ES2670703T3 - Instalación de vacío, en particular instalación de plasma, con un perfil extrudido de cámara completamente cerrado - Google Patents

Instalación de vacío, en particular instalación de plasma, con un perfil extrudido de cámara completamente cerrado Download PDF

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Publication number
ES2670703T3
ES2670703T3 ES15739229.1T ES15739229T ES2670703T3 ES 2670703 T3 ES2670703 T3 ES 2670703T3 ES 15739229 T ES15739229 T ES 15739229T ES 2670703 T3 ES2670703 T3 ES 2670703T3
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Spain
Prior art keywords
installation
extruded
vacuum
chamber
vacuum chamber
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Active
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ES15739229.1T
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English (en)
Inventor
Christof-Herbert Diener
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Individual
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Individual
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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B5/00—Drying solid materials or objects by processes not involving the application of heat
    • F26B5/04—Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
    • A61L2/02—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using physical phenomena
    • A61L2/14—Plasma, i.e. ionised gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Epidemiology (AREA)
  • Animal Behavior & Ethology (AREA)
  • Veterinary Medicine (AREA)
  • Public Health (AREA)
  • Plasma Technology (AREA)
  • Pressure Vessels And Lids Thereof (AREA)
  • Physical Vapour Deposition (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

Instalación de vacío (10) con una cámara de vacío (12), en la que el lado exterior de la cámara de vacío (12) que discurre paralelamente al eje longitudinal central de cámara de vacío (28) está formado de una sola pieza de un perfil extrudido de cámara (22, 70), caracterizada por que el perfil extrudido de cámara (22, 70) está formado de manera completamente cerrada transversalmente al eje longitudinal central de cámara de vacío (28) y presenta una puerta en el lado frontal reversible que se puede abrir y cerrar, presentando la cámara de vacío (12) en un lado frontal una puerta (16) pivotante que se puede abrir y cerrar, presentando el perfil extrudido de cámara (22, 70) en su lado exterior un saliente de bisagra (42, 44) que discurre paralelamente al eje longitudinal central de cámara de vacío (28) y en el que está dispuesta una bisagra (18, 20) para la unión pivotante entre puerta (16) y perfil extrudido de cámara (22, 70).

Description

imagen1
imagen2
imagen3
imagen4

Claims (1)

  1. imagen1
ES15739229.1T 2014-07-17 2015-07-13 Instalación de vacío, en particular instalación de plasma, con un perfil extrudido de cámara completamente cerrado Active ES2670703T3 (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014213942.2A DE102014213942B4 (de) 2014-07-17 2014-07-17 Vakuumanlage, insbesondere Plasmaanlage, mit einem rundum geschlossenen Kammerstrangpressprofil
DE102014213942 2014-07-17
PCT/EP2015/065968 WO2016008844A1 (de) 2014-07-17 2015-07-13 Vakuumanlage, insbesondere plasmaanlage, mit einem rundum geschlossenen kammerstrangpressprofil

Publications (1)

Publication Number Publication Date
ES2670703T3 true ES2670703T3 (es) 2018-05-31

Family

ID=53682673

Family Applications (1)

Application Number Title Priority Date Filing Date
ES15739229.1T Active ES2670703T3 (es) 2014-07-17 2015-07-13 Instalación de vacío, en particular instalación de plasma, con un perfil extrudido de cámara completamente cerrado

Country Status (7)

Country Link
US (1) US10041730B2 (es)
EP (1) EP3170196B1 (es)
CN (1) CN106537551B (es)
DE (1) DE102014213942B4 (es)
ES (1) ES2670703T3 (es)
TR (1) TR201810324T4 (es)
WO (1) WO2016008844A1 (es)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014213942B4 (de) * 2014-07-17 2016-01-28 Christof-Herbert Diener Vakuumanlage, insbesondere Plasmaanlage, mit einem rundum geschlossenen Kammerstrangpressprofil
USD836212S1 (en) * 2015-08-14 2018-12-18 Christof-Herbert Diener Vacuum device
DE102018103949A1 (de) * 2018-02-21 2019-08-22 Christof-Herbert Diener Niederdruckplasmakammer, Niederdruckplasmaanlage und Verfahren zur Herstellung einer Niederdruckplasmakammer
EP3564538B1 (de) * 2019-02-20 2021-04-07 Pfeiffer Vacuum Gmbh Vakuumsystem und verfahren zur herstellung eines solchen
CN112414014A (zh) * 2020-11-13 2021-02-26 河南泓医药业有限公司 一种独一味粉（冻干）的生产装置及生产方法

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US3795986A (en) * 1971-12-13 1974-03-12 Cenco Medical Health Supply Co Modular compartment sublimator
SE450692B (sv) * 1982-12-09 1987-07-20 Rovac Technology Ab Anordning for att mojliggora undertrycksbehandling i en behandlingskammare
US4526670A (en) * 1983-05-20 1985-07-02 Lfe Corporation Automatically loadable multifaceted electrode with load lock mechanism
US5288218A (en) * 1993-02-11 1994-02-22 Mikron Industries Extrusion calibrator
AU4658296A (en) * 1995-01-20 1996-08-07 Freezedry Specialties, Inc. Freeze dryer
US5746434A (en) * 1996-07-09 1998-05-05 Lam Research Corporation Chamber interfacing O-rings and method for implementing same
US6182851B1 (en) * 1998-09-10 2001-02-06 Applied Materials Inc. Vacuum processing chambers and method for producing
US6579579B2 (en) * 2000-12-29 2003-06-17 Alcan Technology & Management Ltd. Container made of a light metal alloy and process for its manufacture
US20030045098A1 (en) * 2001-08-31 2003-03-06 Applied Materials, Inc. Method and apparatus for processing a wafer
US8648977B2 (en) * 2004-06-02 2014-02-11 Applied Materials, Inc. Methods and apparatus for providing a floating seal having an isolated sealing surface for chamber doors
CN1778986B (zh) * 2004-06-02 2015-08-19 应用材料公司 用于密封腔室的方法和装置
JP5566101B2 (ja) * 2006-04-24 2014-08-06 メディカル・インスティル・テクノロジーズ・インコーポレイテッド 針貫通可能かつレーザ再密閉可能な凍結乾燥装置およびこれに関連する方法
KR100892781B1 (ko) * 2007-02-12 2009-04-15 주식회사 휴먼메디텍 진공챔버용 도어
DE102007021386A1 (de) * 2007-05-04 2008-11-06 Christof-Herbert Diener Kurztaktniederdruckplasmaanlage
DE102007060515A1 (de) * 2007-12-13 2009-06-18 Christof-Herbert Diener Oberflächenbehandlungsverfahren
DE102009002337B4 (de) * 2009-04-09 2013-07-11 Christof-Herbert Diener Indikator zur Überwachung eines Plasmas
US20130047692A1 (en) 2010-02-12 2013-02-28 Marco Pasqualon Modular extrusion die
CN202673051U (zh) * 2012-07-07 2013-01-16 东莞百进五金塑料有限公司 产品表面喷涂真空室活动支铰密封门
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WO2014159696A1 (en) * 2013-03-13 2014-10-02 Stryker Corporation Sterilization container capable of providing an indication regarding whether or not surgical instruments sterilized in the container were properly sterilized
DE102014213942B4 (de) * 2014-07-17 2016-01-28 Christof-Herbert Diener Vakuumanlage, insbesondere Plasmaanlage, mit einem rundum geschlossenen Kammerstrangpressprofil

Also Published As

Publication number Publication date
US20170122663A1 (en) 2017-05-04
CN106537551A (zh) 2017-03-22
EP3170196B1 (de) 2018-05-02
CN106537551B (zh) 2018-05-08
US10041730B2 (en) 2018-08-07
TR201810324T4 (tr) 2018-08-27
DE102014213942A1 (de) 2016-01-21
WO2016008844A1 (de) 2016-01-21
EP3170196A1 (de) 2017-05-24
DE102014213942B4 (de) 2016-01-28

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