间原子层沉积连续包覆装置及方法 |
TWI684665B (zh) * | 2018-12-28 | 2020-02-11 | 安強股份有限公司 | 成膜設備及成膜方法 |
EP3715502B1 (en) * | 2019-03-29 | 2024-01-24 | Picosun Oy | Coating of 3-dimensional substrates |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4859493A (en) * | 1987-03-31 | 1989-08-22 | Lemelson Jerome H | Methods of forming synthetic diamond coatings on particles using microwaves |
US20040052984A1 (en) * | 1997-05-13 | 2004-03-18 | Toth Richard E. | Apparatus and method of treating fine powders |
US6428861B2 (en) * | 2000-06-13 | 2002-08-06 | Procter & Gamble Company | Apparatus and process for plasma treatment of particulate matter |
US6713177B2 (en) * | 2000-06-21 | 2004-03-30 | Regents Of The University Of Colorado | Insulating and functionalizing fine metal-containing particles with conformal ultra-thin films |
US7396862B2 (en) | 2003-02-06 | 2008-07-08 | Weimer Alan W | Dental composite filler particles |
US7132697B2 (en) | 2003-02-06 | 2006-11-07 | Weimer Alan W | Nanomaterials for quantum tunneling varistors |
US7306823B2 (en) | 2004-09-18 | 2007-12-11 | Nanosolar, Inc. | Coated nanoparticles and quantum dots for solution-based fabrication of photovoltaic cells |
US20070298250A1 (en) * | 2006-06-22 | 2007-12-27 | Weimer Alan W | Methods for producing coated phosphor and host material particles using atomic layer deposition methods |
US20070215036A1 (en) * | 2006-03-15 | 2007-09-20 | Hyung-Sang Park | Method and apparatus of time and space co-divided atomic layer deposition |
US8182608B2 (en) * | 2007-09-26 | 2012-05-22 | Eastman Kodak Company | Deposition system for thin film formation |
US20090291209A1 (en) * | 2008-05-20 | 2009-11-26 | Asm International N.V. | Apparatus and method for high-throughput atomic layer deposition |
NL2002590C2 (en) * | 2009-03-04 | 2010-09-07 | Univ Delft Technology | Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport. |
-
2009
- 2009-03-25 FI FI20095307A patent/FI20095307A0/fi not_active Application Discontinuation
-
2010
- 2010-03-24 TW TW099108648A patent/TW201038762A/zh unknown
- 2010-03-25 EA EA201190201A patent/EA024073B1/ru not_active IP Right Cessation
- 2010-03-25 EP EP10755492.5A patent/EP2411557B1/en active Active
- 2010-03-25 US US13/258,152 patent/US8945676B2/en active Active
- 2010-03-25 WO PCT/FI2010/050234 patent/WO2010109076A1/en active Application Filing
- 2010-03-25 CN CN2010800136711A patent/CN102362008B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
EP2411557A1 (en) | 2012-02-01 |
US8945676B2 (en) | 2015-02-03 |
EP2411557B1 (en) | 2021-12-15 |
EA201190201A1 (ru) | 2012-04-30 |
TW201038762A (en) | 2010-11-01 |
EA024073B1 (ru) | 2016-08-31 |
CN102362008B (zh) | 2013-10-16 |
US20120015106A1 (en) | 2012-01-19 |
EP2411557A4 (en) | 2016-07-27 |
CN102362008A (zh) | 2012-02-22 |
WO2010109076A1 (en) | 2010-09-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FD | Application lapsed |