FI20090319A0 - Prosessinsäätömenetelmä - Google Patents

Prosessinsäätömenetelmä

Info

Publication number
FI20090319A0
FI20090319A0 FI20090319A FI20090319A FI20090319A0 FI 20090319 A0 FI20090319 A0 FI 20090319A0 FI 20090319 A FI20090319 A FI 20090319A FI 20090319 A FI20090319 A FI 20090319A FI 20090319 A0 FI20090319 A0 FI 20090319A0
Authority
FI
Finland
Prior art keywords
monitoring
control method
process control
adjusting
parameter based
Prior art date
Application number
FI20090319A
Other languages
English (en)
Swedish (sv)
Inventor
Markku Rajala
Juha Tikkanen
Original Assignee
Beneq Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beneq Oy filed Critical Beneq Oy
Priority to FI20090319A priority Critical patent/FI20090319A0/fi
Publication of FI20090319A0 publication Critical patent/FI20090319A0/fi
Priority to US13/392,237 priority patent/US8673389B2/en
Priority to CN201080046136.6A priority patent/CN102597316B/zh
Priority to PCT/FI2010/050685 priority patent/WO2011027035A1/en
Priority to EP10813392.7A priority patent/EP2473651B1/en
Priority to EA201270338A priority patent/EA023563B1/ru

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
FI20090319A 2009-09-03 2009-09-03 Prosessinsäätömenetelmä FI20090319A0 (fi)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FI20090319A FI20090319A0 (fi) 2009-09-03 2009-09-03 Prosessinsäätömenetelmä
US13/392,237 US8673389B2 (en) 2009-09-03 2010-09-02 Process for controlling coating deposition
CN201080046136.6A CN102597316B (zh) 2009-09-03 2010-09-02 用于控制涂覆沉积的方法和设备
PCT/FI2010/050685 WO2011027035A1 (en) 2009-09-03 2010-09-02 Process and apparatus for controlling coating deposition
EP10813392.7A EP2473651B1 (en) 2009-09-03 2010-09-02 Process and apparatus for controlling coating deposition
EA201270338A EA023563B1 (ru) 2009-09-03 2010-09-02 Способ и устройство для контроля процесса покрытия методом осаждения

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FI20090319A FI20090319A0 (fi) 2009-09-03 2009-09-03 Prosessinsäätömenetelmä

Publications (1)

Publication Number Publication Date
FI20090319A0 true FI20090319A0 (fi) 2009-09-03

Family

ID=41136321

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20090319A FI20090319A0 (fi) 2009-09-03 2009-09-03 Prosessinsäätömenetelmä

Country Status (6)

Country Link
US (1) US8673389B2 (fi)
EP (1) EP2473651B1 (fi)
CN (1) CN102597316B (fi)
EA (1) EA023563B1 (fi)
FI (1) FI20090319A0 (fi)
WO (1) WO2011027035A1 (fi)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10581020B2 (en) 2011-02-08 2020-03-03 Vitro Flat Glass Llc Light extracting substrate for organic light emitting diode
JP2012046780A (ja) * 2010-08-25 2012-03-08 Tokyo Electron Ltd 蒸着処理装置および蒸着処理方法
FI124113B (fi) * 2010-08-30 2014-03-31 Beneq Oy Laitteisto ja menetelmä substraatin pinnan muokkaamiseksi
FI20115236A0 (fi) * 2011-03-09 2011-03-09 Beneq Oy Pinnoitusmenetelmä, laite ja käyttö
WO2012146828A2 (en) * 2011-04-28 2012-11-01 Beneq Oy Process and apparatus for coating
DE102012200211A1 (de) * 2012-01-09 2013-07-11 Carl Zeiss Nts Gmbh Vorrichtung und Verfahren zur Oberflächenbearbeitung eines Substrates
WO2015162035A1 (en) * 2014-04-24 2015-10-29 Basf Se Gas phase process for producing conductive metal oxide films
US11220737B2 (en) 2014-06-25 2022-01-11 Universal Display Corporation Systems and methods of modulating flow during vapor jet deposition of organic materials
EP2960059B1 (en) 2014-06-25 2018-10-24 Universal Display Corporation Systems and methods of modulating flow during vapor jet deposition of organic materials
US11267012B2 (en) * 2014-06-25 2022-03-08 Universal Display Corporation Spatial control of vapor condensation using convection
EP3218317B1 (en) 2014-11-13 2018-10-17 Gerresheimer Glas GmbH Glass forming machine particle filter, a plunger unit, a blow head, a blow head support and a glass forming machine adapted to or comprising said filter
EP3308138B1 (en) * 2015-06-05 2023-11-22 Koninklijke Philips N.V. Method of designing a particle sensor and particle sensing method
KR102420015B1 (ko) * 2015-08-28 2022-07-12 삼성전자주식회사 Cs-ald 장치의 샤워헤드
US10566534B2 (en) 2015-10-12 2020-02-18 Universal Display Corporation Apparatus and method to deliver organic material via organic vapor-jet printing (OVJP)
US11213848B2 (en) * 2015-12-11 2022-01-04 Vitro Flat Glass Llc Nanoparticle coater

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51143583A (en) * 1975-06-06 1976-12-09 Hitachi Ltd Method for regulating gas-phase chemical reaction
EP0196806B1 (en) 1985-03-11 1990-11-07 Applied Materials, Inc. Optimized process for forming borophosphosilicate glass
JP2706861B2 (ja) 1991-07-23 1998-01-28 動力炉・核燃料開発事業団 クラスター生成装置
FI98832C (fi) 1995-09-15 1997-08-25 Juha Tikkanen Menetelmä ja laite materiaalin ruiskuttamiseksi
GB9620151D0 (en) * 1996-09-27 1996-11-13 Surface Tech Sys Ltd Plasma processing apparatus
US6342265B1 (en) * 1997-08-20 2002-01-29 Triumf Apparatus and method for in-situ thickness and stoichiometry measurement of thin films
JP3349965B2 (ja) * 1998-11-05 2002-11-25 松下電器産業株式会社 微粒子分級方法及び装置
US7515264B2 (en) 1999-06-15 2009-04-07 Tokyo Electron Limited Particle-measuring system and particle-measuring method
JP3535785B2 (ja) * 1999-11-26 2004-06-07 Ｎｅｃエレクトロニクス株式会社 クリーニング終点検出装置およびクリーニング終点検出方法
US6607597B2 (en) 2001-01-30 2003-08-19 Msp Corporation Method and apparatus for deposition of particles on surfaces
FI118278B (fi) 2003-06-24 2007-09-14 Dekati Oy Menetelmä ja anturilaite hiukkaspäästöjen mittaamiseksi polttomoottorin pakokaasuista
US7220456B2 (en) * 2004-03-31 2007-05-22 Eastman Kodak Company Process for the selective deposition of particulate material
US7435444B2 (en) * 2004-07-23 2008-10-14 Johns Manville Control of pre-cured product moisture for formaldehyde-free fiberglass products
JP4593243B2 (ja) * 2004-11-18 2010-12-08 株式会社トプコン 気中粒子監視装置および真空処理装置
KR100614101B1 (ko) * 2005-09-15 2006-08-22 한국과학기술연구원 입자 계수기
FI20060288A0 (fi) * 2006-03-27 2006-03-27 Abr Innova Oy Pinnoitusmenetelmä
US20070281105A1 (en) * 2006-06-02 2007-12-06 Nima Mokhlesi Atomic Layer Deposition of Oxides Using Krypton as an Ion Generating Feeding Gas
US20080124453A1 (en) 2006-11-28 2008-05-29 Applied Matrials, Inc. In-situ detection of gas-phase particle formation in nitride film deposition
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Also Published As

Publication number Publication date
EP2473651A1 (en) 2012-07-11
EP2473651A4 (en) 2013-12-04
WO2011027035A1 (en) 2011-03-10
EA201270338A1 (ru) 2012-09-28
US20120189766A1 (en) 2012-07-26
US8673389B2 (en) 2014-03-18
EP2473651B1 (en) 2016-11-09
EA023563B1 (ru) 2016-06-30
CN102597316A (zh) 2012-07-18
CN102597316B (zh) 2015-03-25

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