ES547744A0 - A PROCEDURE FOR THE PREPARATION OF A PHOTO-PROTECTIVE SERIGRAPHY - Google Patents
A PROCEDURE FOR THE PREPARATION OF A PHOTO-PROTECTIVE SERIGRAPHYInfo
- Publication number
- ES547744A0 ES547744A0 ES547744A ES547744A ES547744A0 ES 547744 A0 ES547744 A0 ES 547744A0 ES 547744 A ES547744 A ES 547744A ES 547744 A ES547744 A ES 547744A ES 547744 A0 ES547744 A0 ES 547744A0
- Authority
- ES
- Spain
- Prior art keywords
- serigraphy
- photo
- protective
- procedure
- preparation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13503085A JPS61292641A (en) | 1985-06-20 | 1985-06-20 | Photoresist processing solution |
Publications (2)
Publication Number | Publication Date |
---|---|
ES547744A0 true ES547744A0 (en) | 1987-07-01 |
ES8707068A1 ES8707068A1 (en) | 1987-07-01 |
Family
ID=15142297
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES547744A Expired ES8707068A1 (en) | 1985-06-20 | 1985-10-09 | Photoresist processing solution |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS61292641A (en) |
ES (1) | ES8707068A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2591644B2 (en) * | 1987-03-11 | 1997-03-19 | 東京応化工業株式会社 | Photoresist stripper |
JP2009069505A (en) * | 2007-09-13 | 2009-04-02 | Tosoh Corp | Cleaning solution and cleaning method for removing resist |
JP6221939B2 (en) * | 2013-06-19 | 2017-11-01 | 信越化学工業株式会社 | Developer for photosensitive resist material and pattern forming method using the same |
-
1985
- 1985-06-20 JP JP13503085A patent/JPS61292641A/en active Granted
- 1985-10-09 ES ES547744A patent/ES8707068A1/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS61292641A (en) | 1986-12-23 |
JPH0444742B2 (en) | 1992-07-22 |
ES8707068A1 (en) | 1987-07-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FD1A | Patent lapsed |
Effective date: 19970203 |