ES8404065A1 - Una mezcla foto-sensible. - Google Patents
Una mezcla foto-sensible.Info
- Publication number
- ES8404065A1 ES8404065A1 ES513403A ES513403A ES8404065A1 ES 8404065 A1 ES8404065 A1 ES 8404065A1 ES 513403 A ES513403 A ES 513403A ES 513403 A ES513403 A ES 513403A ES 8404065 A1 ES8404065 A1 ES 8404065A1
- Authority
- ES
- Spain
- Prior art keywords
- photosensitive
- naphthoquinone
- diazide
- basis
- sulfonyl radical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Measuring Or Testing Involving Enzymes Or Micro-Organisms (AREA)
- Printing Plates And Materials Therefor (AREA)
- Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
- Photoreceptors In Electrophotography (AREA)
- Developing Agents For Electrophotography (AREA)
Abstract
METODO DE PRODUCCION DE UN MATERIAL DE COPIA FOTOSENSIBLE QUE TIENE APLICACIONES PARA LA FABRICACION DE PLANCHAS DE IMPRESION.CONSISTE EN DISOLVER UNA MEZCLA DE UN ESTER DEL ACIDO 1,2-NAFTOQUINONA-2-DIAZIDO-SULFONICO DE UN BIS-HIDROXIFENILALCANO, DE FORMULA (I), EN LA QUE D, R Y RK PUEDEN SER VARIOS TIPOS DE RADICALES, Y N VALE 6-18, CON UNA RESINA FENOLICA SOLUBLE EN ALCALI, EN UN DISOLVENTE INERTE; AÑADIR, EVENTUALMENTE, UN AGLUTINANTE; DEPOSITAR LA DISOLUCION OBTENIDA SOBRE UN SOPORTE METALICO; Y SECAR LA DISOLUCION APLICADA DURANTE 25-200 SEGUNDOS A UNA TEMPERATURA ENTRE30JC Y 150JC.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19813124936 DE3124936A1 (de) | 1981-06-25 | 1981-06-25 | Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial |
Publications (2)
Publication Number | Publication Date |
---|---|
ES8404065A1 true ES8404065A1 (es) | 1984-04-01 |
ES513403A0 ES513403A0 (es) | 1984-04-01 |
Family
ID=6135331
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES513403A Granted ES513403A0 (es) | 1981-06-25 | 1982-06-23 | Una mezcla foto-sensible. |
Country Status (11)
Country | Link |
---|---|
US (1) | US4517275A (es) |
EP (1) | EP0068346B1 (es) |
JP (1) | JPS585737A (es) |
AT (1) | ATE10141T1 (es) |
AU (1) | AU8509082A (es) |
BR (1) | BR8203685A (es) |
CA (1) | CA1213600A (es) |
DE (2) | DE3124936A1 (es) |
ES (1) | ES513403A0 (es) |
FI (1) | FI822257L (es) |
ZA (1) | ZA824004B (es) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4735885A (en) * | 1985-12-06 | 1988-04-05 | Allied Corporation | Deep UV photoresist composition with 1,3-disubstituted-5-diazobarbituric acids |
JP2552891B2 (ja) * | 1988-01-26 | 1996-11-13 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
JP2700918B2 (ja) * | 1989-04-26 | 1998-01-21 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
US5019478A (en) * | 1989-10-30 | 1991-05-28 | Olin Hunt Specialty Products, Inc. | Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures |
US5196517A (en) * | 1989-10-30 | 1993-03-23 | Ocg Microelectronic Materials, Inc. | Selected trihydroxybenzophenone compounds and their use as photoactive compounds |
US5219714A (en) * | 1989-10-30 | 1993-06-15 | Ocg Microelectronic Materials, Inc. | Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures |
US5618932A (en) * | 1995-05-24 | 1997-04-08 | Shipley Company, L.L.C. | Photoactive compounds and compositions |
US6461794B1 (en) * | 1999-08-11 | 2002-10-08 | Kodak Polychrome Graphics Llc | Lithographic printing forms |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE500222A (es) * | 1949-07-23 | |||
BE508016A (es) * | 1950-12-23 | |||
BE586713A (es) * | 1959-01-21 | |||
US3647443A (en) * | 1969-09-12 | 1972-03-07 | Eastman Kodak Co | Light-sensitive quinone diazide polymers and polymer compositions |
JPS53494B2 (es) * | 1972-09-08 | 1978-01-09 | ||
DE2742631A1 (de) * | 1977-09-22 | 1979-04-05 | Hoechst Ag | Lichtempfindliche kopiermasse |
DE2828037A1 (de) * | 1978-06-26 | 1980-01-10 | Hoechst Ag | Lichtempfindliches gemisch |
DE3040157A1 (de) * | 1980-10-24 | 1982-06-03 | Hoechst Ag, 6000 Frankfurt | Lichtemopfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial |
DE3043967A1 (de) * | 1980-11-21 | 1982-06-24 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial |
-
1981
- 1981-06-25 DE DE19813124936 patent/DE3124936A1/de not_active Withdrawn
-
1982
- 1982-06-04 CA CA000404463A patent/CA1213600A/en not_active Expired
- 1982-06-08 ZA ZA824004A patent/ZA824004B/xx unknown
- 1982-06-18 AT AT82105342T patent/ATE10141T1/de not_active IP Right Cessation
- 1982-06-18 EP EP82105342A patent/EP0068346B1/de not_active Expired
- 1982-06-18 DE DE8282105342T patent/DE3261128D1/de not_active Expired
- 1982-06-22 AU AU85090/82A patent/AU8509082A/en not_active Abandoned
- 1982-06-23 FI FI822257A patent/FI822257L/fi not_active Application Discontinuation
- 1982-06-23 JP JP57106974A patent/JPS585737A/ja active Granted
- 1982-06-23 ES ES513403A patent/ES513403A0/es active Granted
- 1982-06-23 US US06/391,005 patent/US4517275A/en not_active Expired - Fee Related
- 1982-06-24 BR BR8203685A patent/BR8203685A/pt not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0068346A1 (de) | 1983-01-05 |
DE3124936A1 (de) | 1983-01-20 |
AU8509082A (en) | 1983-01-06 |
BR8203685A (pt) | 1983-06-21 |
FI822257A0 (fi) | 1982-06-23 |
CA1213600A (en) | 1986-11-04 |
ZA824004B (en) | 1983-03-30 |
EP0068346B1 (de) | 1984-10-31 |
FI822257L (fi) | 1982-12-26 |
ES513403A0 (es) | 1984-04-01 |
DE3261128D1 (en) | 1984-12-06 |
ATE10141T1 (de) | 1984-11-15 |
JPS585737A (ja) | 1983-01-13 |
JPH0339301B2 (es) | 1991-06-13 |
US4517275A (en) | 1985-05-14 |
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ES8404065A1 (es) | Una mezcla foto-sensible. | |
AU542387B2 (en) | Naphthoquinone diazide sulfonic ester | |
EP0149553A3 (en) | Negative photoresist systems | |
DE3165432D1 (en) | Light sensitive composition based on o-naphtoquinone diazides and light sensitive copying material produced therefrom | |
JPS6419345A (en) | High contrast positive photoresist developer containing alkanol amine | |
ES8307233A1 (es) | Procedimiento para preparar derivados del acido 1,4-tiazan-3-carboxilico. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
FD1A | Patent lapsed |
Effective date: 19980202 |